Presentation Information
[3P96]Insulator film coating on top of walls in carbon nanowalls
*Takuya Hara1, Hiroaki Ishikawa1, Takashi Itoh1, Shigeru Yamada1 (1. Department of Electrical, Electronic and Computer Engineering, Gifu University,)
Carbon nanowall (CNW) is expected as an electrode material for electric double layer capacitor (EDLC). In the use of CNWs as an electrode material, nonuniformity of electric field and large hydrophobicity owing to sharp top of the wall. To solve these problems, we have tried the coating only the top of wall with a hydrophobic insulator in CNWs. To realize that, in this work, we have studied the conditions to coat the top of the wall with oxide film in CNWs. In the experiment, two CNWs were fabricated with NiO deposited at different deposition powers, and the NiO deposition distributions were compared. From the obtained results, it is necessary to deposit with a large deposition rate for insulating coating only at the top of the wall.