Session Details
EUV light source
Tue. Jan 21, 2025 2:30 PM - 3:30 PM JST
Tue. Jan 21, 2025 5:30 AM - 6:30 AM UTC
Tue. Jan 21, 2025 5:30 AM - 6:30 AM UTC
Room V(B2F Ran(1))
Chair: Yuki Abe
[C03-21p-V-01]【招待講演】レーザー生成プラズマEUV光源を用いたマスクパターン検査装置
*Keitaro Hayashida1, Akira Ueda1, Ko Gondaira1, Masayasu Nishizawa1, Hiroki Miyai1 (1. Lasertec Corporation)
[C03-21p-V-02]高効率EUV光源実験ためのCO2レーザー増幅特性
*Nozomi Tohara1, Tatsuya Soramoto1, Ryoma Sato1, Hayato Yazawa1, Hiroki Morita1, Atsushi Sunahara2, Shinichi Namba3, Takeshi Higashiguchi1 (1. Utsunomiya University, 2. Purdue University, 3. Hiroshima University)
[C03-21p-V-03]斜め入射によるEUV光源の高効率化
*Hayato Yazawa1, Shunya Yamamoto1, Hiroki Morita1, Hayato Ohashi2, Shinichi Namba3, Takeshi Higashiguchi1 (1. Utsunomiya University, 2. Toyama University, 3. Hiroshima University)