講演情報

[9p-N107-5]Composite-Driven Enhancement of Thermoelectric Properties in Amorphous Fe-V-W-Al Thin Films

〇(P)KAVITA YADAV1, Yuya Tanaka1, Masaharu Matsunami1, Tsunehiro Takeuchi1,2 (1.Toyota Tech. Inst., Hisakata 2-12-1, Tempaku, Nagoya 468-8511, Japan, 2.Research Center for Smart Energy Technology, Toyota Tech. Inst., Nagoya 468-8511, Japan)

キーワード:

Thermoelectric performance、thin films、transport properties

Fe-based Heusler alloys, notable for their abundance in the Earth's crust and non-toxicity, exhibit promising thermoelectric performance driven by tunable electronic structures and low thermal conductivity. Within this class, amorphous Fe–V–W–Al–O thin films have demonstrated favorable thermoelectric properties. Building on prior investigations of these films deposited on n-type Si substrates,the present study explores their integration with p-type Si substrates via RF magnetron sputtering under controlled oxygen partial pressures. Structural characterization reveals an oxygen-induced transition from crystalline A2-type Heusler phases to an amorphous thin film phase. Preliminary measurements suggest that p-type substrates enhance the Seebeck coefficient, accompanied by metallic electrical resistivity that indicates the presence of charge transport pathways.
Ongoing work aims to systematically tune oxygen partial pressure and substrate doping to optimize carrier mobility and suppress lattice thermal conductivity, ultimately improving power factor and ZT. This study highlights the critical role of interface engineering and defect chemistry in advancing scalable, high-performance thermoelectric thin films based on non-toxic Fe-based Heusler systems.