[ST-01]Coating materials design
*Jochen M Schneider1(1. RWTH Aachen University)
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2024 - 2026
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| Year : | 2024 - 2026 |
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Search Results(323)
[TF1-01]Analysis of heating processes during film growth by sputter
deposition
*Andre Anders1(1. Plasma Engineering LLC)
[TF2-01]Real-time monitoring of stress evolution during sputter-deposition of elemental and alloy thin films
*Gregory Abadias1(1. Institut Pprime)
[TF2-02]Tuning the tungsten thin film phase composition during magnetron sputter deposition
*Farzaneh Farahani1, Diederik Depla1(1. Gent University)
[TF2-03]Laser induced plasma processing to fabricate a nitride layer on a metal surface utilizing a nitrogen present in air
*Naofumi Ohtsu1, Madoka Tachibana1, Eishi Hashiba1, Yoshifumi Kitadate1, Mitsuhiro Hirano1, Takayuki Kiba1(1. Kitami Institute of Technology)
[TF2-04]Substantial Improvement of Crystalline Quality in Sputtered Zn1-xMgxO Films on Sapphire Enabled by ZnO(N) Buffers
*Jocelyn Kezia Sutadharma1, Hiroki Otsuyama1, Hibiki Noguchi1, Takamasa Okumura1, Kunihiro Kamataki1, Kazunori Koga1, Masaharu Shiratani1, Naho Itagaki1(1. Graduate School of Information Science and Electrical Engineering, Kyushu University)
[TF2-05]Plasma Processing Technologies of ULVAC Contributing to the Realization of a Connected Future
*Takehito Jimbo1(1. ULVAC, Inc.)
[FA1-01]Defect- and Interface-Engineered Ceramic Thin Films for
Extreme Environments
*Paul H Mayrhofer1(1. Institute of Materials Science and Technology, TU Wien, Vienna, Austria.)
[FA1-02]Evolution in Microstructure and Mechanical Properties of Magnetron Sputtering Refractory Metal Nitride Hard Coatings through Plasma Control
*Fan-Bean Wu1, Kuan-Ting Chou1, Wei-Chi Hung1, Yu-Rou Jiang1, Yu-Chi Chang1, Chi-Yuei Chang1, Yu-Yo Yao1(1. National United University)
[FA1-03]On Chemical, Thermal, and Mechanical Stability of (Ti0.5Al0.5)1-z(OyN1-y)z Coatings
*Matej Fekete1, Pavel Ondračka1, Ganesh K. Nayak2, Marcus Hans2, Thomas E. J. Edwards3, Petr Vašina1, Jochen M. Schneider2(1. Department of Plasma Physics and Technology, Masaryk University, 2. Materials Chemistry, RWTH Aachen University, 3. National Institute for Materials Science, Research Center for Structural Materials)
[FA1-04]Toughening Mechanisms in Transition Metal Diboride Coatings: Anisotropy, Alloying and Superlattice Effects
*Tomáš Fiantok1, Branislav Grančič1, Nikola Koutná2, Davide Giuseppe Sangiovanni3, Tomáš Roch1, Martin Truchlý1, Peter Švec4, Rainer Hahn2, Vitalii Izai1, Viktor Šroba1, Marek Vidiš1, Leonid Satrapinskyy1, Marián Mikula1,5(1. Centre for Nanotechnology and Advanced Materials, Faculty of Mathematics, Physics and Informatics, Comenius University Bratislava, Slovak Republic, 2. Institute of Materials Science and Technology, TU Wien, Austria, 3. Department of Physics, Chemistry, and Biology (IFM), Linköping University, Linköping, Sweden, 4. Institute of Physics Slovak Academy of Sciences (SAS), Bratislava, Slovakia, 5. Institute of Materials and Machine Mechanics SAS, Bratislava, Slovakia)
[TF2-06]Heteroepitaxial growth of polar, semipolar, and nonpolar ScGaN thin films on sapphire substrates by magnetron sputter epitaxy
*CHING - LIEN HSIAO1(1. Department of Physics, Chemistry, and Biology (IFM), Linköping university, Sweden)
[TF2-07]Sc-doped GeTe thin films prepared by radio-frequency magnetron sputtering
Marek Bouska1, Jan Gutwirth1, Kamil Becvar1, Vladimir Kucek1, Stanislav Slang1, Petr Janicek1, Virginie Nazabal2,1, *Petr Nemec1(1. University of Pardubice, 2. University of Rennes)
[TF2-08]Synthesis and oxidation behavior and processability of sputtered transition metal aluminum diborides with varied compositional complexity
*Jochen M Schneider1(1. RWTH Aachen University)
[TF2-09]Defect Minimized Next Generation Cathodic Arc Coating Technology: A challenge of improving metal forming performance
*Ken Mita1, Shinichi Tanifuji1, Masaru Nakamura1, Susumu Kujime1, Takeshi Ishikawa2(1. KOBE STEEL, LTD., 2. WADAYAMA COATING CENTER CO., LTD.)
