講演情報
[17a-K401-7]Study on pulsed sputtering epitaxy and subsequent high-temperature annealing of AlN thin films on graphene/4H-SiC(0001)
〇(M2)Qun Yu1, Kohei Ueno1, Ting Pan2, Keisuke Takemoto2, Kenta Emori2, Hiroshi Fujioka1 (1.Univ. of Tokyo, 2.Nissan Motor Co., Ltd.)
キーワード：
Sputtering、2D materials、High-temperature annealing