Session Details
[SO-PS-08]08: Low Dimensional Devices and Materials
Wed. Sep 17, 2025 1:30 PM - 2:12 PM JST
Wed. Sep 17, 2025 4:30 AM - 5:12 AM UTC
Wed. Sep 17, 2025 4:30 AM - 5:12 AM UTC
Room K (413, 4th Floor)
Session Chair: Masafumi Jo (RIKEN), Toshifumi Irisawa (AIST)
[SO-PS-08-01]Van der Waals Growth of h-BN on 2D WS2 by Molecular Beam Epitaxy
〇Ing-Song YU1, Hao LIU1, Yen-Ten HO2 (1. National Dong Hwa Univ. (Taiwan), 2. Advanced 2D Materials Co. Ltd. (Taiwan))
[SO-PS-08-02]Quantum Transport and Miniband Engineering in One-Dimensional Gated Bilayer Graphene Superlattices
〇Szu-Chao Chen1, Chi-Hsuan Lee2 (1. National Formosa University (Taiwan), 2. Academia Sinica (Taiwan))
[SO-PS-08-03]Interfacial Trap Dynamics and Optoelectronic Modulation in Monolayer MoS2 Phototransistors
〇Tzu-En Huang1, Chen Yu Wang1, Yu Ren Li1, Neng An Huang1, Kuang Yao Lo1 (1. National Cheng Kung Univ. (Taiwan))
[SO-PS-08-04]The study of Inactive Sites on MoS2: Reversible and Linear Response Gas Sensing in Monolayer MoS2 with Pre-Gas Concentration Modulation
〇Chen-Yu Wang1, Tzu-En Huang1, Yu-Ren Li1, Neng-An Huang1, Kuang-Yao Lo1 (1. National Cheng Kung Univ. (Taiwan))
[SO-PS-08-05]Voltage-Tunable Triggered NO2 Sensor Based on HfO2 Memristor and CNT for Low-Power System
〇Ikgeun Kwon1, Yuseong Jang1, Hee-Dong Kim1 (1. Sejong Univ. (Korea))
[SO-PS-08-06]High-performance Molybdenum Disulfide Transistors with Polycrystalline Gold Electrodes and In-plane Gates
〇Che-Jia Chang1,2, Shih-Jie Chen3, Tzu-Hsuan Chang1, Po-Tsung Lee3, Shih-Yen Lin1,2 (1. National Taiwan University (Taiwan), 2. Academia Sinica (Taiwan), 3. National Yang Ming Chiao Tung University (Taiwan))
[SO-PS-08-07]Operation Mechanisms of Graphene/MoS2 Hetero-structure Photodetectors and Induced Current Variation of Graphene/Al2O3/MoS2 Stacked Structures
〇Yu-Han Huang1,2, Cheng-Yu Chen1,2, Chao-Hsin Wu2, Shih-Yen Lin1 (1. Academia Sinica (Taiwan), 2. National Taiwan Univ. (Taiwan))
[SO-PS-08-08]MgO interlayer thickness dependence on magnetic domain formation in CoFe/MgO nanolayer patterns on GaAs (001) substrates
〇Hayato Yonemoto1, Rui Ochiai1, Soh Komatsu2, Masashi Akabori2, Sinjiro Hara1,3 (1. Hokkaido Univ. (Japan), 2. Japan Adv. Inst. of Sci. and Tech. (Japan), 3. Nat’l Inst. for Materials Sci. (Japan))
[SO-PS-08-09]Crystallinity Improvement for PVD-MoS2 Films by Plasma Damage Reduction with Higher Deposition Pressure
〇Naoki Matsunaga1, Jaehyo Jang1, Soma Ito1, Kuniyuki Kakushima1, Hitoshi Wakabayashi1 (1. Institute of Science Tokyo (Japan))
[SO-PS-08-10]All-2D Pseudo-CFET Inverter with Ultralow Subthreshold Swing N-type Bi2O2Se Top-gate Field-Effect Transistor
〇Ching-Min Hsu1, Hsing-Chien Chien1, Chi-Chun Cheng2, Chun-Yen Hsiao1, Po-Wen Chiu1,2 (1. National Tsing Hua Univ. College of Semiconductor Res. (Taiwan), 2. National Tsing Hua Univ. Department of Electrical Engineering (Taiwan))
[SO-PS-08-11]Electron-Beam Surface Engineering For Enhanced Charge Transport All-2D WSe2 CMOS
