The 84th JSAP Autumn Meeting 2023
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Session Details

Oral presentation13 Semiconductors : 13.5 Semiconductor devices/ Interconnect/ Integration technologies

[22a-A303-1~9]13.5 Semiconductor devices/ Interconnect/ Integration technologies

Fri. Sep 22, 2023 9:00 AM - 11:15 AM JST
Fri. Sep 22, 2023 12:00 AM - 2:15 AM UTC
A303 (KJ Hall)
Takeshi Momose(Univ. of Tokyo)
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9:00 AM - 9:15 AM JST(12:00 AM - 12:15 AM UTC)

[22a-A303-1]Formation of n-type unstrained Ge1−xSnx(111) epitaxial layer using ion implantation

〇(M1)Yoshiki Kato1, Shigehisa Shibayama1, Mitsuo Sakashita1, Masashi Kurosawa1, Osamu Nakatsuka1,2 (1.Grad. Sch. Eng., Nagoya Univ., 2.IMaSS, Nagoya Univ.)
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9:15 AM - 9:30 AM JST(12:15 AM - 12:30 AM UTC)

[22a-A303-2]Stabilization of TiOx-based ReRAM characteristics by insertion of SiOx interlayer

〇Haruki Osawa1, Yuji Iwasawa1, Shinya Aikawa1 (1.Kogakuin Univ.)
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9:30 AM - 9:45 AM JST(12:30 AM - 12:45 AM UTC)Presentation by Applicant for JSAP Young Scientists Presentation Award

[22a-A303-3]Unique Characteristics of SiCN Dielectric Film for Plasma Activated Direct Bonding

〇Sodai Ebiko1, Koki Onishi1, Akira Uedono2, Serena Iacovo3, Fumihiro Inoue1 (1.Yokokoku Univ., 2.Tsukuba Univ., 3.imec)
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9:45 AM - 10:00 AM JST(12:45 AM - 1:00 AM UTC)

[22a-A303-4]Analysis of vacancies in wafer bonding interface by positron annihilation lifetime spectroscopy

〇Sotetsu Saito1, Nobutoshi Fujii1, Shunsuke Furuse1, Naoki Ogawa1, Suguru Saito1, Yoshiya Hagimoto1, Hayato Iwamoto1 (1.Sony Semiconductor Solutions Corp.)
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10:00 AM - 10:15 AM JST(1:00 AM - 1:15 AM UTC)

[22a-A303-5]Cu wiring formed on polyimide film by selective neutral electroless copper plating

〇Yudai Hirano1, Sugiura Osamu1 (1.Chiba Inst of Tech.)
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10:15 AM - 10:30 AM JST(1:15 AM - 1:30 AM UTC)

[22a-A303-6]Non-contact plating deposition of fine wiring by new electrolysis technology

〇Haruo Iwatsu1 (1.KMP Lavatory)
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10:30 AM - 10:45 AM JST(1:30 AM - 1:45 AM UTC)

[22a-A303-7]Etching simulation for Si oxide film by new electrolysis technology

〇Haruo Iwatsu1, Akira Matsushima2 (1.Kumamoto KMP Laboratory, 2.Fukuoka Institute of Technology)
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10:45 AM - 11:00 AM JST(1:45 AM - 2:00 AM UTC)

[22a-A303-8]Dependence of equilibrium electrode potential on magnetic field in cobalt ethylenediamine complex solution

〇Yuki Taguchi1, Sugiura Osamu1 (1.Chiba Inst of Tech)
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11:00 AM - 11:15 AM JST(2:00 AM - 2:15 AM UTC)

[22a-A303-9]Examination of Co-ALD using CCTBA for high-reliable interconnects

〇Jun Yamaguchi1, Noboru Sato1, Atsuhiro Tsukune1, Takeshi Momose1, Yukihiro Shimogaki1 (1.Univ. Tokyo)
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