JVSS 2026

JVSS 2026

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Session Details

Divisions' sessionsDivision's Session

[3E12-16]Surface Analysis

Thu. Sep 17, 2026 1:15 PM - 3:30 PM JST
Thu. Sep 17, 2026 4:15 AM - 6:30 AM UTC

E: Meeting room (3F)

Chair:Yoshimi Abe

Recent advances in practical surface analysis using X-ray photoelectron spectroscopy

1:15 PM - 1:45 PM JST(4:15 AM - 4:45 AM UTC)

[3E12【依頼講演】]Energy scale calibration, Auger parameter evaluation, and recoil effects in laboratory-based hard x-ray photoelectron spectroscopy

*Shinya Otomo¹, Shinsuke Nishida¹ (1. Fundamental Technology Laboratory, Furukawa Electric Co., Ltd. (Japan))

1:45 PM - 2:15 PM JST(4:45 AM - 5:15 AM UTC)

[3E13【依頼講演】]Effects of Ar-GCIB cluster size on XPS depth-profiling characteristics and Its application to organic/inorganic multilayer analysis

*Tomomi Ohashi¹, Hsun-Yun Chang¹, Shin-ichi iida¹ (1. ULVAC-PHI, Inc. (Japan))

2:15 PM - 2:45 PM JST(5:15 AM - 5:45 AM UTC)

[3E14【依頼講演】]Angle-resolved depth-profile analysis for laboratory Ga Kα hard X-ray photoelectron spectroscopy: accelerated reconstruction with integrated deep-learning and statistical denoising

*Satoshi Toyoda¹ (1. VACUUM PRODUCTS CO. LTD. (Japan))

2:45 PM - 3:15 PM JST(5:45 AM - 6:15 AM UTC)

[3E15【依頼講演】]Chemical state characterization of the buried interface between magnetron-sputtered ZnO films and an Al underlayer using XPS and HAXPES

*Hisao Makino¹ (1. School of System Engineering, Kochi University of Technology (Japan))

3:15 PM - 3:30 PM JST(6:15 AM - 6:30 AM UTC)

[3E16]Analytical examples of lithium-ion battery and solar cell materials using XPS and EDX

*Yusuke Futamata¹ (1. SHIMADZU CORPORATION (Japan))

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