Session Details
[25a-71B-1~9]17.3 Layered materials
Mon. Mar 25, 2024 9:00 AM - 11:30 AM JST
Mon. Mar 25, 2024 12:00 AM - 2:30 AM UTC
Mon. Mar 25, 2024 12:00 AM - 2:30 AM UTC
71B (Building No. 7)
Nobuyuki Aoki(千葉大)
[25a-71B-1]Device performance of wafer-scale MoS2 FET grown by MOCVD
〇(D)KEISUKE ATSUMI1, LI SHUHONG1, NISHIMURA TOMONORI1, KANAHASHI KAITO1, SAKUMA YOSHIKI2, NAGASHIO KOSUKE1 (1.Tokyo Univ., 2.NIMS)
[25a-71B-2]Why does everyone transfer MoS2 grown on sapphire to a Si substrate?
-Decoupling the interaction between MoS2/sapphire-
〇(D)Li Shuhong1, Keisuke Atsumi1, Tomonori Nishimura1, Kaito Kanahashi1, Yoshiki Sakuma2, Kosuke Nagashio1 (1.Univ. of Tokyo, 2.NIMS)
[25a-71B-3]Photocurrent generation from multi-layer MoS2 deposited by reactive sputtering
〇(P)Myeongok Kim1, Yoshitaka Okada1 (1.RCAST, UTokyo)
[25a-71B-4]Lock-in detection of photo current in field-effect transistors based on transition metal dichalcogenides with the aid of ultraviolet-visible light
〇Hiroki Waizumi1,2,4, Kousuke Sakashita2, Tsuyoshi Takaoka3, Nasiruddin Md.2, Aoi Sato2, Atsushi Ando4, Tadahiro Komeda3 (1.Hokkaido Univ., 2.Tohoku Univ., 3.IMRAM, Tohoku Univ., 4.AIST)
[25a-71B-5]Photo-response of MoS2-FET with CuNPc molecule
〇Tsuyoshi Takaoka1, Kosuke Sakashita2, Hiroki Waizumi3, Yasuyuki Sainoo1, Haotian Liu2, Sushen Chandra Devsharma2, Atsushi Ando4, Tadahiro Komeda1 (1.IMRAM, Tohoku Univ., 2.Sci, Tohoku Univ., 3.Hokkaido Univ., 4.AIST)
[25a-71B-6]Improvement of the p-type thin film MoS2 TFT by Sulfidation
〇Kecheng Li1, Kousaku Shimizu1 (1.Nihon Univ.)
[25a-71B-7]Ni/Al2O3/PVD-WS2 Contact Characteristics with Al2O3 Passivation Layer
〇(B)Kaede Teraoka1, Shinya Imai1, Keita Kurohara1, Soma Ito1, Takamasa Kawanago1, Iriya Muneta1, Kuniyuki Kakushima1, Hitoshi Wakabayashi1 (1.Tokyo Tech)
[25a-71B-8]Enhanced Device Performance of Monolayer WSe2 pMOSFETs by Bi2Te3 vdW contacts
〇WENHSIN CHANG1, S. Hatayama1, Y. Saito1,2, N. Okada1, T. Endo3, Y. Miyata3, T. Irisawa1 (1.AIST, 2.TU, 3.TMU)
[25a-71B-9]Low-contact resistance in NbS2/WSe2 junction for WSe2-pFET
〇(B)Koki Hori1,2, Wen-Hsin Chang1, Toshifumi Irisawa1, Atsushi Ogura2,3, Naoya Okada1 (1.AIST, 2.Meiji Univ., 3.MREL)