Presentation Information
[2P33]Comparison of Single-step Oxidation Loop A and Double-step Oxidation Loop B between p-Si(001) and n-Si(001) surfaces
*Yasutaka Tsuda1, Akitaka Yoshigoe1, Shuichi Ogawa2, Yuji Takakuwa3 (1. Japan Atomic Energy Agency, 2. Nihon University, 3. Tohoku University)