Session Details
[22p-P07-1~6]13.3 Insulator technology
Fri. Sep 22, 2023 4:00 PM - 6:00 PM JST
Fri. Sep 22, 2023 7:00 AM - 9:00 AM UTC
Fri. Sep 22, 2023 7:00 AM - 9:00 AM UTC
P07 (KJ Hall)
[22p-P07-1]Impacts of Energy Dependence of Interface Trap Density on Conductance Curve
〇Noriyuki Taoka1, Aoi Teshima1, Yusuke Ichino1, Yoshiyuki Seike1, Tatsuo Mori1 (1.Aichi Inst. Tech)
[22p-P07-2]Formation energy of ions at vacancy sites in SiNx and SiOx films
〇Tomoki Oku1, Masahiro Totsuka1, Hajime Sasaki1 (1.Mitsubishi Electric)
[22p-P07-3]Dielectric properties of low-temperature Si oxide films annealed with added NH3 gas
〇Susumu Horita1 (1.JAIST)
[22p-P07-4]Effect of UV-Ozone treatment on ALD film on SiO2
〇Yoshiharu Kirihara1, Shunichi Ito1, Ryousuke Ishikawa1, Hiroshi Nohira1 (1.Tokyo City Univ.)
[22p-P07-5]Evaluation of etching rate of insulating film using graded etching by ellipsometry measurement
〇Aki Suzuki1, Keiko Inoue1, Yusaku Tanahashi1, Hirofumi Seki1 (1.Toray Research Center, Inc.)
[22p-P07-6]Decomposition and Size Distribution Monitoring of AlTiO and MoS2 Precursor Mist Particles using a Fast-Scanning Mobility Particle Sizer
〇(PC)Abdul A Kuddus1, Kojun Yokoyama2, Keiji Ueno2, Shinichiro Mouri1, Hajime Shirai2 (1.Ritsumeikan Univ., 2.Saitama Univ.)