Keywords :
Year :
1969 - 2026
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| Keywords : | |
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| Year : | 1969 - 2026 |
Search across all events. Up to 10,000 search results will be displayed.
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〇Youseok Suh1, Jie Deng1, Jun Yuan1, Frank Yang1, Jihong Choi1, Milind Shah1, Pranjal Srivastava1, Giri Nallapati1, PR. Chidi Chidambaram1(1. Qualcomm (USA))
〇Yuxuan Wang1, Yaoping Xiao1, Jinhyun Chun1, Masaharu Kobayashi1(1. The University of Tokyo (Japan))
〇Xin Wang1,2, Longyu Sun1,2, Haoyan Liu1,2, Yongliang Li1,2(1. State Key Lab. of Fabrication Technologies for Integrated Circuits, Inst. of Microelectronics of the Chinese Academy of Sciences (China), 2. School of Integrated Circuits, Univ. of Chinese Academy of Sciences (China))
〇Taoyu Zhou1, Naiqi Liu1, Yandong He1, Gang Du1,2(1. Peking Univ. (China), 2. Beijing Innovation Center of Integrated Circuits Lab. (China))
〇Chuangxin Zhou1, Feiyu Teng1, Xiangyu Yan1, Rui Guo1, Ziqiao Xu1, Runsheng Wang1, Ming Li1, Heng Wu1(1. Peking University (China))
〇Naiqi Liu1, Taoyu Zhou1, Yandong He1, Gang Du1(1. School of Integrated Circuits, Peking Univ. (China))
〇Zhaohao Zhang1,2, Kun Zhong1,2, Junfeng Li1,2, Huaxiang Yin1,2(1. Institute of Microelectronics of the Chinese Academy of Sciences (China), 2. University of Chinese Academy of Sciences (China))
〇Hiroyuki Ota1, Yukinori Morita1, Kenzo Manabe1, Misako Morota1, Naoya Okada1, Kazuya Uejima1, Shinji Migita1, Yoshihiro Hayashi1(1. AIST (Japan))
〇Yukinori Morita1,6, Takamasa Kawanago1,6, Takefumi Kamioka1,2,6, Yuichiro Mitani2,6, Toshihide Nabatame3,6, Takashi Onaya3,6, Naoki Fukata3,6, Wipakorn Jevasuwan3,6, Kazuhito Tukagoshi3,6, Takuya Hoshii4,6, Kasidit Toprasertpong5,6, Atsushi Tamura5,6, Koji Kita5,6, Naoya Okada1,6, Kenzo Manabe1,6, Wataru Mizubayashi1,6, Hiroyuki Ota1,6, Takashi Matsukawa1,6, Shinji Migita1,6(1. AIST (Japan), 2. Tokyo City Univ. (Japan), 3. NIMS (Japan), 4. Sci. Tokyo (Japan), 5. The Univ. Tokyo (Japan), 6. LSTC (Japan))
〇Yuito Maki1, Hayato Watanabe1, Hideaki Tanimura1, Katsuhiro Mitsuda1, Shinichi Kato1, Takumi Mikawa1, Yasuo Nara2(1. SCREEN Semiconductor Solutions Co., Ltd. (Japan), 2. Tokyo City University (Japan))
〇Elhadji Alhousseyni Diallo1, Tadeu Mota Frutuoso1, William Vandendaele1, Rèmy Gassilloud1, Elise Arnoux1, Laurent Brevard1, Claire Fenouillet-Beranger1, Marie-claire Cyrille1, Xavier Garros(1. Univ. Grenoble Alpes, CEA-Leti (France))
〇Kyungwook Park1,2, Changhwan Choi1, Sangkuk Han1, Wonjae Choi1, Haesoo Jang1, Jaewon Chung1, Sangmyun Lim1, Sangwoo Jung1, Soyoung Park1(1. Hanyang Univ. (Korea), 2. Samsung Electronics Corp., Ltd. (Korea))
