Session Details
[B-3]Ferroelectric Devices
Wed. Sep 17, 2025 9:00 AM - 10:15 AM JST
Wed. Sep 17, 2025 12:00 AM - 1:15 AM UTC
Wed. Sep 17, 2025 12:00 AM - 1:15 AM UTC
Room B (302, 3rd Floor)
Session Chair: Laurent Grenouillet (CEA-Leti), Ming-Hsiu Lee (Macronix International Co., Ltd.)
[B-3-01 (Invited)]HfO2-based Ferroelectric Devices for Edge AI Application
〇Jun Okuno1, Yusuke Shuto1, Kensuke Ota1, Tsubasa Yonai1, Ryo Ono1, Masaki Sakakibara1, Akihiko Kato1, Maximilian Lederer2, Peter Reinig2, Konrad Seidel2, Ruben Alcala3, Uwe Schroeder3, Thomas Mikolajick3, Taku Umebayashi1, Kentaro Akiyama1 (1. Sony Semiconductor Solutions Corp. (Japan), 2. Fraunhofer IPMS - Center Nanoelectronics Technologies (Germany), 3. NaMLab gGmbH (Germany))
[B-3-02]Mechanism and Mitigation of Parasitic Resistance in Vertical TiO2 Channel-All-Around FeFET towards High-Speed Memory Application
〇Kohei Kawaguchi1, Takamasa Hamai1, Shoichi Kabuyanagi1, Shosuke Fujii1 (1. KIOXIA (Japan))
[B-3-03]Impact of read operation on memory and synapse characterization of FDSOI FEFET
〇miaomiao zhang1, haoji qian1,2, xiaoxi li1,2, yian ding2, yan liu1,2, chengji jin1,2, jiajia chen1,2, genquan han1,2 (1. Univ. Xidian (China), 2. Tech. Hangzhou Institute,Univ. Xidian (China))
[B-3-04]A 2 kilo-bits 1-Transistor-and-n-Ferroelectric-tunnel-junctions (1TnFTJ) Array with Voltage-readout and Few-shots Wake-up
〇Yi Xiang Huang1, Zhi Yuan Chen1, Chong Wei Chen1, Yu liang Hsueh1, Cheng Yi Yang1, E Ray Hsieh2 (1. National Central University (Taiwan), 2. National Yang Ming Chiao Tung University (Taiwan))