Presentation Information
[3P78]Catalyst-Free Direct Graphene Growth on Si substrate using HPPS Plasma with Hydrogen as sputtering gas
*Yuto Oishi1, Masanori Shinohara2, Fumihiko Maeda3, Takashi Matsumoto4 (1. Graduate School of Engineering, Fukuoka University, 2. Department of Electrical Engineering, Fukuoka University, 3. Department of Information Electronics, Fukuoka Institute of Technology, 4. Tokyo Electron Technology Solutions Limited)