〇Ryutaro Nishino1, Chia-Tsong Chen1, Yukinori Morita1, Naoto Kumagai1, Hiroyuki Ota1, Kazuya Uejima1, Atsushi Yagishita1, Toshifumi Irisawa1, Yoshihiro Hayashi1(1. ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY (Japan))
〇Honoka Kido1, Mizuki Yano1, Hiroki Kondo1(1. Kyushu Univ. (Japan))
〇Camila Toledo de Carvalho Cavalcante1, Hiroaki Arimura1, Pallavi Puttarame Gowda1, Kenneth Lai1, Efrain Altamirano Sanchez1, Dmitry Batuk1, Thomas Chiarella1, Jerome Mitard1, Violeta Georgieva1, Harinarayanan Puliyalil1, Sujith Subramanian1, Lucas Petersen Barbosa Lima1, Steven Demuynck1, Naoto Horiguchi1, Serge Biesemans1(1. imec (Belgium))
〇Xingrong Xiao1,2, Haoyan Liu1, Yongliang Li1(1. State Key Laboratory of Fabrication Technologies for Integrated Circuits, Inst. of Microelectronics of the Chinese Academy of Sciences (China), 2. School of Advanced Interdisciplinary Sciences, Univ. of Chinese Academy of Sciences (China))
〇Takefumi Kamioka1,6, Toshihide Nabatame2,6, Hiroki Matsukawa3,6, Takamasa Kawanago1,6, Yukinori Morita1,6, Kasidit Toprasertpong3,6, Yuichiro Mitani4,6, Takashi Onaya2,6, Naoki Fukata2,6, Wipakorn Jevasuwan2,6, Kazuhito Tsukagoshi2,6, Takuya Hoshii5,6, Atsushi Tamura3,6, Koji Kita3,6, Naoya Okada1,6, Kenzou Manabe1,6, Wataru Mizubayashi1,6, Hiroyuki Ota1,6, Takashi Matsukawa1,6, Shinji Migita1,6(1. AIST (Japan), 2. NIMS (Japan), 3. The Univ. of Tokyo (Japan), 4. Tokyo City Univ. (Japan), 5. Science Tokyo (Japan), 6. LSTC (Japan))
〇Kaimin Feng1,2, Huaizhi Luo1, Yongliang Li1,2(1. Institute of Microelectronics of the Chinese Academy of Sciences (China), 2. School of Integrated Circuits, University of Chinese Academy of Sciences (China))
〇Yanbang Chu1, Yu Liu1, Ziqiao Xu1, Runsheng Wang1, Ming Li1, Heng Wu1(1. School of Integrated Circuits, Peking University (China))
〇Xinyue He1, Siyuan Liu1, Yuji Cheng1, Yu Liu1, Xiangyu Yan1, Runsheng Wang1, Ming Li1, Xing Zhang1, Heng Wu1(1. School of Integrated Circuits, Peking University (China))
〇Jiahao Zhang1, Ziqiao Xu1, Siyuan Liu1, Yanbang Chu1, Xinyue He1, Yu Liu1, Runsheng Wang1, Ming Li1, Heng Wu1(1. School of Integrated Circuits, Peking Univ. (China))
〇Yukihiko Yamazaki1, Haruki Yonezaki1,2, Jiro Ida1, Takayuki Mori1(1. Kanazawa Inst. of Tech. (Japan), 2. KIOXIA Corp. (Japan))
〇Chi-Chun Cheng1, Chun-Yen Hsiao1, Long-An Lee1, Nguyen Huynh-Uyen-Phuong1, Po-Wen Chiu1(1. National Tsing Hua University (Taiwan))
〇Arka Dutta1, Ritam Sarkar1, Pierre Eyben1, Daniel Casey2, Hiroaki Arimura1, Thomas Chiarella1, Anabela Veloso1, Andrea Pondini1,3, Alexander Makarov1, Lynn Verschueren1, Hans Mertens1, Clement Porret1, Thomas Dursap1, Jishnu Ganguly1, Conor Cullen2, Rami Khazaka2, Min Soo Kim1, Lucas Petersen Barbosa Lima1, Jerome Mitard1, Serge Biesemans1, Naoto Horiguchi1(1. imec (Belgium), 2. ASM (Belgium), 3. KU Leuven (Belgium))
