講演情報
[8a-N401-5]Effect of Al and Al2O3 layers on the selective area growth of GeS thin films
〇Qinqiang Zhang1, Ryo Matsumura1, Naoki Fukata1,2 (1.NIMS, 2.Univ. of Tsukuba)
キーワード:
GeS
Germanium monosulfide (GeS) has been considered as one of the potential 2D layered semiconductors for developing next-generation functaional devices. In this study, we investigated the effects of Al and Al2O3 layers on the selective area growth of GeS thin films and their birefringence.