Session Details

[A-6]Modeling, Simulation and Characterization

Wed. Sep 4, 2024 10:45 AM - 12:15 PM JST
Wed. Sep 4, 2024 1:45 AM - 3:15 AM UTC
Room A (407)(4th Floor)
Session Chair: Pin Su (NYCU), Nobuyuki Mise (Hitachi High-Tech Corp.)

[A-6-01 (Invited)]Milli-Kelvin Analysis Revealing the Role of Band-edge States in Cryogenic MOSFETs

〇Hiroshi Oka1, Hidehiro Asai1, Takumi Inaba1, Shunsuke Shitakata1, Hitoshi Yui1, Hiroshi Fuketa1, Shota Iizuka1, Kimihiko Kato1, Takashi Nakayama1, Takahiro Mori1 (1. National Institute of Advanced Industrial Science and Technology (AIST) (Japan))

[A-6-02]Comparative Analysis of Cryogenic Threshold Voltage and On-current Variability in 65nm Bulk and FDSOI MOSFETs

〇Zihao Liu1, Tomoko Mizutani1, Kiyoshi Takeuchi1, Takuya Saraya1, Hiroshi Oka2, Takahiro Mori2, Masaharu Kobayashi1, Toshiro Hiramoto1 (1. The Univ. of Tokyo (Japan), 2. The National Inst. of Advanced Indus. Sci. and Tech. (Japan))

[A-6-03]Accurate Evaluation of Effective Mobility in Si nMOSFETs at Cryogenic Temperature by Introducing Quasi-Static C-V Method

〇Yutong Chen1, Zhao Jin1, Xueyang Han1, Hiroshi Oka2, Takahiro Mori2, Kasidit Toprasertpong1, Mitsuru Takenaka1, Shinichi Takagi1 (1. The Univ. of Tokyo (Japan), 2. National Inst. of Advanced Indus. Sci. and Tech. (Japan))

[A-6-04]A Correction Method of Split C-V Characteristics in MOSFETs by Using Transmission Line Model for Accurate Extraction of Effective Mobility

〇Zhao Jin1, Yutong Chen1, Xueyang Han1, Hiroshi Oka2, Takahiro Mori2, Kasidit Toprasertpong1, Mitsuru Takenaka1, Shinichi Takagi1 (1. The Univ. of Tokyo (Japan), 2. National Inst. of Advanced Indus. Sci. and Tech. (Japan))

[A-6-05]Assessment and optimization of the cascaded transistor method for the direct extraction of access resistance components in FinFET and NSFET devices.

〇Pierre Eyben1, An De Keersgieter1, Philippe Matagne1, Hans Mertens1, Thomas Chiarella1, Clément Porret Porret1, Camila Toledo de Carvalho Cavalcante1, Yong Kong Siew1, Jerome Mitard1, Naoto Horiguchi1 (1. Imec (Belgium))