Session Details

[16a-A22-1~9]13.7 Compound and power devices, process technology and characterization

Mon. Sep 16, 2024 9:15 AM - 11:30 AM JST
Mon. Sep 16, 2024 12:15 AM - 2:30 AM UTC
A22 (TOKI MESSE 2F)
Takuji Hosoi(Kwansei Gakuin Univ.)

[16a-A22-1]Measurement of surface temperature around the channel of GaN on-diamond HEMTs for integration

〇Hazuki Tomiyama1, Hiroki Uratani2, Yoshiki Sakaida2, Yoshiki Nishibayashi3, Marika Takeuchi3, Naoteru Shigekawa1, Jianbo Liang1 (1.Osaka Metropolitan Univ., 2.Air Water Inc., 3.Sumitomo Electric Industries, Ltd.)

[16a-A22-2]Fabrication and Characterization of GaN HEMT on Diamond

〇(M1)Yosei Sunamoto1, Yutaka Ohno2, Koji Inoue2, Yasuyoshi Nagai2, Naoteru Shigekawa1, Jianbo Liang1 (1.Osaka Metropolitan Univ., 2.IMR Tohoku Univ.)

[16a-A22-3]Diamond Amplifier with Multi-finger Structure

〇(D)Ken Kudara1,2, Yuji Komatsuzaki1, Yutaro Yamaguchi1, Shintaro Shinjo1, Masakazu Arai2, Hiroshi Kawarada2 (1.Mitsubishi Electric Co., 2.Waseda Univ.)

[16a-A22-4]Fabrication of High Off-State Voltage (4266 V) Diamond MOSFETs

〇Niloy Chandra Saha1, Toshiyuki Oishi1, Makoto Kasu1 (1.Saga Univ.)

[16a-A22-5]1440 h Continuous Operation of Diamond MOS Field Effect Transistors

〇Tomoki Shiratsuchi1, Niloy Chandra Saha1, Toshiyuki Oishi1, Makoto Kasu1 (1.Saga Univ.)

[16a-A22-6]Deep-level transient spectroscopy analysis of trap states in β-(AlxGa1-x)2O3/Ga2O3 modulation-doped field-effect transistors

〇Yun Jia1, Fenfen Fenda Florena1, Ryo Morita1, Aboulaye Traore1, Hironori Okumura1, Takeaki Sakurai1 (1.Univ. of Tsukuba)

[16a-A22-7]Impact of δ-doping density on DC/RF characteristics of doble-doped InP-HEMT

〇Taro Sasaki1, Takuya Tsutsumi2, Hiroki Sugiyama1, Yuki Yoshiya1, Takuya Hoshi1, Fumito Nakajima1 (1.NTT Device Technology Labs., 2.Osaka Metropolitan Univ.)

[16a-A22-8]Mechanism of change in threshold current for semiconductor lasers

〇Tetsuya Uetsuji1, Tomoki Oku1, Akitsugu Niwa1, Naoki Nakamura1 (1.Mitsubishi Electric)

[16a-A22-9]Epitaxy of high breakdown voltage InP-based DHBTs with InP/InAlAs composite collector

〇Takuya Hoshi1, Yuta Shiratori1, Fumito Nakajima1 (1.NTT Device Technology Labs.)