[PL-1-1]Building a Sustainable Society through Innovative Devices and Materials
○R. Chubachi(AIST(Japan))
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○R. Chubachi(AIST(Japan))
T. Mitsunari, H. Lee, M. Kushimoto, B. O. Jung, S. Y. Bae, K. Lekhal, M. Deki, Y. Honda, ○H. Amano(Nagoya Univ.(Japan))
○K. L. Wang(UCLA(USA))
○U. T. Schwarz1, O. Höhn2, B. Bläsi2, C. Wiesmann3, N. Linder4(1.Univ. of Freiburg, 2.Fraunhofer ISE, 3.Osram OS, 4.Osram GmbH(Germany))
○S. Nozaki1, S. Yoshida2, K. Yamanaka2, O. Imafuji1, S. Takigawa1, T. Katayama1, T. Tanaka1(1.Panasonic Corp., 2.Panasonic Semiconductor Solutions Co., Ltd.(Japan))
○Y. H. Hsiao1, S. W. Liao1, K. J. Chen1, M. H. Shih1,2, H. C. Kuo1(1.National Chiao Tung Univ., 2.Research Center for Applied Sci., Academia Sinica(Taiwan))
○Y. C. Lai1,2, A. Higo2, C. Thomas2, T. Kiba3, J. Takayama3, M. Sugiyama4, Y. Nakano4, P. Yu1, A. Murayama3, S. Samukawa1,2(1.National Chiao Tung Univ., 2.Tohoku Univ., 3.Hokkaido Univ., 4.Univ. of Tokyo(Taiwan))
○T. Tajiri1, S. Takahashi2, J. Tatebayashi2, S. Iwamoto1,2, Y. Arakawa1,2(1.Institute of Industrial Science, Univ of Tokyo, 2.Institute of Nano Quantum Information Electronics, Univ of Tokyo(Japan))
○C. Zeng1, Y. Ma2, Y. Zhang1, Z. Jiang2, J. Yu1, J. Xia1(1.Huazhong Univ. of Sci. and Tech., 2.Fudan Univ.(China))
○Y. Ashizawa, K. Nakagawa(1.Nihon Univ.(Japan))
○S. Iihama1, Y. Sasaki1, Y. Ando1, S. Mizukami2(1.Tohoku Univ., 2.WPI-AIMR, Tohoku Univ.(Japan))
○K. Noda1, K. Okada1, Y. Amemiya1, S. Yokoyama1(1.Hiroshima Univ.(Japan))
○Y. Enami1, Y. Jouane1, J. Luo2, A. Jen2(1.Kochi Univ. of Tech., 2.Univ. of Washington(Japan))
○N. Nishizawa1, K. Nishibayashi1, H. Munekata1(1.Tokyo Tech(Japan))
○C. Song1, Y. Y. Wang1, S. M. Zhou2, F. Pan1(1.Tsinghua Univ., 2.Tongji Univ.(China))
○Y. Tanaka, S. Sekiguchi, K. Morito(1.PETRA(Japan))
○J. Fujikata1, S. Takahashi1, M. Takahashi2, M. Noguchi1, M. Miura1, T. Nakamura1, Y. Arakawa3(1.PETRA, 2.AIST, 3.Univ. of Tokyo(Japan))
○Z. Tu1, P. Gong1, Z. Zhou1, X. Wang1(1.Peking Univ.(China))
○J. H. Han1, 2, M. Takenaka1, 2, S. Takagi1, 2(1.Univ. of Tokyo, 2.JST-CREST(Japan))
○N. Yamamoto1, K. Akahane1, T. Umezawa1, A. Matsumoto1, T. Kawanishi1,2(1.NICT, 2.Waseda Univ.(Japan))
○Y. Amemiya1, K. Noda1, T. Sennichi1, S. Yokoyam1(1.Hiroshima Univ.(Japan))
D. Marris Morini1, V. Vakarin1, ○P. Chaisakul1,2, J. Frigerio3, M. Rouifed1, X. Le Roux1, D. Chrastina3, L. Vivien1, G. Isella3(1.Univ. Paris Sud / IEF, 2.Univ. of Tokyo, 3.L-Ness, Politecnico Di Milano(France))
○Y. Miyasaka1, T. Hiraki2,3, K. Okazaki2,3, K. Takeda2,3, T. Tsuchizawa2,3, K. Yamada2,3, K. Wada1, Y. Ishikawa1(1.Univ. of Tokyo, 2.NTT Device Tech. Labs., 3.NTT Nanophotonics Center(Japan))
○S. Okumura1, K. Kinoshita1, J. Fujikata1, T. Simoyama1, H. Ono1, Y. Tanaka1, K. Morito1, T. Horikawa1, T. Mogami1(1.PETRA(Japan))