〇Chun Yen Hsiao1, Chi Chun Cheng2, Wen Yuan Fei1, Ching Min Hsu1, Po Wen Chiu2 (1. College of Semiconductor Research, National Tsing Hua Univ. (Taiwan), 2. Department of Electrical Engineering, National Tsing Hua Univ. (Taiwan))
[SO-PS-08-12]N-type Charge Transfer Doping in PVD-MoS2 Film with ALD-HfO2 Film
〇Shunsuke Nozawa1, Jaehyo Jang1, Naoki Matsunaga1, Taiga Fuse1, Takuya Hoshii1, Kuniyuki Kakushima1, Hitoshi Wakabayashi1 (1. Inst. of Sci. Tokyo (Japan))
[SO-PS-08-13]Epitaxial Growth of Single-Crystal Metal on Transition Metal Dichalcogenides Surface
〇Po-Sen Mao1,2, Yi-Jung Hsu1, Wen-Hao Chang1,2,3 (1. National Yang Ming Chiao Tung Univ. (Taiwan), 2. Res. Center for Critical Issues, Academia Sinica (Taiwan), 3. Res. Center for Applied Sciences, Academia Sinica (Taiwan))
[SO-PS-08-14]Simulation of In-Plane Strong Electronic Coupling in Self-Assembled InAs Quantum Dots
〇Ryoga Kai1, Naoya Miyashita1,2, Toshiyuki Kaizu2,1, Koichi Yamaguchi1,2 (1. Dep. of Eng. Sci Univ. of Electro-Comm. (Japan), 2. QFCD2 center Univ. of Electro-Comm. (Japan))
[SO-PS-08-15]Atomic layer deposition on WSe2 via F6-TCNNQ monolayer and evaluation of dual gate FET
〇Kensho Matsuda1, Yuto Noguchi1, Mengnang Ke2, Shohei Kumagai3, Toshihiro Okamoto3, Nobuyuki Aoki1 (1. Chiba University (Japan), 2. Yokohama National University (Japan), 3. Institute of Science Tokyo (Japan))
[SO-PS-08-16]Fabrication of Room Temperature based Acetone Sensor using Controlled CVD grown MoS2 for Non-invasive Real Time Detection of Diabetes
〇Sohel Siraj1, Parikshit Sahatiya1 (1. Birla Institute of Technology and Science Pilani, Hyderabad Campus (India))
[SO-PS-08-17]Direct Measurement of the Specific Contact Resistivity in Monolayer MoS2 using Cross-Bridge Kelvin Probe Structures
〇Aparna -1,3, Surajit Sutar1, Kaustuv Banerjee1, Cesar Javier Lockhart de la Rosa1, Gouri Sankar Kar1, Clement Merckling1,2, Bart Soree1,3 (1. IMEC (Belgium), 2. Department of Materials Engineering (MTM), KU Leuven (Belgium), 3. Department of Electrical Engineering (ESAT)-KU Leuven (Belgium))
[SO-PS-08-18]Elastic Effect-Driven MoS2-Based Surface Acoustic Wave Skin gas sensor
〇Sankar Ganesh Ramaraj1, Ryo Fujioka1, Chen Li1, Daisuke Kiriya 1, Hiroyasu Yamahara1, Hitoshi Tabata1 (1. The University of Tokyo (Japan))
[SO-PS-08-19]Development of a Graphene-CNT Hybrid Gas Sensor and Improvement of Its Sensitivity and Selectivity
〇Yunsong Tang1, Xiangyu Qiao1, Kazuma Sugawara1, Meng Yin1, Suzuki Ken1 (1. Tohoku Univ. (Japan))
[SO-PS-08-20]Influence of Spin-Orbit Coupling in Photoconductivity of Monolayer Transition Metal Dichalcogenides
〇Akira Nakanishi1, Satofumi Souma1 (1. Kobe Univ. (Japan))
[SO-PS-08-21]Seeding ALD of High-k Dielectrics on TMD n/p- Dual-Gate FETs with Symmetrical VTH for CMOS Application
〇Zi-Jun Su1, Jyun-Hong Chen2, Min-Gji Liu1, Yu-Lun Chueh1, Chao-Hui Yeh1, Chang-Hong Shen1 (1. The Univ. of Tsinghua (Taiwan), 2. The Inst. of Taiwan Semiconductor Research (Taiwan))