Session Details

[9a-N406-1~7]1.3 Novel technologies and interdisciplinary engineering

Tue. Sep 9, 2025 10:00 AM - 11:45 AM JST
Tue. Sep 9, 2025 1:00 AM - 2:45 AM UTC
N406 (Lecture Hall North)

[9a-N406-1]On-Sensor MOF-Inorganic Hybridized Structure Growth for
Ultrasensitive and selective nonpolar Gas Detection

〇(DC)Mikihisa Hirose1, Tsunaki Takahashi1, Nobuhiko Hosono1, Manato Un1, Takuro Hosomi1, Wataru Tanaka1, Jiangyang Liu1, Haruka Honda1, Takashi Uemura1, Takeshi Yanagida1,2 (1.Dept. Eng. Univ. Tokyo, 2.IMCE, Kyushu Univ)

[9a-N406-2]Electron and proton in pico-water functions such as nelear transformation and chemical reducution

〇Sunao Sugihara1, Hiroshi Maiwa1 (1.SIT)

[9a-N406-3]Fabrication of Bent Waveguides and Micro-Mirrors by Planar Semiconductor Process

〇(M2)Keito Kikuchi1, Taro Itatani2, Yoshinobu Okano1, Akihiro Noriki2, Takeru Amano2 (1.Tokyo City Univ., 2.AIST.)

[9a-N406-4]Direct Measurement of Semiconductor Laser Diodes by Thermo-Microscope

〇kiyoto taniguchi1,2, Taro Itatani2, Joji maeda1, Akihiro Noriki2, Takeru Amano2 (1.Tokyo Univ. of Science, 2.AIST)

[9a-N406-5]Development of a CORE Silicon Etching Technique Using General-Purpose RIE Equipment: Influence of Mask Material

〇Kanna Aoki1, Kouichi Akahane1 (1.NICT)

[9a-N406-6]Dependence of Etching Rate on Ion Energy for KOH Etching of Amorphized Si Etching Mask Formed by N+ Irradiation

〇Mina Sato1, Mie Tohnishi1, Akihiro Matsutani1 (1.Science Tokyo RIM)

[9a-N406-7]Observation of plasma distribution in a RIE chamber densified by SmCo magnets

〇Mie Tohnishi1, Mina Sato1, Akihiro Matsutani1 (1.Science Tokyo)