[TF2-10]Design of Oxide Semiconductor Thin Films Using Reactive Plasma Deposition
*Hisashi Kitami1(1. Sumitomo Heavy Industries, Ltd.)
[HP1-01]High Power Impulse Magnetron Sputtering: From Fundamental Concepts to Industrial Applications
*Ralf Bandorf1, Holger Gerdes1, Stefan Körner1, Dennis Barton1, Ju-Liang He2, Ying-Hong Chen2, Pin-Yeng Hsieh2, Thomas Schütte3(1. Fraunhofer Institute for Surface Engineering and Thin Films IST, 2. Fraunhofer Innovation Platform for Surface and Production Engineering for Optical and Electrical Systems at Feng Chia University FIP-SPE@FCU, 3. PLASUS GmbH)
[HP1-02]Influence of discharge parameters on the properties of TiO2 films
grown by reactive bipolar HiPIMS discharges
*Stanislava Debnarova1,2, Matthieu Michiels3, Stephanos Konstantinidis2(1. Faculty of Science, Masaryk University, 2. Plasma-Surface Interaction Chemistry, University of Mons, 3. Haute École en Heinaut)
[HP1-03]Temperature-Driven Phase Evolution in Sputtered Ba–Cu–S Thin Films
*Younes LABLALI1, Olivier Donzel-Gargand2, Jonathan J. Staaf Scragg2, Mohammed Makha1(1. College of Chemical Sciences and Engineering (CCSE), Department of Materials Science, Energy and Nano-engineering (MSN), Mohammed VI Polytechnic University (UM6P), 43150 Benguerir, Morocco, 2. Division of Solar Cell Technology, Department of Materials Science and Engineering, Uppsala University, Uppsala 75237, Sweden)
[HP1-04]Industrial HiPIMS – Process challenges, trends and innovations
*Erik Johan Bohlmark1(1. Ionautics AB)
[HP2-01]The high power impulse magnetron sputtering discharge
*Jon Tomas Gudmundsson1,2(1. University of Iceland, 2. KTH Royal Institute of Technology)
[HP2-02]Microsecond ion flux mapping in HiPIMS via magnetized QCM probe
*Charles Ballage1, Anna Kapran1,2, Ovidiu Vasilovici1, Ahmed Bennacef1,3, Tiberiu Minea1(1. Laboratoire de Physique des Gaz et Plasmas – LPGP, UMR 8578, Université Paris Saclay, CNRS, 91405, Orsay CEDEX, France, 2. Department of Low Temperature Plasma, Institute of Physics v. v. i., Academy of Sciences of the Czech Republic, Na Slovance 2, 182 21, Prague 8, Czech Republic, 3. Sorbonne Université – Faculté des Sciences et Ingénierie, 75005, Paris, France)
[HP2-03]Multi-pulse HiPIMS as a New Route to Stable Reactive VO₂ Sputtering
*Erdong Chen1, Caroline Hain2, Daniel Lundin3, Stephanos Konstantinidis4, Tetsuhide Shimizu1(1. Tokyo Metropolitan University, 2. Empa, Swiss Federal Laboratories for Materials Science and Technology, 3. Plasma & Coatings Physics Division, Linköping Univ., 4. Plasma-Surface interaction Chemistry, Univ. of Mons)
[HP2-04]Effects of deposition parameters on microstructure and mechanical behavior of Al0.5CoCrFeNi2Ti0.5 high entropy alloy films
*Chia-Lin Li1, Jyh-Wei Lee1,2,3,4(1. Center for Plasma and Thin Film Technologies, Ming Chi University of Technology, New Taipei, Taiwan, 2. Department of Materials Engineering, Ming Chi University of Technology, New Taipei, Taiwan, 3. College of Engineering, Chang Gung University, Taoyuan, Taiwan, 4. High Entropy Materials Center, National Tsing Hua University, Hsinchu, Taiwan)
[HP2-05]HIPIMS – Coating technology for a new product generation of cutting tools
*Kenji Fuchigami2, Philipp Immich1, Louis Tegelaers1, Julia Janowitz1, Masaaki Takizawa2(1. IHI Hauzer Techno Coating B.V., 2. IHI Hauzer Techno Coating Japan)
[SP1-01]Manipulating spokes in magnetron sputtering discharges
*Martin Rudolph1, Wahyu Diyatmika1, Oliver Rattunde2, Edmund Schüngel2, Dmitry Kalanov1, Fabian Manke2, Jörg Patscheider2, André Anders1,3(1. Leibniz Institute of Surface Engineering (IOM), 2. Evatec AG, 3. Plasma Engineering LLC)
[SP1-02]Knowledge-based Radio-frequency plasma processing
*HyoChang Lee1(1. Korea Aerospace University)
[SP1-03]Intermediate low-voltage discharge modes in the HiPIMS-to-arc transitions
*Andrey Kaziev1, Nikolay Sazonov1, Dobrynya Kolodko1,2, Alexander Tumarkin1, Maksim Kharkov1(1. National Research Nuclear University MEPhI, 2. Kotelnikov Institute of Radio Engineering and Electronics, RAS, Fryazino Branch)
[SP1-04]Investigation of particle fluxes impinging the substrate during a HiPIMS deposition from an alloy target
*Peter Klein1, Jaroslav Hnilica1, Martin Ondryáš1, Gergely Lelovics1, Petr Vašina1(1. Masaryk University, Brno, Czech Republic)
[FA2-01]Sputtering Atomic Layer Augmented Deposition (SALAD): A Versatile Approach to Tailor Dielectric/Metal Systems for Cross-Disciplinary Optical Applications
*Nobuhiko Paul Kobayashi1(1. University of California Santa Cruz)
[FA2-02]Towards VO₂-based high-tunability optical platforms.
