講演情報
[21p-A307-12]The influence of growth orientation on electrical response in LaSrNiO4 films
〇(D)Lingling Xie1, Daisuke Kan1, Yuichi Shimakawa1 (1.Kyoto Univ.)
キーワード：
Electrochemical mosulation、Epitaxial thin films、LaSrNiO4
Electrochemical redox reactions can be utilized for modulating valence states of functional transition metal oxides and for electrically controlling the properties of these oxides. Fabricating electric-field-effect (EFE) transistor structures with gate insulators of electrolytes is a way to electrically induce redox reactions in channels of oxide films and to electrochemically control and simultaneously explore oxides’ physical properties. Here we show that the electrical resistance of the lanthanum strontium nickelate LaSrNiO4 (LSNO) films with the Ruddlesden-Popper structure can be electrochemically modulated and that the way the resistance modulations depends on the films’ orientation.