2023 International Conference on Solid State Devices and Materials

2023 International Conference on Solid State Devices and Materials

Sep 5 - Oct 31, 2023Nagoya Congress Center

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International Conference on Solid State Devices and Materials
2023 International Conference on Solid State Devices and Materials

2023 International Conference on Solid State Devices and Materials

Sep 5 - Oct 31, 2023Nagoya Congress Center

You can search for presentations in this event.

Search

Search Results(612)

[OP-01]Welcome Address

Seiichi Miyazaki1(1. General Chair, Organizing Committee)

[OP-02]Welcome Address

Toshiro Hiramoto1(1. President, The Japan Society of Applied Physics)

[A-2-06 (Late News)]Multilevel Storage Enabled by Light Erasable GNDs Floating Gate Transistor with MoS 2 Channel

Han Hsiang Tai1, Yu Yuan Su1, Jer Chyi Wang1,2,3, Wen Hao Chang4,5, Chao Sung Lai1,6,7(1. Department of Electronic Engineering, Chang Gung Univ. (Taiwan), 2. Department of Neurosurgery, Chang Gung Memorial Hospital (Taiwan), 3. Department of Electronic Engineering, Ming Chi Univ. of Tech. (Taiwan), 4. Research Center for Applied Sciences, Academia Sinica (Taiwan), 5. Department of Electrophysics, National Yang Ming Chiao Tung Univ. (Taiwan), 6.Department of Nephrology, Chang Gung Memorial Hospital (Taiwan), 7.Department of Materials Engineering, Ming Chi Univ. of Tech. (Taiwan))

[A-3-02]Ultra-High Packing Density Vertical GaN Nanocolumn SBDs using Bottom-Up Growth Approach

Hiroyuki Shimada1, Hironobu Kariyazono1, Yohei Nakagawa1, Shinji Terao1, Kentaro Takayanagi1, Koichiro Akasaka1, Shunsuke Ishizawa1, Koichi Morozumi2, Rie Togashi3, Katsumi Kishino3(1. Core Tech. Development Dept., Seiko Epson Corp. (Japan), 2. Material Analysis & CAE Center, Seiko Epson Corp. (Japan), 3. Sophia Nanotech. Res. Center, Sophia Univ. (Japan))

[A-4-04]Thermal Desorption Study of PCz-sorted SWCNTs for Electronic Hourglass Device

Yang Xu1, Jiayi Wang1, Nannan You1, Hong Dong3, Weihua Wang3, Xuelei Liang4, Shengkai Wang1,2(1. Inst. of Microelectronics of Chinese Academy of Sci. (China), 2. Univ. of Chinese Academy of Sci. (China), 3. Department of Electronic Sci. and Eng. and Tianjin Key Lab. of Photo-Electronic Thin Film Device and Tech., Nankai Univ. (China), 4. Key Lab. for the Physics and Chemistry of New Device, Peking Univ. (China))

[B-2-01 (Invited)]Cryogenic InGaAs HEMTs for LNA and routing circuits in Quantum Computing

Sanghyeon Kim1, Jaeyong Jeong1, Seong Kwang Kim1, Yoon-Je Suh1, Jisung Lee2, Joonyoung Choi3, Juhyuk Park1, Joon Pyo Kim1, Bong Ho Kim1, Younjung Jo3, Dae-myeong Geum4, Seung-Young Park2, Jongmin Park5(1. KAIST (Korea), 2. KBSI (Korea), 3. KNU (Korea), 4. CBNU (Korea), 5. KANC (Korea))

[B-2-03]Aharonov-Bohm-type oscillations in selectively-grown polymorphic core/shell GaAs/InAs nanowires

Farah Basaric1,4, Anton Faustmann1,4, Alexander Pawlis2,4, Patrick Zellekens3,5,6, Russel Deacon3,5, Benjamin Bennemann2,4, Detlev Grützmacher2,1,4, Koji Ishibashi3,5, Thomas Schäpers1,4(1. Peter Grünberg Inst. 9, Res. center Jülich (Germany), 2. Peter Grünberg Inst. 10, Res. center Jülich (Germany), 3. RIKEN Center for Emergent Matter Sci. (Japan), 4. JARA-Fundamentals of Future Info. Tech., Jülich-Aachen Res. Alliance, Research center Jülich and RWTH Aachen Univ. (Germany), 5. RIKEN Advanced Device Lab. (Japan), 6.Special Postdoctoral Res. Program (SPDR), RIKEN (Germany))

[B-2-04]Crosstalk Effect for Acousto-Electric Quantized Current

Shunsuke Ota1,2, Junliang Wang3, Hermann Edlbauer3, Yuma Okazaki2, Shuji Nakamura2, Takehiko Oe2, Arne Ludwig4, Andreas D Wieck4, Tetsuo Kodera1, Christopher Bauerle3, Shintaro Takada2, Nobu-Hisa Kaneko2(1. Tokyo Tech (Japan), 2. AIST (Japan), 3. Inst. Neel (France), 4. Ruhr-Univ. Bochum (Germany))

[B-2-05]The high concentration NV ensembles formed from heavily nitrogen-doped CVD diamond with high quality

Yudai Asano1, Kyosuke Hayasaka1, Mayu Ueda1, Kosuke Kimura2,3, Takashi Tanii1, Shinobu Onoda2, Shinpei Enomoto4, Hiroshi Kawarada1,4(1. Waseda Univ. (Japan), 2. National Inst. of Quantum and Radiological Sci. and Tech. (Japan), 3. Gunma Univ. (Japan), 4. Kagami Memorial Res. Inst. for Materials Sci. and Tech. (Japan))

[B-3-04 (Late News)]Ferromagnetic Semiconductor (Ga,Fe)Sb with Very High Curie Temperature (530 K) Grown on Vicinal GaAs(001) Substrates

Kenta Takabayashi1, Masaaki Tanaka2,3, Pham Nam Hai1,3(1. Department of Electrical and Electronic Eng., Tokyo Inst. of Tech. (Japan), 2. Department of Electrical Engineering and Info. System, The Univ. of Tokyo, Tokyo 113-8656 (Japan), 3. Center for Spintronics Res. Network (CSRN), The Univ. of Tokyo, Tokyo 113-8656 (Japan))

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