Session Details

[20p-C32-1~11]16.3 Bulk, thin-film and other silicon-based solar cells

Fri. Sep 20, 2024 1:00 PM - 4:00 PM JST
Fri. Sep 20, 2024 4:00 AM - 7:00 AM UTC
C32 (Hotel Nikko 3F)
Yasuyoshi Kurokawa(Nagoya Univ.), Takuya Matsui(AIST)

[20p-C32-1]Damp heat stability of the refractive index of Cat-CVD Si nitride films formed at a high deposition rate

〇Keisuke Ohdaira1, Huynh Thi Cam Tu1 (1.JAIST)

[20p-C32-2]Dependence of electrical properties of nanocrystalline silicon/silicon oxide composite films on composition

〇Kaori Takagi1, Asaki Arata2, Yasuyoshi Kurokawa2,3, Atsushi Masuda1,4, Noritaka Usami2,3,5, Kazuhiro Gotoh1,2,4 (1.Niigata Univ., 2.Nagoya Univ., 3.InFuS, Nagoya Univ., 4.IRCNT, Niigata Univ., 5.IMaSS, Nagoya Univ.)

[20p-C32-3]Investigation of contact resistance of ultrathin nitride Si films with various compositions

〇Yuhi Ito1, Huynh Thi Cam Tu1, Keisuke Ohdaira1 (1.JAIST)

[20p-C32-4]Crystalline Si solar cells featuring TiOx hole/electron contacts

〇Takuya Matsui1,2, Shohei Fukaya1,2, Shona McNab3, Hitoshi Sai1, Kazuhiro Gotoh2,4, Noritaka Usami2, Ruy Sebastian Bonilla3 (1.AIST, 2.Nagoya Univ., 3.Oxford Univ., 4.Niigata Univ.)

[20p-C32-5]Perovskite/Si tandem solar cells interconnected through a TiOx thin layer

〇Takuya Matsui1, Calum McDonald1, Hitoshi Sai1 (1.AIST)

[20p-C32-6]Crystal Silicon solar cell whose theoretical energy conversion efficiency is 70 percent

〇Isamu Jonoshita1 (1.personal participate)

[20p-C32-7]Impact of microstructure of PEDOT:PSS on passivation of silicon interface

〇(M1C)Kengo Yamanaka1, Yasuyoshi Kurokawa2,3, Masashi Kato1, Tetsuo Soga1, Shinya Kato1 (1.Grad. Eng., Nagoya. Inst. Tech, 2.Grad. Eng., Nagoya Univ, 3.InFuS Nagoya Univ.)

[20p-C32-8]Application of a Machine Learning Method, Random Forest, to the Deposition Conditions of Doped Amorphous Silicon Films

〇CHENXI LI1, Huynh Thi Cam Tu1, Keisuke Ohdaira1 (1.JAIST)

[20p-C32-9]Performance of a Si solar cell with a SnOx film as a hole selective layer

〇Tu ThiCam Huynh1, Keisuke Ohdaira1 (1.JAIST)

[20p-C32-10]Evaluation of the Interface between Low-Temperature Curing Electrode Paste and Transparent Conductive Oxide Film

〇Takuya Minowa1, Tappei Nishihara2,3, Hyunju Lee1,3, Ohshita Yoshio4, Kazuo Muramatsu5, Atsushi Ogura1,3 (1.Meiji Univ., 2.JASRI, 3.MREL, 4.Toyota Technological Inst., 5.NAMICS)

[20p-C32-11]Evaluation of Stress around Electrodes of Crystalline Silicon Solar Cells under Temperature Change

〇(M2)Koki Hasebe1, Ryo Yokogawa1,4, Kyotaro Nakamura2, Yoshio Ohshita2, Noboru Yamada3, Atsushi Ogura1,4 (1.Meiji Univ., 2.Toyota Tech. Inst., 3.Nagaoka Univ. of Tech., 4.Meiji Renewable Energy Laboratory)