The 87th JSAP Autumn Meeting 2026
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Session Details

Oral presentation13 Semiconductors : 13.4 Si processing /Si based thin film / MEMS / Equipment technology

[10a-E218-1~11]13.4 Si processing /Si based thin film / MEMS / Equipment technology

Thu. Sep 10, 2026 9:00 AM - 12:00 PM JST
Thu. Sep 10, 2026 12:00 AM - 3:00 AM UTC
E218 (First Year Education Bld. E Block)
9:00 AM - 9:15 AM JST(12:00 AM - 12:15 AM UTC)Presentation by Applicant for JSAP Young Scientists Presentation Award

[10a-E218-1]Research on photoresist etching of wafer edges using Atmospheric-pressure Reactive Thermal Plasma Jet (R-TPJ)

〇Shunsuke Satake1, Jiawen Yu1, Hiroaki Hanafusa1, Seiichiro Higashi1 (1.Hiroshima Univ.)
9:15 AM - 9:30 AM JST(12:15 AM - 12:30 AM UTC)

[10a-E218-2]Ultra-High-Speed Etching of SiO2 Films on Silicon Wafers Using a Reactive Atmospheric-Pressure Thermal Plasma Jet

〇Taiga Omoda1, Jiawen Yu1, Hiroaki Hanafusa1, Seiichiro Higashi1 (1.Hiroshima Univ.)
9:30 AM - 9:45 AM JST(12:30 AM - 12:45 AM UTC)Presentation by Applicant for JSAP Young Scientists Presentation Award

[10a-E218-3]Evaluation of Damages Indued by SiGe selective Etching and Subsequential Si Etching

〇Haruki Asanuma1, Tomoki Otani1, Yuta Ito1,2, Takuto Watanabe1, Atsushi Ogura1,3 (1.Meiji Univ., 2.JSPS Research Fellow, 3.MREL)
9:45 AM - 10:00 AM JST(12:45 AM - 1:00 AM UTC)

[10a-E218-4]Effect of substrate temperature during MgO deposition on SPC of a-Ge/MgO structures

〇(B)Haruki Yamada1, Yushi Fuchiwaki1, Naoto Mitsunaga1, Kenichiro Takakura1, Taizoh Sadoh2, Isao Tsunoda1 (1.NIT, Kumamoto College, 2.Kyushu Univ.)
10:00 AM - 10:15 AM JST(1:00 AM - 1:15 AM UTC)

[10a-E218-5]Investigation of Conditions for Controlling the Onset of Explosive Crystallization in Amorphous Silicon Films via Laser-Assisted FLA

〇Souma Shimabukuro1, Kensaku Maeda1, Keisuke Ohdaira1 (1.JAIST)
10:15 AM - 10:30 AM JST(1:15 AM - 1:30 AM UTC)

[10a-E218-6]Improvement of Thin SiO2 Reliability by Flash Lamp Annealing (FLA)

〇Kazuma Kyotani1, Ryoichi Kawai1, Kazuki Goshima1, Shohei Suga1, Shogo Shigemasu2, Hideaki Tanimura2, Katsuhiro Mitsuda2, Shinichi Kato2, Yasuo Nara1, Hiroshi Nohira1, Yuichiro Mitani1 (1.Tokyo City Univ., 2.SCREEN SPE)
10:45 AM - 11:00 AM JST(1:45 AM - 2:00 AM UTC)

[10a-E218-7][The 60th Young Scientist Presentation Award Speech] The scale effect of Si surface fine structure on heat transfer characteristics between water and Si

〇Jun Onoe1, Kantaro Kobayashi1, Rikuto Enoki1, Hiroaki Kakiuchi1, Hiromasa Ohmi1 (1.The Univ. of Osaka)
11:00 AM - 11:15 AM JST(2:00 AM - 2:15 AM UTC)Presentation by Applicant for JSAP Young Scientists Presentation Award

[10a-E218-8]Indirect evaluation of heat flux at the contact interface between nanostructured Si surface and water

〇Kantaro Kobayashi1, Jun Onoe1, Hiroto Shinya1, Hiroaki Kakiuchi1, Hiromasa Ohmi1 (1.the Univ of Osaka)
11:15 AM - 11:30 AM JST(2:15 AM - 2:30 AM UTC)Presentation by Applicant for JSAP Young Scientists Presentation Award

[10a-E218-9]Analysis of Gas Flow Velocity and Temperature on Within-Wafer Distribution in Single-Wafer Curing Tools

〇(M2)Haruki Ito1, Takuma Seki1, Takezo Mawaki1,2, Rihito Kuroda1,2 (1.Tohoku Univ., 2.Tohoku Univ. (NICHe.))
11:30 AM - 11:45 AM JST(2:30 AM - 2:45 AM UTC)

[10a-E218-10]Investigation of Fiber Bundle Configuration in an Optical-Interference Contactless Thermometry (OICT) System Using a Fiber-Optic Bundle

〇Taiyo Yagi1, Harumu Ono1, Jiawen Yu1, Hiroaki Hanafusa1, Seiichiro Higashi1 (1.Hiroshima Univ.)
11:45 AM - 12:00 PM JST(2:45 AM - 3:00 AM UTC)

[10a-E218-11]Real-time surface temperature distribution measurement of silicon wafer using Optical Interference Contactless Thermometry (OICT)

〇Harumu Ono1, Taiyo Yagi1, Jiawen Yu1, Hiroaki Hanafusa1, Seiichiro Higashi1 (1.Hiroshima Univ.)
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