Session Details
[TuC2]GaN Vertical Power Devices
Tue. May 26, 2026 11:00 AM - 12:45 PM JST
Tue. May 26, 2026 2:00 AM - 3:45 AM UTC
Tue. May 26, 2026 2:00 AM - 3:45 AM UTC
Room C(3rd floor)
[TuC2-01]Advances and Integration Strategies for High-k Gate Dielectrics in GaN and SiC Power Devices
〇Andrew T. Binder1, Jeff Steinfeldt1, Joseph P. Klesko1, Peter Dickens1, Kevin Reilly1, Robert J. Kaplar1 (1. Sandia National Labs. (USA))
[TuC2-02]Electrical Characterization of High-Purity N-Type GaN Grown by Quartz-Free Hydride Vapor Phase Epitaxy with World-Record Electron Mobility
〇Yusuke Hirayama1, Masahiro Horita1,2, Shota Kaneki3, Hajime Fujikura3, Jun Suda1,2 (1. Nagoya Univ. (Japan), 2. Nagoya Univ. IMaSS (Japan), 3. Sumitomo Chemical Corp. (Japan))
[TuC2-03]Unveiling the Trade-off Mechanism between Breakdown Voltage and Dynamic Stability in Vertical GaN FinFETs with PECVD-SiNx Spacers
〇Chengzhi Zhang1, Aditya Kundapura Bhat1, Khaled Ahmeda2, Xiang Li2, Martin Kuball1, Matthew D Smith1 (1. CDTR, School of Physics, University of Bristol, Tyndall Avenue, Bristol, BS8 1TL (UK), 2. Dynex Semiconductor Ltd, Doddington Road, Lincoln (UK))
[TuC2-04]627-V Fully-vertical GaN-on-SiC Trench MOSFETs and Demonstration of Large-Area Hexagonal Trench Devices
〇Jialun LI1, Xuancong Fan2, Hui Guo1, Yuanzhi He1, Renqiang Zhu1, Kei May Lau1 (1. Division of Emerging Interdisciplinary Area, The Hong Kong Univ. of Sci. and Tech. (Hong Kong), 2. Department of Electronic and Computer Engineering, The Hong Kong Univ. of Sci. and Tech. (Hong Kong))
[TuC2-05]Impact of Sidewall-Gate Structure on Quasi-Saturation in Vertical GaN MOSFETs
〇Ting Ci Li1, Chih-Kang Chang1, Jun-Xiang Wang1, Jian-Jang Huang1 (1. National Taiwan University (Taiwan))
[TuC2-06]Stimulated Raman Scattering Microscopy for 3D Imaging of Laser-Induced Stress Distribution in a Bulk GaN Substrate
〇Yusuke Wakamoto1, Shun Takahashi1, Atsushi Tanaka2, Takuya Maeda1, Yasuyuki Ozeki1 (1. The Univ. of Tokyo (Japan), 2. Nagoya Univ. (Japan))
