The 86th JSAP Autumn Meeting 2025
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Session Details

Symposium (Oral)Symposium : Lab to Fab: Accelerating R&D to Mass Production via Semiconductor DX

[8p-S202-1~8]Lab to Fab: Accelerating R&D to Mass Production via Semiconductor DX

Mon. Sep 8, 2025 1:30 PM - 6:25 PM JST
Mon. Sep 8, 2025 4:30 AM - 9:25 AM UTC
S202 (Lecture Hall South)
1:30 PM - 2:15 PM JST(4:30 AM - 5:15 AM UTC)

[8p-S202-1]The Path from Research and Development to Commercialization Accelerated by Digital Twins

〇Toshiyuki Mitsue1 (1.Deloitte Tohmatsu Consulting)
2:15 PM - 2:30 PM JST(5:15 AM - 5:30 AM UTC)

[8p-S202-2]Computer Simulation of CMP processes

〇Toshihiro Shimada1, Seiya Yokokura1, Hiroki Waizumi1 (1.Hokkaido Univ.)
2:30 PM - 3:10 PM JST(5:30 AM - 6:10 AM UTC)

[8p-S202-3]Analysis of chemical mechanical polishing mechanism by molecular dynamics method using neural network potential

〇Yoshishige Okuno1 (1.Resonac Corp.)
3:10 PM - 3:50 PM JST(6:10 AM - 6:50 AM UTC)

[8p-S202-4]Revolutionizing through the Synergy of Machine Learning and Mathematical Optimization (MOAI)

〇Mikio Kubo1,2 (1.Tokyo Univ. of Marine Sci. and Tech., 2.MOAI Lab.)
4:05 PM - 4:45 PM JST(7:05 AM - 7:45 AM UTC)

[8p-S202-5]Interdisciplinary research conducted entirely in a dry-lab setting

〇Shingo Iwami1 (1.Nagoya University)
4:45 PM - 5:25 PM JST(7:45 AM - 8:25 AM UTC)

[8p-S202-6]Accelerated Discovery of Materials for Semiconductor Cleaning through Materials Informatics and Quantum Annealing

〇Shogo Kunieda1, Yosuke Hanawa1, Shigeru Takatsuji1, Yuta Sasaki1, Kazuki Muro2, Renichiro Haba2, Shinobu Fujikura2 (1.SCREEN Holdings, 2.Sigma-i)
5:25 PM - 5:40 PM JST(8:25 AM - 8:40 AM UTC)

[8p-S202-7]Accelerating Chemical Resistance Evaluation of Resins Using Machine Learning for Semiconductor Production Equipment

〇Takeru Nakamura1, Mitsuru Yambe1, Shogo Kunieda1, Yosuke Hanawa1, Hitoshi Kamijima2, Toshiaki Shintani2, Shunya Sugiyama2, Yoshihiro Hayashi3, Ryo Yoshida3 (1.SCREEN Holdings, 2.ISP, 3.ISM)
5:40 PM - 6:25 PM JST(8:40 AM - 9:25 AM UTC)

[8p-S202-8]Strategy for 300 mm-scale production of 2D/2.5D materials assisted with AI

〇Hiroki Ago1,2, Pablo Solis-Fernandez1 (1.IGESE, Kyushu Univ., 2.CSeDE, Kyushu Univ.)
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