*Ching-Lin Fan1, Xiang-Wei Yu1, Yung-Sheng Tsai1
(1. Nation Taiwan University of Science and Technology (Taiwan))
*Ryuta Murase1, Ryoto Niwa1, Tatsuo Ueda1, Keigo Terada1, Yoshiyuki Hasegawa1, Daiki Fujikake1, Ryosuke Yamazaki1, Giichiro Uchida1
(1. Meijo University (Japan))
*Daiki Fujikake1, Tomoki Omae1, Tastuo Ueda1, Keigo Terada1, Yoshiyuki Hasegawa1, Ryuta Murase1, Ryosuke Yamazaki1, Giichiro Uchida1
(1. Meijo University (Japan))
*Yoshiyuki Hasegawa1, Tatsuo Ueda1, Keigo Terada1, Daiki Fujikake1, Ryuta Murase1, Ryosuke Yamazaki1, Giichiro Uchida1
(1. Meijo University (Japan))
*Tatsuo Ueda1, Tomoki Omae1, Daiki Fujikake1, Keigo Terada1, Yoshiyuki Hasegawa1, Ryosuke Yamazaki1, Ryuta Murase1, Giichiro Uchida1
(1. Meijo University (Japan))
*Keigo Terada1, Masayuki Ishihara1, Tatsuo Ueda1, Yoshiyuki Hasegawa1, Daiki Fujikake1, Ryuta Murase1, Ryosuke Yamazaki1, Giichiro Uchida1
(1. Meijo University (Japan))
*Ryosuke Yamazaki1, Tastuo Ueda1, Keigo Terada1, Yoshiyuki Hasegawa1, Daiki Fujikake1, Ryuta Murase1, Giichiro Uchida1
(1. Meijo University (Japan))
*Solee Park1, Woojin Park1, Se Youn Moon1
(1. Department of Applied Plasma and Quantum Beam Engineering, Jeonbuk National University (Korea))
*Yuan-Kai Li1, Yuan-Xi Shen1, Ta-Chin Wei1
(1. Chung Yuan Christian University (Taiwan))
*Ji-Myon Lee1
(1. Sunchon National University (Korea))
*Manato Eri1, Shinjiro Ono1, Shumpei Ohara1, Takamasa Okumura1, Kunihiro Kamataki1, Haruki Kiyama1, Naho Itagaki1, Kazunori Koga1, Masaharu Shiratani1
(1. Kyushu University (Japan))
*Taketo Nagai1, Toru Harigai1, Masahiro Esaki1, Akihiko Ito1, Hiroyuki Kousaka1
(1. Gifu University (Japan))
*Taketo Nagata1, Kazuya Ota2, Kosuke Takenaka2, Yuichi Setsuhara2, Takayuki Ohta1
(1. Meijo University (Japan), 2. Osaka University (Japan))
*Daiki Horikawa1, Takayuki Ohta1
(1. Meijo University (Japan))
*Yoshihisa Osano1,2, Tatsuyuki Nakatani2
(1. Mitsubishi Pencil Co., Ltd (Japan), 2. Okayama University of Science (Japan))
Wei-Kai Wang1, *Yu-Cheng Chang2, Chih-Feng Jung2, Chau-Yi Tsai2, Shih-Yung Huang1
(1. Da-Yeh University (Taiwan), 2. National Formosa University (Taiwan))
*Shih-Yung Huang1, Yu-Hao Chang2, Wei-Kai Wang1
(1. Da-Yeh University (Taiwan), 2. National Formosa University (Taiwan))
*Akihisa Ogino1, Keitatsu Ishikawa1
(1. Shizuoka University (Japan))
*HAYOUNG CHOI1, JONGWOON Kim1, SEYOUN MOON1
(1. Jeonbuk National University (Korea))
*Yung-I Chen1, Yu-Ting Ye1, Li-Chun Chang2
(1. National Taiwan Ocean University (Taiwan), 2. Ming Chi University of Technology (Taiwan))
Se-Hyuk Seo1, Myung-Jin Jung1, *SE-Hun Kwon1
(1. Pusan National University (Korea))
*Yu-Shan Hsieh1, Yi-Xuan Chen2, Yi-Xin He1, Chao-Hsin Chien2, Yu-Hsien Lin1
(1. National United University (Taiwan), 2. National Yang Ming Chiao Tung University (Taiwan))
*Toru Harigai1, Seigo Takashima1, Kenichi Inoue2, HIroyuki Kousaka1, Kenji Ishikawa2, Masaru Hori2
(1. Gifu University (Japan), 2. Nagoya University (Japan))
*Shin Kajita1, Shogo Kodate1, Shunsuke Kato1, Quan Shi1, Yuki Hayashi1
(1. The University of Tokyo (Japan))
*Inkyoung Cho1, Chang-Koo Kim1
(1. Ajou University (Korea))
*NGUYEN TRUNG TRAN1, Hiroshi Iwayama2, Toshio Hayashi 1, Kenji Ishikawa1
(1. Center for Low-temperature Plasma Science, Nagoya University (Japan), 2. UVSOR Synchrotron Facility (Japan))
*Junyoung Kim1, Chang-Koo Kim1
(1. Ajou University (Korea))
*Minuk Kim1, Chang-Koo Kim1
(1. Ajou University (Korea))
*Hsuan Man Wu1, Yu Feng Hsu1, Ta Chin Wei1
(1. Chung Yuan Christian University (Taiwan))
*Eunsu Lee1, Yeonock Han2, Daeun Hong3, Minsung Jeon1, Heeyeop Chae3,1
