The 72nd JSAP Spring Meeting 2025
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Session Details

Oral presentation13 Semiconductors : 13.4 Si processing /Si based thin film / MEMS / Equipment technology

[17p-K103-1~9]13.4 Si processing /Si based thin film / MEMS / Equipment technology

Mon. Mar 17, 2025 1:30 PM - 4:00 PM JST
Mon. Mar 17, 2025 4:30 AM - 7:00 AM UTC
K103 (Lecture Hall Bldg.)
Reo Kometani(Univ. of Tokyo), Yan Wu(Tokyo Inst. of Tech.)
1:30 PM - 1:45 PM JST(4:30 AM - 4:45 AM UTC)

[17p-K103-1]Formation of Ferroelectric HfNx Films Using Minimal Fab Reactive Sputtering Tool

〇Shuichi Noda1, Yuuki Yabuta2, Naoko Yamamoto2, Ryuichiro Kamei2, Noriko Miura1, Shinichi Ikeda1, Shiro Hara1,3 (1.AIST, 2.Seinan-kogyo, 3.Hundred Semiconductors)
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1:45 PM - 2:00 PM JST(4:45 AM - 5:00 AM UTC)

[17p-K103-2]In-plane Homogenization of Sheet Resistance of MOSFETs on a wafer using Minimal-Fab Spin-on Dopant Process (II)

〇Shuhei Nakamichi1, Hiroyoshi Hongoh2, Noriko Miura2, Shinichi Ikeda2, Shiro Hara1,2 (1.MinimalFab, 2.AIST)
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2:00 PM - 2:15 PM JST(5:00 AM - 5:15 AM UTC)

[17p-K103-3]Study of resist etch-back planarization process using Minimal Fab equipment

〇Hiroyuki Tanaka1, Shunichiro Shinbori2, Satoshi Takahashi2, Hiroshige Kogayu1, Noriko Miura1, Shinichi Ikeda1, Shiro Hara1,3 (1.AIST, 2.SUNYOU, 3.HS)
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2:15 PM - 2:30 PM JST(5:15 AM - 5:30 AM UTC)

[17p-K103-4]Fabrication of microlens molds by hydrogen annealing using Minimal Fab

〇Kengo Hamada1,4, Ying Huang3, Noriko Sato3, Takashi Chiba1,4, Masao Terada1,4, Kazushige Sato1,4, Noriko Miura2, Shinichi Ikeda2, Shiro Hara1,2, Yoshiaki Kanamori3 (1.MINIMAL, 2.AIST, 3.Tohoku Univ., 4.SAKAGUCHI ELECTRIC HEATERS)
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2:45 PM - 3:00 PM JST(5:45 AM - 6:00 AM UTC)

[17p-K103-5]Development of photo resist process with high viscosity resist for a half inch diameter wafer

〇Ryuhei Sekifuji1, Hiroshige Kogayu2, Hiroyuki Tanaka2, Noriko Miura2, Shinichi Ikeda2, Shiro Hara1,2 (1.Hundred, 2.AIST)
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3:00 PM - 3:15 PM JST(6:00 AM - 6:15 AM UTC)

[17p-K103-6]Investigation of process uniformity within a half inch wafer for wafer droplet cleaning technology

〇Kazumasa Nemoto1, Noriko Noriko1, Shinichi Ikeda1, Shiro Hara1,2 (1.AIST, 2.Hundred)
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3:15 PM - 3:30 PM JST(6:15 AM - 6:30 AM UTC)

[17p-K103-7]Application study of hydrogen atmosphere surface treatment using the Minimal Fab laser heating tool to semiconductor CMOS devices(Ⅱ)

〇kazushige sato1,2, Takashi Chiba1,2, Masao Terada1,2, Kengo Hamada1,2, Yoshiaki Kanamori3, Noriko Miura4, Shinichi Ikeda4, Shiro Hara1,4 (1.MINIMAL, 2.SAKAGUCHI ELECTRIC HEATERS, 3.TOHOKU UNIV., 4.AIST)
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3:30 PM - 3:45 PM JST(6:30 AM - 6:45 AM UTC)

[17p-K103-8]Uniformity of device characteristics using Minimal Water Plasma Ashing process

〇Noriko Miura1, Hiroyoshi Hongoh1, Takeshi Aizawa2, Mitsunori Nogawa2, Yasuhiro Onishi2, Tatsuo Ishijima3, Shinichi Ikeda1, Shiro Hara1,4 (1.AIST, 2.YONEKURA, 3.KANAZAWA Univ., 4.Hundred)
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3:45 PM - 4:00 PM JST(6:45 AM - 7:00 AM UTC)

[17p-K103-9]Analysis of wafer in-plane variation factors in Minimal Fab

〇Hiroyoshi Hongoh1, Shuichi Noda1, Noriko Miura1, Shinichi Ikeda1, Shiro Hara1,2 (1.AIST, 2.Hundred)
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