Session Details

[10a-N101-1~11]15.4 III-V-group nitride crystals

Thu. Sep 10, 2026 9:00 AM - 12:00 PM JST
Thu. Sep 10, 2026 12:00 AM - 3:00 AM UTC
N101 (First Year Education Bld. N Block)

[10a-N101-1]Growth-temperature dependence of electrical properties of Si-doped AlN grown by low-temperature sputter epitaxy

〇Takao Kozaka1, Kohei Ueno1, Hiroshi Fujioka1 (1.IIS, Univ. Tokyo)

[10a-N101-2]Fabrication and characterization of Al0.9Ga0.1N channel HFETs via sputtering

〇Takao Kozaka1, Kohei Ueno1, Hiroshi Fujioka1 (1.IIS, Univ. Tokyo)

[10a-N101-3]Structural Design of GaN-Based 1~3 µm Infrared Quantum Cascade Lasers

〇Kazuki Nonaka1,2, Koki Yabe1,2, Sachie Fujukawa2,1, Hiroyuki Yaguchi2, Hideki Hirayama1 (1.RIKEN, 2.Saitama Univ.)

[10a-N101-4]Quantum Structure Design of GaN-Based THz Quantum Cascade Lasers Considering High Lying Levels

〇Koki Yabe1,2, Kazuki Nonaka1,2, Takayuki Ishida1, Sachie Fujikawa2,1, Hiroyuki Yaguchi2, Hideki Hirayama1 (1.RIKEN, 2.Saitama Univ.)

[10a-N101-5]Fabrication of Thin-Film AlN/GaN HEMTs on FFA Sp-AlN

〇Mikuri Yasui1, Ryota Akaike1,2, Hiroki Yasunaga2,3, Kanako Shojiki1,2, Hideto Miyake1,2 (1.Grad. Sch. of Eng. Mie Univ., 2.IC-SDF. Mie Univ., 3.ORIP. Mie Univ.)

[10a-N101-6]Effect of sputtering conditions on N-polar AlN using the sputter-annealing method

〇Tomohiro Tamano1, Kanako Shojiki1,2, Ryota Akaike1,2, Hiroki Yasunaga2,3, Hideto Miyake1,2 (1.Grad. Sch. of Eng. Mie Univ, 2.IC-SDF MIe Univ., 3.ORIP Mie Univ.)

[10a-N101-7]In Flux Dependence in Direct Growth of InGaN on ScAlMgO4 Substrates by RF-MBE

〇Daisuke Kato1, Yoshiaki Nishimura1, Trang Nakamoto2, Md Earul Islam3, Takashi Fuji3, Tsuguo Fukuda4, Ryuichi Sugie1, Tsutomu Araki1 (1.Ritumeikan Univ., 2.R-GIRO, 3.ROST, 4.Fukuda Crystal Lab.)

[10a-N101-8]Growth of red-emitting nitride nanocolumns on the entire surface of an AlN/Si(111) substrate via nanotemplate selective-area growth using nanoimprint lithography

〇Yugo Orima1, Kota Hoshino1, Rie Togashi1, Katsumi Kishino1 (1.Sophia Univ)

[10a-N101-9]Growth of multiple color integrated nanocolumn crystals by nanotemplate selective-area growth

〇Satoshi Ishikawa1, Rie Togashi1, Katsumi Kishino1 (1.Sophia Univ.)

[10a-N101-10]Fabrication and Evaluation of Three-Dimensional GaInN Nanostructures for High-Efficiency Red Emission

〇Takuto Katogi1, Tomohiro Yamaguchi1, Ryuta Shindo1, Ishikawa Satoshi2, Tohru Honda1, Takeyoshi Onuma1, Rie Togashi2, Katsumi Kishino2 (1.Kogakuin University, 2.Sophia University)

[10a-N101-11]Low-Resistance Tunnel Junctions for Nanowire Lasers Using Highly Si-Doped Sputtered n+-GaN Layers

〇Hiroki Teshima1, Kouki Yamada1, Takuya Takahashi1, Haruki Hotta1, Haruki Sawazak1, Himari Suzuki1, Kazumasa Niwa2, Koichi Naniwae2, Jyunya Iihama3, Yoshiro Kususe3, Masami Mesuda3, Satoshi Kamiyama1, Tetsuya Takeuchi1, Motoaki Iwaya1 (1.Meijo Univ., 2.E&E Evolution Ltd., 3.Tosoh Corporation)