〇Kazuya Uejima1, Atsushi Yagishita1, Naoto Kumagai1, Chia-Tsong Chen1, Masanaga Fukasawa1, Shutaro Asanuma1, Toshihiro Kamei1, Yuuki Ishida1, Naoya Okada1, Kenzo Manabe1, Yuji Kasashima1, Hiroki Tonegawa1, Shin Kono1, Tetsuya Ueda1, Motoharu Shichiri1, Ryutaro Nishino1, Yoko Tanaka1, Takahiro Goya1, Jun'ichi Hattori1, Yukinori Morita1, Toshifumi Irisawa1, Wataru Mizubayashi1, Hiroyuki Ota1, Fuminori Ito1, Takashi Matsukawa1, Yoshihiro Hayashi1(1. National Inst. of AIST (Japan))
〇Anabela Veloso1, Ruben Asanovski1, Jeroen E. Scheerder1, Daniel Casey2, Conor Cullen2, Clement Porret1, Thomas Dursap1, Geert Eneman1, Felix Seidel1, Claudia Fleischmann1, Paola Favia1, Ritam Sarkar1, Arka Dutta1, Xiuju Zhou1, Anne Vandooren1, Roger Loo1, Rami Khazaka2, Naoto Horiguchi1(1. imec (Belgium), 2. ASM (Belgium))
〇Fei Zhao1, Haoyan Liu1, Xiaofeng Jia1, Yan Li2, Yongliang Li1(1. Inst. of Microelectronics, Chinese Academy of Science (China), 2. Beijing Information Science and Technology University (China))
〇Andrea Pondini1,2, Pierre Eyben2, Lennaert Wouters2, Hiroaki Arimura2, Thomas Chiarella2, Hans Mertens2, Arka Dutta2, Albert Minj2, Clement Porret2, Erik Rosseel2, Philippe Matagne2, Thomas Hantschel2, Naoto Horiguchi2, Jérôme Mitard2, Anne Verhulst1,2(1. KU Leuven (Belgium), 2. imec (Belgium))
〇Chang-Seok Lee1, Taehoon Kim1, Jaewon Kim Kim1, Jae Hong Lee1, Yoonhoo Ha1, Woochang Lee1(1. Samsung Advanced Institute of Tech. (Korea))
〇Rajendra Kumar Saroj1, Andrea Mingardi1, Teresa Rodrigues1, Koen D'have1, Sandip Halder1, Hans Mertens1, Camila Cavalcante1, Hung-Chieh Tsai1, Serena Iacovo1, Steven Brems1, Min-Soo Kim1, Steven Demuynck1, Lucas Petersen Barbosa Lima1, Naoto Horiguchi1, Serge Biesemans1(1. IMEC (Belgium))
〇Pierre Eyben EYBEN1, An De Keersgieter1, Maryam Hosseini1, Andrea Pondini1,2, Arka Dutta1, Hiroaki Arimura1, Thomas Chiarella1, Elena Capogreco1, Philippe Matagne1, Jérôme Mitard1, Naoto Horiguchi1(1. IMEC (Belgium), 2. KU Leuven (Belgium))
〇Krunoslav Romanjek1, Blend Mohamad1, Joël Kanyandekwe1, Zdenek Chalupa1, Micaël Charbonneau1, Valérie Lapras1, Théo Cabaret1, Tadeu Mota-Frutuoso1, Wissem Baik1, Fabien Bringuier1, Laurent Brévard1, Alexandre Magalhaes-Lucas1, Marie-Claire Cyrille1, Claire Fenouillet-Beranger1(1. Univ. Grenoble Alpes, CEA, Leti, F-38000 Grenoble, France (France))
〇Emmanuel PETITPREZ1, Pierre BRIANCEAU1, Blend MOHAMAD1, Zdenek CHALUPA1, Alexis KRAKOVINSKY1, Krunoslav ROMANJEK1, Jorge-Pablo NACENTA MENDIVIL1(1. Univ. Grenoble Alpes, CEA-Leti (France))
〇Wen Hsin Chang1, Shogo Hatayama1, Fang-Jui Chu2, Naoya Okada1, Toshifumi Irisawa1, Yao-Jen Lee3, Yeong-Her Wang2, Tatsuro Maeda1, Yuta Saito4(1. Natl. Inst. Adv. Indus. Sci. Tech. (Japan), 2. Natl. Cheng Kung Univ. (Taiwan), 3. Natl. Yang Ming Chiao Tung Univ. (Taiwan), 4. Tohoku Univ. (Japan))
