Session Details
[21a-A304-1~11]13.5 Semiconductor devices/ Interconnect/ Integration technologies
Thu. Sep 21, 2023 9:00 AM - 12:00 PM JST
Thu. Sep 21, 2023 12:00 AM - 3:00 AM UTC
Thu. Sep 21, 2023 12:00 AM - 3:00 AM UTC
A304 (KJ Hall)
Masahiro Hori(静大)
[21a-A304-1]High-accuracy charge transfer using silicon single-hole pumps
〇Gento Yamahata1, Akira Fujiwara1 (1.NTT BRL)
[21a-A304-2]Bayesian estimation approach for error rate characterization of single electron transport
〇Go Sakamoto1, Kazuto Takahashi1, Chihiro Kondo1, Raisei Mizokuchi1, Tetsuo Kodera1, Jun Yoneda1 (1.Tokyo Tech)
[21a-A304-3]Individually Controlled Characteristics of 3D Stacked Silicon Quantum Dots
〇(D)Junoh Kim1, Tomoko Mizutani1, Takuya Saraya1, Hiroshi Oka2, Takahiro Mori2, Masaharu Kobayashi1,3, Toshiro Hiramoto1 (1.IIS, Univ. of Tokyo, 2.AIST, 3.d.lab, Univ. of Tokyo)
[21a-A304-4]Measurement of quantum dots via a silicon interposer toward spin qubits integration
〇Tokio Futaya1, Raisei Mizokuchi1, Misato Taguchi2, Takuji Miki2, Makoto Nagata2, Jun Yoneda1, Tetsuo Kodera1 (1.Tokyo Tech., 2.Kobe Univ.)
[21a-A304-5]Assessment of parasitic components and effect on impedance matching in RF reflectometry
〇(M2)Ryo Matsuda1, Jun Kamioka1, Raisei Mizokuchi1, Jun Yoneda1, Tetsuo Kodera1 (1.Titech)
[21a-A304-6]Valley splitting by extended zone effective mass approximation incorporating strain
〇Jinichiro Noborisaka1, Toshiaki Hayashi1, Akira Fujiwara1, Katsuhiko Nishiguchi1 (1.NTT BRL)
[21a-A304-7]First-principles calculations on valley splitting in a Si quantum well
〇Toshiaki Hayashi1, Hiroyuki Kageshima2, Jinichiro Noborisaka1, Satoshi Fujiwara1, Katsuhiko Nishiguchi1 (1.NTT BRL, 2.Shimane Univ.)
[21a-A304-8]Characteristics of pn junction diode at cryogenic temperature
〇(M1)Keito Yoshinaga1, Tomohisa Miyao1, Takahisa Tanaka2, Ken Uchida1 (1.The Univ. of Tokyo, 2.Keio Univ.)
[21a-A304-9]Temperature-Driven Changes of Random Telegraph Noise Sources in Bulk MOSFETs
〇Takumi Inaba1, Hiroshi Oka1, Hidehiro Asai1, Hiroshi Fuketa1, Shota Iizuka1, Kimihiko Kato1, Shunsuke Shitakata1, Koichi Fukuda1, Takahiro Mori1 (1.AIST)
[21a-A304-10]Direct observation of electron capture processes in amphoteric defect states achieved by charge pumping in individual defects at MOS interface (8) -Recombination process (I)-
〇Toshiaki Tsuchiya1, Masahiro Hori1, Yukinori Ono1 (1.Shizuoka Univ.)
[21a-A304-11]Direct observation of electron capture processes in amphoteric defect states achieved by charge pumping in individual defects at MOS interface (9) -Recombination process (II)-
〇Toshiaki Tsuchiya1, Masahiro Hori1, Yukinori Ono1 (1.Shizuoka Univ.)