Session Details
[8a-N301-1~11]15.4 III-V-group nitride crystals
Mon. Sep 8, 2025 9:00 AM - 12:00 PM JST
Mon. Sep 8, 2025 12:00 AM - 3:00 AM UTC
Mon. Sep 8, 2025 12:00 AM - 3:00 AM UTC
N301 (Lecture Hall North)
[8a-N301-1]AlN molar fraction dependence of hole concentration in polarization-doped AlGaN without Mg doping
〇Teppei Takehisa1, Hibiki Muto1, Sena Miura1, Marina Fujita1, Kenta Takase1, Hisanori Ishiguro1, Tetsuya Takeuchi1, Satoshi Kamiyama1, Motoaki Iwaya1, Yoshiki Saito2, Koji Okuno2 (1.Meijo Univ., 2.TOYODA GOSEI)
[8a-N301-2]ITO film thickness dependence of highly reflective ITO/Al electrodes for deep ultraviolet LED
〇Kenta Takase1, Naoki Hamashima1, Ryuunosuke Oka1, Sena Miura1, Teppei Takehisa1, Hibiki Muto1, Marina Fujita1, Tetsuya Takeuchi1, Satoshi Kamiyama1, Motoaki Iwaya1, Hisanori Ishiguro1, Yoshiki Saito2, Koji Okuno2 (1.Meijjo Univ., 2.TOYODA GOSEI)
[8a-N301-3]Study on Graded AlGaN Layer in AlGaN-based Far-UVC LEDs
〇Ryota Akaike1,2, Hiroki Yasunaga2,3, Takao Nakamura1,2, Shuhei Ichikawa4,5, Kazunobu Kojima4, Masahiko Tsuchiya6, Hideto Miyake1,2 (1.Grad. Sch. of Eng., Mie Univ., 2.IC-SDF, Mie Univ., 3.ORIP, Mie Univ., 4.Grad. Sch. of Eng., Osaka Univ., 5.UHVEM, Osaka Univ., 6.Stanley Electric Co.)
[8a-N301-4]High Quality of DC-sputtered AlN Assisted by High Temperature Annealing and Demonstration of 0.42% Efficient far-UVC LED
〇Muhammad Ajmal Khan1, Yuya Nagata1,2, Kohei Fujimoto1,2, Hiromitsu Sakai3, Yukio Kashima1, Eriko Matsuura1, Hiroyuki Yaguchi2, Atsushi Maeoka4, Atsushi Osawa4, Hideki Hirayama1 (1.RIKEN, Japan, 2.Saitama Univ., Japan, 3.Shin-Etsu Chemical Japan, 4.SCREEN Holdings Co., Ltd Japan)
[8a-N301-5]Countermeasures for the degradation of 275-nm-band AlGaN LEDs
〇Shigefusa Chichibu1, Kohei Shima1, Koji Okuno2, Masaki Oya2, Atsushi Miyazaki2, Shin-ya Boyama2, Yoshiki Saito2, Yoshio Honda3, Hiroshi Amano3, Hisanori Ishiguro4, Tetsuya Takeuchi4 (1.Tohoku Univ., 2.Toyoda Gosei, 3.Nagoya Univ., 4.Meijo Univ.)
[8a-N301-6]Low-Temperature Annealing and Interface Reaction Analysis for Ohmic Contacts in AlGaN UV-B LDs
〇(M1)Ryota Watanabe1, Takumu Saito1, Shundai Maruyama1, Rintaro Miyake1, Shogo Karino1, Yusuke Sasaki1, Naoki Kitta1, Seiya Kato1, Yuma Miyamoto1, Sion Kamiya1, Sho Iwayama1, Yasuo Koide1, Hideto Miyake2, Satoshi Kamiyama1, Tetsuya Takeuchi1, Motoaki Iwaya1 (1.Meijo Univ., 2.Mie Univ.)
[8a-N301-7]AlGaN UV-B refractive index waveguide laser diodes: dependence of Optical characteristics and etching effects
〇(M2)Rintaro Miyake1, Takumu Saito1, Shundai Maruyama1, Shogo Karino1, Yusuke Sasaki1, Shion Kamiya1, Ryota Watanabe1, Yuma Miyamoto1, Naoki Kitta1, Seiya Kato1, Syo Iwayama1, Motoaki Iwaya1, Tetsuya Takeuchi1, Satoshi Kamiyama1, Hideto Miyake2 (1.Meijo Univ., 2.Mie Univ.)
[8a-N301-8]Improvement of optical gain by low-temperature growth in AlGaN-based UV-B
〇(M2)Shundai Maruyama1, Takumu Saito1, Rintaro Miyake1, Yusuke Sasaki1, Shogo Karino1, Seiya Kato1, Naoki Kitta1, Ryota Watanabe1, Yuma MIyamoto1, Shion Kamiya1, Sho Iwayama1, Hideto MIyake2, Satoshi Kamiyama1, Tetsuya Takeuchi1, Motoaki Iwaya1 (1.Meijo Univ, 2.Mie Univ)
[8a-N301-9]Impact of Growth Temperature on PL FWHM in AlGaN Layers of LD-Designed Samples
〇(M2)Takumu Saito1, Rintaro Miyake1, Shundai Maruyama1, Yusuke Sasaki1, Shogo Karino1, Seiya Kato1, Naoki Kitta1, Ryota Watanabe1, Yuma Miyamoto1, Shion Kamiya1, Sho Iwayama1, Hideto Miyake2, Yoshihiro Kangawa3, Satoshi Kamiyama1, Tetsuya Takeuchi1, Motoaki Iwaya1 (1.Meijo Univ., 2.Mie Univ., 3.Kyushu Univ.)
[8a-N301-10]Demonstration of high carrier injection efficiency (>50%) AlGaN-based UV-B laser diodes
〇(M2)Takumu Saito1, Rintaro Miyake1, Shundai Maruyama1, Yusuke Sasaki1, Shogo Karino1, Seiya Kato1, Naoki Kitta1, Ryota Watanabe1, Yuma Miyamoto1, Shion Kamiya1, Sho Iwayama1, Hideto Miyake2, Satoshi Kamiyama1, Tetsuya Takeuchi1, Motoaki Iwaya1 (1.Meijo Univ., 2.Mie Univ.)
[8a-N301-11]Reliability Evaluation in AlGaN-based UV-B Laser Diodes
〇(M1)Shion Kamiya1, Takumu Saito1, Rintaro Miyake1, Shundai Maruyama1, Yusuke Sasaki1, Shogo Karino1, Seiya Kato1, Naoki Kitta1, Ryota Watanabe1, Yuma Miyamoto1, Sho Iwayama1, Hideto Miyake2, Satoshi Kamiyama1, Tetsuya Takeuchi1, Motoaki Iwaya1 (1.Meijo Univ., 2.Mie Univ.)