〇Takamasa Kawanago1,2, Takefumi Kamioka1,2, Yukinori Morita1,2, Naoya Okada1,2, Kenzo Manabe1,2, Wataru Mizubayashi1,2, Hiroyuki Ota1,2, Takashi Matsukawa1,2, Shinji Migita1,2(1. National Institute of Advanced Industrial Science and Technology (AIST) (Japan), 2. LSTC (Japan))
〇Takashi Onaya1, Toshihide Nabatame1, Takahiro Nagata1, Kazuhito Tsukagoshi1(1. NIMS (Japan))
〇Pooi Lee Tung1,2, Sanchali Mitra3, Yee Sin Ang3, Yan Song2, Kah Wee Ang1(1. National University of Singapore (NUS) (Singapore), 2. Micron Semiconductor Asia Pte. Ltd (Singapore), 3. Singapore University of Technology and Design (SUTD) (Singapore))
〇Yongmin Jung1, Sungyeob Ha1, Taehoon Park1, Dongkyu Jang1(1. Samsung Electronics (Korea))
〇Kyoungrock Nho1, Dongkyu Jang1, Inkyum Lee1, Shindeuk Kim1, Taehoon Park1(1. Samsung Electronics (Korea))
〇Ken Uchida1(1. The Univ. of Tokyo (Japan))
〇Takumi Inaba1, Hidehiro Asai1, Tomoki Kashiwagi1,2, Takumi Katorhi1,3, Hiroshi Oka1, Kimihiko Kato1, Shota Iizuka1, Takashi Nakayama1, Satoshi Moriyama3, Takahiro Mori1(1. National Institute of Advanced Industrial Science and Technology (Japan), 2. Chuo University (Japan), 3. Tokyo Denki University (Japan))
〇Shinichi Takagi1, Kei Sumita2, Zhao Jin2, Yutong Chen2, Hiroshi Oka3, Takahiro Mori3, Mitsuru Takenaka2, Kasidit Toprasertpong2(1. Teikyo Univ. (Japan), 2. The Univ. of Tokyo (Japan), 3. Nat. Inst. Adv. Indus. Sci. and Tech. (AIST) (Japan))
〇Jiahe Xu1, Fei Zhao1, Ran Cheng2, Yongliang Li1(1. Inst. of Microelectronics of the Chinese Academy of Sciences (China), 2. Zhejiang Univ. (China))
〇Ryotaro Shimura1, Yutong Chen1, Koji Matsumoto2, Akihiro Suzuki2, Hiroaki Yamamoto2, Kazuhito Matsukawa2, Mitsuru Takenaka1, Shinichi Takagi1,3, Kasidit Toprasertpong1(1. The Univ. of Tokyo (Japan), 2. SUMCO Corp. (Japan), 3. Teikyo Univ. (Japan))
〇Kaoru Kato1, Hajime Tanaka1,2, Nobuya Mori1(1. The Univ. of Osaka (Japan), 2. Kwansei Gakuin Univ. (Japan))
〇Michael Hoffmann1, Johannes Ocker1, Nima Akbari Moghaddam1, Thorsten Kammler1(1. Ferroelectric Memory GmbH (FMC) (Germany))
〇jihoon CHOI1, Kyung Soo Park1, Yoonseok Lee1, Jin Yeong Lee1, Yeon Woo Choi1, Gyu Min Hwang1, Sang Myun Lim1, Do Hyun Lee1, Tae Suk Kim1, Ye Jun Park1, Changhwan Choi1(1. Hanyang university (Korea))
〇Hideaki Tanimura1,2, Tomoya Mifune1, Yuma Ueno2, Yusuke Tani2, Hironori Fujisawa1, Seiji Nakashima1, Ai Isohashi Osaka1, Yasumasa Takagi3, Akira Yasui3, Jiayi Tang3, Shinichi Kato2, Takumi Mikawa2(1. Univ. of Hyogo (Japan), 2. SCREEN Semiconductor Solutions (Japan), 3. JASRI (Japan))
〇Youngchan Cho1, Changhyeon Han2, Daewoong Kwon2, Wonjun Shin1(1. Sungkyunkwan Univ. (Korea), 2. Hanyang Univ. (Korea))
〇Jung Ting Chang1(1. National Tsing Hua Univ. (Taiwan))
