The 87th JSAP Autumn Meeting 2026
Advanced Search

Session Details

Symposium (Oral)Symposium : Applications of quantum beams to semiconductor process and evaluation technologies

[8p-N102-1~6]Applications of quantum beams to semiconductor process and evaluation technologies

Tue. Sep 8, 2026 1:30 PM - 4:50 PM JST
Tue. Sep 8, 2026 4:30 AM - 7:50 AM UTC
N102 (First Year Education Bld. N Block)
1:30 PM - 2:00 PM JST(4:30 AM - 5:00 AM UTC)

[8p-N102-1]New Frontiers in Advanced Semiconductor Characterization Enabled by SPring-8-II

〇Takaki Hatsui1 (1.RIKEN)
2:00 PM - 2:30 PM JST(5:00 AM - 5:30 AM UTC)

[8p-N102-2]Nanoscale Fabrication of High Temperature Superconductors Using Helium Ion Microscopy and Its Application to Quantum Devices

〇Tetsuro Misawa1 (1.AIST)
2:30 PM - 3:00 PM JST(5:30 AM - 6:00 AM UTC)

[8p-N102-3]Channeled Mg Ion Implantation into GaN(0001) for GaN Power Device Applications

〇Atsushi Suyama1, Hideaki Minagawa1, Masahiko Aoki1, Kazuhiro Yokota1 (1.Ion Technology Center, Co., Ltd.)
3:20 PM - 3:50 PM JST(6:20 AM - 6:50 AM UTC)

[8p-N102-4]Automation and Efficiency Enhancement of High-Quality Data Acquisition for Semiconductor Cross-Sectional Imaging Using an In-Lens FE-SEM

〇SHUNYA TANAKA1, YUSUKE FUKUCHI2, TAKESHI SUNAOSHI2, DAIJI KIRIHATA2, SATOSHI OKADA2 (1.Hitachi, Ltd., 2.Hitachi High Tech Corp.)
3:50 PM - 4:20 PM JST(6:50 AM - 7:20 AM UTC)

[8p-N102-5]Cutting-edge Nanofabrication Equipment Using Electron and Ion Beams

〇Tatsuki Sugihara1 (1.ELIONIX INC.)
4:20 PM - 4:50 PM JST(7:20 AM - 7:50 AM UTC)

[8p-N102-6]E-beam metrology and inspection technology for chip manufacturing

〇Yuko Iwabuchi1 (1.Hitachi High-Tech Corporation)
Back to Category List