Presentation Information
[2P35]Prediction of Silicon Dioxide Film Properties Fabricated using TEOS-based PECVD processes by Machine Learning
*Sukma Wahyu Fitriani1, Sato Yushi2, Yuma Yamamoto2, Yosei Kurosaki2, Kunihiro Kamataki2, Takamasa Okumura2, Naoto Yamashita2, Naho Itagaki2, Kazunori Koga2, Masaharu Shiratani2 (1. Joint Graduate School of Mathematics for Innovation, Kyushu University, 2. Faculty and Graduate School of Information Science and Electrical Engineering, Kyushu University)