*Stephanos KONSTANTINIDIS1, Gregory SAVORIANAKIS1, C. ROUSSEAU1, A. EN NACIRI2, Y. BATTIE2, N. MARTIN3, B. MAES1, M. VOUE1(1. Uniersity of Mons, 2. University of Lorraine, 3. FEMTO-ST, University of Bourgogne Franche-Comté)
[FA2-03]Crystal structure and photocatalytic properties in TiO2 films induced by underlayers
*Yasuhiro Tomioka1,2, Tatsuya Fukushima2, Minoru Tamura3, Hiroka Abe3, Hiroko Mikado1,2, Kazuhiko Kita1,2(1. Graduate School of Natural Science and Technology, Kanazawa University, 2. Technology and Innovation Center, YKK Corporation, 3. Manufacturing Headquarters, YKK AP Corporation)
[FA2-04]Reactive sputter-driven gas-phase synthesis of Cu₃N nanoparticles for electrochemical CO2 reduction
*Andrey Shukurov1, Daniil Nikitin1, Veronika Červenková1, Ronaldo Katuta1, Iqra Wahid1, Jan Hanuš1, Mathias van der Veer2, Nick Daems2, Tom Breugelmans2, Caroline Adam3, Viktor Schneider3, Jessica Niemann3, Holger Kersten3, Hynek Biederman1(1. Charles University, Faculty of Mathematics and Physics, Prague, Czech Republic, 2. University of Antwerp, ELCAT, Antwerp, Belgium, 3. Kiel University, Institute of Experimental and Applied Physics of Physics, Kiel, Germany)
[FA2-05]HiPIMS goes large
*Waldemar Schönberger1, Wahyu Diyatmika1, Markus Berendt1, Frank Benecke1, Vladimir Kondratev1(1. Von Ardenne GmbH)
[AP1-01]Interconnect technologies for beyond 2nm integration
*Kazuyoshi Ueno1,2, Fumihiro Inoue1,2(1. Yokohama National University, 2. Leading-edge Semiconductor Technology Center)
[AP1-02]Process Window of Plasma-Induced Hydrogen Engineering via SiOx Reservoir on Sputtered IGZO
*Hee Yeon Noh1, Haripriya G. R.1, Myoung-Jae Lee1, Hyeon-Jun Lee1(1. DGIST)
[AP1-03]Wafer-scale epitaxial growth of high-piezoelectric single-crystal AlN films on Si substrates with an oxide buffer layer
*Azusa N. Hattori1, Osamu Nakagawara1, Kenji Ogata1(1. I-PEX Piezo Solutions Inc.)
