講演情報
[15p-P01-2]Thickness and Annealing Dependent Third-Order Nonlinear Properties of
Ta2O5 Thin Films
〇(B)PinShuo Huang1, ChengXin Liu2, BoXiang Zhuang3, ChanShan Yang3, XiaoYan Liu2, ChaoKuei Lee1 (1.National SYS Univ., 2.SCCE Univ. of Jinan, 3.National TN Univ.)
キーワード：
Z-scan、Nonlinear Properties、Thin Films
Ta2O5 has been realized as a promising material platform for nonlinear nano-photonics owning to its wide applications from broadband light source and high-speed modulation. Despite of that the third order nonlinearity has been reported with the order of magnitude 10-14cm2/W. The comprehensive investigation of nonlinear properties of various thin film thickness was still absent. In this work, by using conventional Z-scan measurement, nonlinear optical coefficient n2 and two photon absorption coefficient b for Ta2O5 thin film with thickness of 50, 80 and 160 nm were characterized. First, the n2 value under exciting peak intensity of 842 GW/cm2 for thin film thickness of 80 nm were retrieved from Z-scan profile with 8.51, 4.73 and 1.68 10-13 cm2/W respectively. Considering the reported order of magnitude for thin film thickness of 400 to 800 nm, the clear decreasing tendency with the increasing thickness of Ta2O5 thin film was observed for the first time, indicating the possible mechanism of the increasing O2 vacancy with thickness. The result echoes the reduction of surface roughness with increasing thickness of thin film. In addition, the nonlinear properties w/wo thermal annealing of various thickness of Ta2O5 thin films under different exciting power and was investigated and discussed as well.