Session Details
[17a-K505-1~9]23.1 Joint Session N "Informatics"
Mon. Mar 17, 2025 9:00 AM - 11:30 AM JST
Mon. Mar 17, 2025 12:00 AM - 2:30 AM UTC
Mon. Mar 17, 2025 12:00 AM - 2:30 AM UTC
K505 (Lecture Hall Bldg.)
Kentaro Kutsukake(Nagoya Univ.), Toyohiro Chikyo(NIMS)
[17a-K505-1]Data assimilation for oxygen precipitates distribution inside Si wafers in cascade process
〇Takuya Kusunoki1, Junta Abe1, Yuta Nagai1, Haruo Sudo1, Hiroya Iwashiro1, Rie Takasu1, Hironori Banba1, Koji Izunome1, Susumu Maeda2, Shota Seki2 (1.GlobalWafers Japan, 2.Aixtal)
[17a-K505-2]Wafer and device process co-optimization in semiconductor manufacturing by cross-company overall process-digital twins
〇Shota Seki1,4, Yuji Nakanishi1, Tsuyoshi Matsuoka1, Susumu Maeda1, Masaki Takaishi1, Takuya Kusunoki2, Yuta Nagai2, Hiroki Nagakura3, Koichi Tanigawa3, Kentaro Kutsukake4, Toru Ujihara1,4 (1.Aixtal, 2.GWJ, 3.SCK, 4.Nagoya Univ.)
[17a-K505-3]Objective functions considering conventional conditions in optimizing semiconductor annealing process
Ryotaro Kasahara1, 〇Kentaro Kutsukake1,2, Shunta Harada1, Toru Ujihara1, Shota Seki3, Masaki Takaishi3, Yuta Nagai4 (1.Nagoya Univ., 2.RIKEN, 3.Aixtal, 4.GlobalWafers Japan)
[17a-K505-4]Physics-informed Bayesian optimization suitable for extrapolation of materials growth
〇Yuuki Wakabayashi1, Wataru Kobayashi2, Takuma Otsuka3, Tei Gensai2 (1.NTT BRL, 2.NTT DIL, 3.NTT CSL)
[17a-K505-5]Optimization of Microstructures Using Multi-Fidelity Bayesian Optimization
〇Tomohiro Kurita1 (1.Nagoya Univ.)
[17a-K505-6][The 46th Young Scientist Award Speech] Phase and property control of heterogeneous HfxZr(1-x)O2 thin films by machine learning
〇Zeyuan Ni1, Hidefumi Matsui1 (1.TTS)
[17a-K505-7]Enhancing an Autoregressive Generative Wafer Polishing U-net Model
〇Kevin Operiano1, Roberto Iaconi1, Riku Tanaka1, Fumiya Kawate1, Sepasy Saeed2, Yoshifumi Watanabe2 (1.Aixtal Corporation, 2.Mipox Corporation)
[17a-K505-8]A robotic system for powder grinding and mortar cleaning
〇(B)Misaki Mashimo1, Yusaku Nakajima1, Yasuo Takeichi1, Kanta Ono1 (1.Osaka University)
[17a-K505-9]Automation of X-ray diffraction measurement process for realizingautonomous exploration of alloys
〇Kensei Terashima1, Wei-Sheng Wang1,2, Yoshihiko Takano1,2 (1.NIMS, 2.Univ. of Tsukuba)