○T. Maekura1, D. Wang1, K. Yamamoto1, H. Nakashima1(1.Khushu Univ.(Japan))
○A. Alattili1, S. Kako2, M. Husain1, F. Gardes1, S. Iwamoto2, Y. Arakawa2, S. Saito1(1.Univ. of Southampton, 2.Univ. of Tokyo(UK))
○S. Ishida1, S. Kako1, K. Oda2, T. Ido2, S. Iwamoto1, Y. Arakawa1(1.Univ. of Tokyo, 2.Hitachi Ltd.(Japan))
○K. Oda1, T. Okumura1, J. Kasai1, S. Kako2, S. Iwamoto2, Y. Arakawa2(1.Hitachi Ltd., 2.Univ. of Tokyo(Japan))
○C. Chang1, H. Li1, S. H. Huang1, H. H. Cheng1(1.National Taiwan Univ.(Taiwan))
○H. Isshiki1, K. Komiya1, R. Kojima1(1.Univ. of Electro-Communications(Japan))
○W. Van Roy1, P. Neutens1, T. Claes1, R. Jansen1, A. Subramanian2, K. Jans1, R. Vos1, J. O'Callaghan1, D. Vercruysse1, R. Stahl1, V. Mukund1, B. Du Bois1, P. Helin1, A. Stassen1, S. Severi1, D. Martens2, P. Bienstman2, P. Deshpande1, R. Baets2, A. Lambrechts1, L. Lagae1,3, X. Rottenberg1, P. Van Dorpe1,3(1.Imec, 2.Ghent Univ., 3.KU Leuven(Belgium))
○C. Wang1, T. W. Lu1, P. T. Lee1(1.National Chiao Tung Univ.(Taiwan))
○P. Y. Chen1, T. W. Lu1, P. T. Lee1(1.National Chiao Tung Univ.(Taiwan))
○T. Kita1, N. Yamamoto2, T. Kawanishi2, H. Yamada1(1.Tohoku Univ., 2.National Institute of Information and Communications Technology(Japan))
○Y. P. Cheng1, 2, Y. Ikku1, 2, M. Takenaka1, 2, S. Takagi1, 2(1.Univ. of Tokyo, 2.JST-CREST(Japan))
○Y. Wan1, Q. Li1, Y. Geng1, K. M. Lau1(1.Hong Kong Univ. of Sci. and Tech.(China))
○S. Gies1, S. Karrenberg1, M. Zimprich1, T. Wegele1, C. Kruska1, A. Beyer1, W. Stolz1, K. Volz1, W. Heimbrodt1(1.Philipps Univ. Marburg(Germany))
○S. Takashima1,2, Y. Ikku1,2, M. Takenaka1,2, S. Takagi1,2(1.Univ. of Tokyo, 2.JST-CREST(Japan))
○H. Ota1, C. Harayama1, T. Maekawa1, X. M. Lu1, N. Kumagai1, T. Kitada1, T. Isu1(1.Tokushima Univ.(Japan))
○A. K. Saha1, T. Suhara1(1.Osaka Univ.(Japan))
○M. Yamamoto(1.NIMS(Japan))
○R. Moriya1, N. Yabuki1, M. Arai1, Y. Sata1, S. Morikawa1, S. Masubuchi1, T. Machida1,2(1.IIS, Univ. of Tokyo, 2.INQIE, Univ. of Tokyo(Japan))
○T. Tsuchiya1, T. Tsuruoka1, K. Terabe1, M. Aono1(1.National Inst. for Materials Sci.(Japan))
○C. P. Lin1, P. S. Liu1, L. S. Lyu1, M. Y. Li2, C. C. Cheng1, T. H. Lee1, W. H. Chang1, L. J. Li3, T. H. Hou1(1.National Chiao Tung Univ., 2.Academia Sinica, 3.King Abdullah Univ. of Science and Technology(Taiwan))
○B. Özyilmaz(1.NUS(Singapore))
○S. Suzuki1, M. Muruganathan1, S. Oda2, H. Mizuta1,3(1.JAIST, 2.Tokyo Tech, 3.Univ. of Southampton(Japan))
○A. Yamanaka1, S. Okada1(1.Univ. of Tsukuba(Japan))
○Y. Y. Illarionov1,2, M. Waltl1, A. D. Smith3, S. Vaziri3, M. Ostling3, M. Lemme4, T. Grasser1(1.Inst. for Microelectronics (TU Wien), 2.Ioffe Physical-Technical Inst., 3.KTH Royal Inst. of Technology, 4.Univ. of Siegen(Austria))
○M. Hiramoto1,2(1.Institute for Molecular Science, 2.JST-CREST(Japan))
C. Y. Chu, C. Y. Chang, ○W. F. Su(1.National Taiwan Univ.(Taiwan))