[AP1-04]Plasma simulation for PVD processes
*Masaaki Matsukuma1(1. Tokyo Electron Technology Solution Limited)
[SP2-01]Double Ring Magnetron sputtering – superior process control for high-rate, stress-controlled, single-phase AlScN piezoelectric layers and polarity controlled AlN epitaxy
*Elizabeth von Hauff1,2, Jörg Neidhardt1, Hagen Bartzsch1, Stephan Barth1, Valentin Garbe1(1. Fraunhofer Institute for Electron and Plasma Technology, 2. TU Dresden)
[SP2-02]Microwave-Induced Radical Passivation for High-Quality AlN Thin Films in Atomic Layer Deposition
*Jia-Qi Xu1, Ruo-Yan Huang1, Zong-Yue Li1, Yi-Hui Lin1, Lijuan Zhou1, Wei-Hui Wang1, Haixiang Huang2, Guanglei Huang2, Shui-Yang Lien3, Pao-Hsun Huang1(1. Jimei University, 2. XIAMEN JINGNAI TECH CO., LTD, 3. Xiamen University of Technology)
[SP2-03]Machine Learning–Assisted Monitoring of Al₂O₃/Y₂O₃ Buffer Layers Fabrication in Reel-to-Reel Inline Multi-Chamber Process for 2G-HTS Tape Production
*Deniz Gamze Sanal1, Marcel Mesko1, Konstantin Vereshchagin1, John Wifred Aclan1, Valery Petrykin1, Sergey Lee1, Sergey Samoilenkov1(1. Faraday Factory Japan)
[SP2-04]Real-time prediction of industrial vacuum processes and coating quality, via residual gas analysis and AI based diagnostics
dermot patrick monaghan1, *Dermot Patrick Monaghan1, Joseph Brindley1, Oisin Boyle1, Marcus Law1, Benoit Daniel1(1. Gencoa Ltd)
[SP2-05]Development of Deposition Equipment and Processes for BAW Filters
*Kun Zhang1, Kazuya Kumabe1(1. Technical Development Div., Optorun Co., Ltd.)
[AP2-01]Triboelectrification at Solid–Liquid Interfaces: Surface Chemistry–Driven Charge Transfer for Self-Powered Nanosensing
*Zong-Hong Lin1(1. National Taiwan University)
[AP2-02]Controlled Growth of Sculptured Thin Films via Sputtering-GLAD for Advanced Sensing Applications
*Mati Horprathum1, Chanunthorn Chananonnawathorn1, Saksorn Limwichean1, Tossaporn Lertvanithphol1, Kata Jaruwongrungsee1, Pitak Eiamchai1, Uraiwan Waiwijit1, Pacharamon Somboonsaksri1, Gang Meng2, Meng Li2, Sansanee Noisakran3, Panisadee Avirutnan4, Kiatichai Faksri5,6, Benjawan Kaewseekhao5,6, Noppadon Nuntawong1(1. National Electronics and Computer Technology Center (NECTEC), 2. Hefei Institutes of Physical Science, Chinese Academy of Sciences, 3. National Center for Genetic Engineering and Biotechnology (BIOTEC), 4. Faculty of Medicine Siriraj Hospital, Mahidol University, 5. Faculty of Medicine, Khon Kaen University, 6. Research and Diagnostic Center for Emerging Infectious Diseases (RCEID), Khon Kaen University)
[AP2-03]Evaluating Pt-coated mirror sputtering in hydrogen plasma to model fusion diagnostics First mirrors lifetime performance
*Andrey Ushakov1, Cederik Meekes1, Erik van Beekum1, Nagihan Sezgin1, Martijn Brouwer1, Eiichi Yatsuka2, Lucas Moser3, René Koops1, Timo Huijser1, Henk Lensen1, Shobhit Yadav1(1. TNO Netherlands Organization for Applied Scientific Research, 2. National Institutes of Quantum Science and Technology, 3. ITER-IO)
[AP2-04]Sputter-Deposited Glassy Metallic Nanotube Arrays for Solid–Liquid Triboelectric Nanosensing of Wastewater Contaminants and Thermocatalytic Treatment
*Helmi Son Haji1, Kuldeep Kaswan2, Zong-Hong Lin2, Jinn P. Chu1(1. Department of Materials Science and Eng., National Taiwan Univ. of Sci. and Tech., 2. Department of Biomedical Engineering, National Taiwan Univ.)
[AP2-05]Plasmonic enhancement of optical absorption of dye molecules dispersed on Ag nanoparticle thin films deposited by magnetron sputtering
*Eiji Kusano1(1. Kanazawa Institute of Technology)
[P1-01]Gaseous-Interstitial-Mediated Superstrong Direct Adhesion of Au, Ag, and Cu to Oxide and Nitride Substrates
*Jungheum Yun1, Eunwook Jeung1, Eun-Ae Choi1, Yoshifumi Ikoma2(1. Korea Institute of Materials Science, 2. Kyushu University)
[P1-02]Narrowing the gap: one step crystallization of atmospheric pressure plasma deposited nitrogen doped TiO2
*Nicolas Fosseur1,2, Stéphane Godet2, François Reniers1(1. Chemistry of Surfaces, Interfaces and Nanomaterials, Faculty of Sciences, Université libre de Bruxelles, Belgium , 2. 4MAT, Engineering faculty, Université libre de Bruxelles, Belgium)
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