Session Details
[5P93-105]Poster Session 3
Thu. Oct 24, 2024 11:00 AM - 2:00 PM JST
Thu. Oct 24, 2024 2:00 AM - 5:00 AM UTC
Thu. Oct 24, 2024 2:00 AM - 5:00 AM UTC
P7: Vacuum Technology and Surface Engineering(1F)
[5P93]Plasma etching of ultrathin quartz glass using inward plasma
*Toshitaka Kubo1, Chikatsu Iwase2, Ryo Kanou2, Shouta Shiba2, Tetsuo Shimizu2 (1. National Institute of Advanced Industrial Science and Technology (AIST), 2. Sanyu Co., Ltd.)
[5P94]Development of Operando Soft X-ray XAFS Measurement System of Battery Materials using Sample Transfer and Manipulator Device
*Eiichi Kobayashi1, Atsushi Inoishi2 (1. Kyushu Synchrotron Light Research Center, 2. Institute for Materials Chemistry and Engineering, Kyushu University)
[5P95]Fabrication of Aluminum Oxide Thin Films by Plasma Immersion Lattice Target Sputtering Method
*Yuu Kiyama1, Takanobu Ima1, Yuuki Yamasaki1, Masamichi Naitoh1, Tomonori Ikari2 (1. Kyushu Institute of Technology, 2. National Institute of Technology, Ube Collage)
[5P96]Application of Oxygen-Free Pd/Ti Nonevaporable Getter (NEG) Deposition to a Large Chamber with DN200CF (CF253) Ports
*Takashi Kikuchi1, Ryoma Kataoka1, Hirokazu Tanaka1, Daisuke Wakabayashi1,2, Takuji Ohigashi1,2, Kazuhiko Mase1,2 (1. Institute of Materials Structure Science, KEK, 2. Department of Materials Structure Science, SOKENDAI)
[5P97]Plasma enhanced nitriding process of titanium oxide films using reactive plasma assisted deposition
*Takahisa Ichinohe1, Hideki Ohno1, Seiichi Sato2 (1. National Institute of Technology, Tokyo College, 2. Graduate School of Science, University of Hyogo)
[5P98]Graphical user interface for high-throughput peak fitting by Spectrum adapted ECM algorithm
*Tarojiro Matsumura1, Naoka Nagamura2,3, Shotaro Akaho4, Kenji Nagata2, Yasunobu Ando1 (1. National Institute of Advanced Industrial Science and Technology (AIST), Research Center for Computational Design of Advanced Functional Materials (CD-FMat), 2. National Institute for Materials Science (NIMS), Center for Basic Research on Materials, 3. Faculty of Advanced Engineering, Tokyo University of Science, 4. National Institute of Advanced Industrial Science and Technology (AIST), Human Informatics and Interaction Research Institute (HIIRI))
[5P99]Oxygen-Free Pd/Ti Nonevaporable Getter (NEG) Deposition Applied for DN16 ConFlat (CF34) Cube and Flanges
Hiromu Nishiguchi3, Takashi Kikuchi1, *Kazuhiko Mase1,2 (1. KEK-IMSS-PF, 2. SOKENDAI, 3. Baroque International Inc.)
[5P100]Improvement in Stability of Reactivation Performance of Oxygen-Free Pd/Ti Deposited Nonevaporable Getter (NEG) Pump
*YU KANO1, Kenichi Hamanaka1, Manabu Yabe1, Yoshihiro Kato1, Yusuke Masaoka1, Takashi Kikuchi2, Kazuhiko Mase2,3 (1. Irie Koken Co., Ltd., 2. KEK, 3. SOKENDAI)
[5P101]Characterization of Diamond-Like Carbon Films Doped with Silicon, Nitrogen, and Oxygen Prepared by Plasma-Enhanced Chemical Vapor Deposition
*Yuya Yamazaki1, Yushi Suzuki1, Yasuyuki Kobayashi1, Hideki Nakazawa1 (1. Graduate School of Science and Technology, Hirosaki University)
[5P102]Effects of plasma immersion of tetramethylsilane on its decomposition
Atsuya Kuwada1, Yuto Oishi1, *MASANORI SHINOHARA2 (1. Graduate School of Engineering, Fukuoka University, 2. Department of Electrical Engineering, Fukuoka University)
[5P103]Deposition of tin monoxide film using high-power impulse magnetron sputtering
*Yuta Saito1, Kazuya Ota2, Kosuke Takenaka2, Yuichi Setsuhara2, Takayuki Ohta1 (1. Department of Electrical and Electronic Engineering, Meijo University, 2. Joining and welding research institute, Osaka university)
[5P104]Deposition of nitrogen-doped titanium oxide for photocatalysts by reactive rf magnetron sputtering
*Shuta Ando1, Takayuki Ohta1 (1. Department of Electrical and Electronic Engineering, Meijo University)
[5P105]Effect of carrier gas on deposition of gallium oxide films using hot-wall type mist CVD
*Tomoki Iwata1, Takayuki ohta1 (1. Department of Electrical and Electronic Engineering, Meijo university)