The 84th JSAP Autumn Meeting 2023
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Oral presentationCS Code-sharing session : 【CS.8】 Code-sharing Session of 6.1 & 13.3 & 13.5

[22a-A201-1~12]CS.8 Code-sharing Session of 6.1 & 13.3 & 13.5

Fri. Sep 22, 2023 9:00 AM - 12:15 PM JST
Fri. Sep 22, 2023 12:00 AM - 3:15 AM UTC
A201 (KJ Hall)
Hiroyuki Ota(AIST), Takao Shimizu(NIMS)
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9:00 AM - 9:15 AM JST(12:00 AM - 12:15 AM UTC)Presentation by Applicant for JSAP Young Scientists Presentation Award

[22a-A201-1]Orientation control of Y-doped HfO2 thin films using lattice matching

〇(M2)Yoshiki Maekawa1, Koji Hirai1, Kazuki Okamoto1, Takao Shimizu2, Hiroshi Funakubo1 (1.Tokyo Tech., 2.NIMS)
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9:15 AM - 9:30 AM JST(12:15 AM - 12:30 AM UTC)

[22a-A201-2]Thickness and composition dependence of electrical property in HfO2 -CeO2 film

Koji Hirai1, 〇Kazuki Okamoto1, Takahisa Shiraishi2,1, Wakiko Yamaoka3, Risako Tsurumaru3, Yukari Inoue3, Hiroshi Funakubo1 (1.Tokyo Tech., 2.Kumamoto Univ., 3.TDK Corp.)
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9:30 AM - 9:45 AM JST(12:30 AM - 12:45 AM UTC)Presentation by Applicant for JSAP Young Scientists Presentation Award

[22a-A201-3]Evaluation of ferroelectricity for Hf0.5Zr0.5O2 thin films on Ga2O3 substrate

〇Keigo Naito1, Koichi Yamaguchi2, Takeshi Yoshimura1, Norifumi Fujimura1 (1.Osaka Metro. Univ., 2.Osaka Pref. Univ.)
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9:45 AM - 10:00 AM JST(12:45 AM - 1:00 AM UTC)

[22a-A201-4]Non-heating process for (Hf,Zr)O2-based ferroelectric thin film transistor fabrication

〇(M1)Takeshi Asuka1, Hironori Fujisawa1, Seiji Nakashima1 (1.Univ. Hyogo)
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10:00 AM - 10:15 AM JST(1:00 AM - 1:15 AM UTC)

[22a-A201-5]Electronic structure of the breakdown area in a HfO2-based ferroelectric film: Laser-based photoemission electron microscopy

〇Hirokazu Fujiwara1, Yuki Itoya2, Masaharu Kobayashi2,3, Cedric Bareille4,5, Shik Shin5,6, Toshiyuki Taniuchi4,5 (1.ISSP, 2.IIS, 3.d.lab, 4.GSFS, 5.MIRC, 6.Univ. of Tokyo)
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10:15 AM - 10:30 AM JST(1:15 AM - 1:30 AM UTC)

[22a-A201-6]Analysis of Polarized Domain Behavior in Hf-Zr-O Ferroelectric Thin Films

〇Shinji Migita1, Shutaro Asanuma1, Yukinori Morita1, Hiroyuki Ota1 (1.AIST)
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10:45 AM - 11:00 AM JST(1:45 AM - 2:00 AM UTC)

[22a-A201-7]Thickness dependence of EC in ferroelectric HfO2

〇Akira Toriumi1, Shinji Migita2 (1.Free Engineer, 2.AIST)
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11:00 AM - 11:15 AM JST(2:00 AM - 2:15 AM UTC)

[22a-A201-8]Polarization reversal kinetics in ferroelectric HfO2

〇Akira Toriumi1, Shinji Migita2 (1.Free Engineer, 2.AIST)
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11:15 AM - 11:30 AM JST(2:15 AM - 2:30 AM UTC)English Presentation

[22a-A201-9]Influence of Electric Field during Holding Time on Imprint Characteristics in Hf0.5Zr0.5O2 MFM Capacitors

〇Zhenhong Liu1, Kasidit Toprasertpong1, Mitsuru Takenaka1, Shinichi Takagi1 (1.Tokyo Univ.)
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11:30 AM - 11:45 AM JST(2:30 AM - 2:45 AM UTC)Presentation by Applicant for JSAP Young Scientists Presentation Award

[22a-A201-10]Disturb-free operatin of HfO2-FeFET by controlling the HfO2/SiO2 interfacial charges

〇Takamasa Hamai1, Kunifumi Suzuki1, Reika Ichihara1, Yoko Yoshimura1, Kiwamu Sakuma1, Kazuhiro Matsuo1, Shosuke Fujii1, Masumi Saitoh1 (1.Kioxia)
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11:45 AM - 12:00 PM JST(2:45 AM - 3:00 AM UTC)

[22a-A201-11]Effect of Accumulated Read Operation on Polarization State in HZO-FeFET

〇Masaki Otomo1, Kasidit Toprasertpong1, Mitsuru Takenaka1, Takagi Shinichi1 (1.Univ. Tokyo)
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12:00 PM - 12:15 PM JST(3:00 AM - 3:15 AM UTC)English Presentation

[22a-A201-12]Impact of HZO Scaling in FeFET on the electrical characteristics

〇(D)ZUOCHENG CAI1, KASIDIT TOPRASERTPONG1, MITSURU TAKENAKA1, SHINICHI TAKAGI1 (1.The Univ. of Tokyo)
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