Session Details
[15p-P10-1~4]13.5 Semiconductor devices/ Interconnect/ Integration technologies
Sat. Mar 15, 2025 4:00 PM - 6:00 PM JST
Sat. Mar 15, 2025 7:00 AM - 9:00 AM UTC
Sat. Mar 15, 2025 7:00 AM - 9:00 AM UTC
P10 (Gymnasium)
[15p-P10-1]【Absent】Analysis of superconducting niobium thin films for Cryo-CMOS
〇Mizuki Ogawa1, Ryosuke Hayashi1, Seibun Oshio1, Kazuki Adachi1, Takahisa Tanaka1, Munehiro Tada1 (1.Keio Univ.)
[15p-P10-2]Evaluation of Ru Thin Film Properties and Adhesion Improvement for Next-Generation Interconnect
〇(B)Ryosuke Hayashi1, Mizuki Ogawa1, Seibun Oshio1, Kazuki Adachi1, Takahisa Tanaka1, Munehiro Tada1 (1.Keio Univ.)
[15p-P10-3]Study of Electroless plated CoMn diffusion barrier film
〇Shoso Shingubara1, Yuko Ishii1, takanobu hamamura1, tomohiro shimizu1, takeshi ito1 (1.Kansai Univ)
[15p-P10-4]Selective Cu-filling into Via-hole by Chemical Vapor Deposition using CuI-precursor
〇Takumi Namba1, Yu Miyamoto1, Satoshi Yamauchi1 (1.Ibaraki Univ.)