Session Details

[1C01-10]Thin Film (TF)

Tue. Sep 15, 2026 2:00 PM - 5:15 PM JST
Tue. Sep 15, 2026 5:00 AM - 8:15 AM UTC
C: Conference room A (3F)
Chair:Yuji Matsumoto, Kenichi Kaminaga

[1C01【論文賞】]Structure analysis of H by Channeling 15N-NRA and discovery of H-induced Jahn-Teller effects

*Takahiro Ozawa1 (1. Institute of Industrial Science, The University of Tokyo (Japan))
Comment()

[1C02【招待講演】]Exploration of novel inorganic solids via thin-film chemistry

*Takuto Soma1, Kodai Niitsu2, Kohei Yoshimatsu3, Akira Ohtomo3, Hiroshi Kumigashira1 (1. Tohoku University (Japan), 2. National Institute for Materials Science (Japan), 3. Institute of Science Tokyo (Japan))
Comment()

[1C03]Fabrication of anatase Nb:TiO2 epitaxial thin films with nonlinear depth-dependent composition profiles

*Kenichi Kaminaga1, Ryota Kimura1, Yuto Abiko1, Shingo Maruyama1,2, Yuji Matsumoto1 (1. Tohoku University (Japan), 2. Shizuoka University (Japan))
Comment()

[1C04]Anomalous Hall effect and interfacial magnetic state in compositionally-graded Ru-substituted (La, Sr)MnO3 films

*Yuto Abiko1, Kenichi Kaminaga1, Takayasu Hanashima2, Kazuhiro Akutsu-Suyama2, Shingo Maruyama1,3, Hiroyuki Aoki4,5, Yuji Matsumoto1 (1. Department of Applied Chemistry, Tohoku University (Japan), 2. Neutron Science and Technology Center, CROSS (Japan), 3. Department of Electronics and Materials Science, Shizuoka University (Japan), 4. J-PARC Center, Japan Atomic Energy Agency (JAEA) (Japan), 5. Institute of Materials Structure Science, High Energy Accelerator Research Organization (KEK) (Japan))
Comment()

Break time

[1C05]Fluorination effects on the ferroelectric and magnetic properties of Ba–substituted BiFeO3 thin films studied by X–ray spectroscopy

*Akiko Kamigaito1, Kei Shigematsu2, Masaki Kobayashi3, Kenta Amemiya4, Hiroshi Kumigashira5, Tsukasa Katayama6, Akira Chikamatsu1 (1. Department of Chemistry, Faculty of Science, Ochanomizu University (Japan), 2. Materials and Structures Laboratory, Institute of Integrated Research, Institute of Science Tokyo (Japan), 3. Center for Spintronics Research Network, The University of Tokyo (Japan), 4. Institute of Materials Structure Science, High Energy Accelerator Research Organization (Japan), 5. Institute of Multidisciplinary Research for Advanced Materials, Tohoku University (Japan), 6. Department of Applied Chemistry, Faculty of Science Division I, Tokyo University of Science (Japan))
Comment()

[1C06]Thickness dependence of electronic and crystal structures in VO2 (110)R ultrathin films via in situ photoemission spectroscopy

*Seitaro Inoue1, Daisuke Shiga1,2, Ryotaro Hayasaka1, Kenichi Ozawa2, Hiroshi Kumigashira1,2 (1. Institute of Multidisciplinary Research for Advanced Materials, Tohoku University (Japan), 2. Photon Factory, Institute of Materials Structure Science, High Energy Accelerator Research Organization (Japan))
Comment()

[1C07]Layer-selective observation of interface-induced phase transition in VO2/W:VO2 bilayers via in situ soft-x-ray photoemission spectroscopy

*Daisuke Shiga1,2, Seitaro Inoue1, Tatsuhiko Kanda1, Naoto Hasegawa1, Miho Kitamura2, Koji Horiba2, Kohei Yoshimatsu1, Andrés Felipe Santander-Syro3, Hiroshi Kumigashira1,2 (1. Institute of Multidisciplinary Research for Advanced Materials, Tohoku University (Japan), 2. Photon Factory, Institute of Materials Structure Science, High Energy Accelerator Research Organization (Japan), 3. Universite Paris-Saclay, French National Centre for Scientific Research, Institut des Sciences Moleculaires d'Orsay (France))
Comment()

[1C08]Development of microfabricated thin-film-based thermoelectric devices toward IoT applications

*Isao Ohkubo1,3, Masayuki Murata2, Akihiko Ohi1, Mariana S. L. Lima1,3, Kenneth Magallon Senados1,3, Nicha Hirankarn1,3, Takashi Aizawa1, Takeaki Sakurai3, Takao Mori1,3 (1. National Institute for Materials Science (NIMS) (Japan), 2. National Institute of Advanced Industrial Science and Technology (AIST) (Japan), 3. University of Tsukuba (Japan))
Comment()

[1C09]Morphology and magnetization properties of Ni thin films on oxide substrates

*Fuka Watanabe1, Hirokazu Ueta2, Takahiro Ozawa1, Hideki Matsuoka1, Naoya Kanazawa1, Katsuyuki Fukutani1,2 (1. Institute of Industrial Science, The University of Tokyo (Japan), 2. Advanced Science Research Center Japan Atomic Energy Agency (Japan))
Comment()

[1C10]Effect of hydrogen trapping on the stability of the α-Al2O3(0001)/Fe(110) interface

*Yuji Kunisada1, Youngseok Hwang1, Norihito Sakaguchi1 (1. Faculty of Engineering, Hokkaido University (Japan))
Comment()