講演情報
[15p-P12-11]NiO thin films growth mechanism using a novel “Electrostatic Spray Deposition (ESD)” method, and property measurement
〇(D)Fysol Ibna1,2, Sugiyama Mutsumi1,3 (1.Department of Electrical Engineering, Tokyo University of Science, 2.CITY University, Faculty of Science & Engineering, Dhaka-1216, Bangladesh, 3.Research Institute, RIST, Tokyo Univ. of Science,)
キーワード：
Electrostatic Spray Deposition (ESD)、NiO thin film、XRD、Wide band gap
This investigation revealed the NiO growth mechanism for solution-dependent electrostatic spray deposition (ESD). For the preparation of ESD spray solutions, solvent Nickel (II) acetylacetonate (Ni(C5H7O2)2) was mixed with the solute 2-methoxy ethanol (C3H8O) and doped with hydrochloric acid (HCl (aq)). In order to uncover the process for behind formation of the NiO thin film, ESD was also used to investigate the large number of microstructure parameters.
The innovative ESD approach, which is a nonvacuum, low-cost deposition methodology for oxide thin film investigation, has not received many scientific reports [1, 2]. However, ESD is simple and easy to understand, it can cover broad regions and has substantial industrial benefits by controlling component ratios.
The innovative ESD approach, which is a nonvacuum, low-cost deposition methodology for oxide thin film investigation, has not received many scientific reports [1, 2]. However, ESD is simple and easy to understand, it can cover broad regions and has substantial industrial benefits by controlling component ratios.