(1. Department of Semiconductor Convergence Engineering, Sungkyunkwan University (SKKU) (Korea), 2. Department of Semiconductor and Display Engineering, Sungkyunkwan University (SKKU) (Korea), 3. School of Chemical Engineering, Sungkyunkwan University (SKKU) (Korea))
*Manabu Yasui1, Yoshitake Nishi1, Daishi Shiojiri1, Masahito Kurouchi1, Satoru Kaneko1, Masahiko Mitsuhashi1
(1. Kanagawa Institute of Industrial Science and Technology (Japan))
*Thi-Thuy-Nga Nguyen1, Kazunori Shinoda2, Shih-Nan Hsiao1, Kenji Maeda2, Kenetsu Yokogawa2, Masaru Izawa2, Kenji Ishikawa1, Masaru Hori 1
(1. Nagoya University (Japan), 2. Hitachi High-Tech Corp. (Japan))
*Masato Nagano1, Han Gang1, Minoru Sasaki1
(1. Toyota Technological Institute (Japan))
*Ci-Song Chen1, I-Chih Ni1, Chih-I Wu1, Cheng-Che Hsu1, I-Chun Cheng1, Jian-Zhang Chen1
(1. National Taiwan University (Taiwan))
*Bo-Yan Hong1, I-Chih Ni1, Chih-I Wu1, Cheng-Che Hsu1, I-Chun Cheng1, Jian-Zhang Chen1
(1. National Taiwan University (Taiwan))
*Li-Chun Chang1, Sheng-En Lin1
(1. Ming Chi University of Technology (Taiwan))
*Katsunori Makihara1,2, Haruto Saito1, Yuji Yamamoto2, Markus Andreas Schubert2, Seiichi Miyazaki3
(1. Nagoya University (Japan), 2. IHP - Leibniz-Institut für innovative Mikroelektronik (Germany), 3. Hiroshima University (Japan))
Chun-Yuan Huang1, Jun-Ting Lin1, *Zi-Hao Wang2
(1. National Taitung University (Taiwan), 2. National Cheng Kung University (Taiwan))
*Kakuto Watanabe1, Keiji Nakamura1, Daisuke Ogawa1
(1. Chubu Univ. (Japan))
*Naoto Ohshima1, Yuki Tsuchizu1, Kenichi Uehara2, Shinya Fukuchi3, Yasuo Nakai3, Shigeo Yasuhara2, Wakana Takeuchi1
(1. Aichi Institute of Technology (Japan), 2. Japan Advanced Chemicals Ltd. (Japan), 3. Koatsu Gas Kogyo Co. (Japan))
*Yuki Tsuchizu1, Naotot Oshima1, Ginga Saeki1, Kenichi Uehara2, Satoru Kaneko3, Masahito Kurouchi3, Shigeo Yasuhara2, Wakana Takeuchi1
(1. Aichi Institute of Technology (Japan), 2. Japan Advanced Chemicals Ltd. (Japan), 3. Kanagawa Institute of Industrial Science and Technology (KISTECH) (Japan))
*Shigeaki ABE1, MAHDIS NESABI1, SIRUS SAFAEE1, TENG GE1, QI YIN1, ALIREZA VALANEZHAD, YUKO ERA2, Ikuya WATANABE1, Teruo KUSAKA3, Hiroho TACHIKAWA3
(1. Nagasaki University (Japan), 2. Saitama Prefectural University (Japan), 3. Hokkaido University (Japan))
*TANGYU LAI1, Tsun-Lirng Yang2, Kuo-Chin Hsu2
(1. R.O.C. Air Force Academy (Taiwan), 2. National Kaohsiung University of Science and Technology (Taiwan))
*Yi-Xin He1, Yu-Shan Hsieh1, Yu-Hsien Lin1
(1. National United University (Taiwan))
*Ken Akamatsu1, Takashi Kondo2, Hiromasa Tanaka2
(1. QST (Japan), 2. cLPS, Nagoya University (Japan))
*Tien Ngoc Thuy Nguyen1,2, Huong Thi Dang1,2, Hoon Byung Kim1,2
(1. Chosun University, College of Dentistry (Korea), 2. Chosun University, Convergence Research Center for Treatment of Oral Soft Tissue Disease (MRC) (Korea))
*Yi Shan Jhu1, Antoine Venault1, Yung Chih Chen1, Shuo Hsi Tang1, Ta Chin Wei1, Yung Chang1, Ching Fu Weng2, Patrice Bacchin3
(1. Chung Yuan Christian University (Taiwan), 2. Hsinchu Cathay General Hospital (Taiwan), 3. Universit´e de Toulouse (France))
*Hiroaki Nakamura1,2, Masahuki Murai2, Kensei Kobayashi3, Masahiro Kobayashi1,4, Seiki Saito5
(1. National Institute for Fusion Science (Japan), 2. Nagoya University (Japan), 3. Yokohama National University (Japan), 4. SOKENDAi, The Graduate University for Advanced Studies (Japan), 5. Yamagata University (Japan))
*Kyoko Kanamaru1, Chiyoko Machida1, Hiroshi Hashizume2, Masaru Hori2
(1. Chubu university (Japan), 2. Nagoya university (Japan))
*Hayato Shigematsu1, Takashi Furukawa2, Takahisa Ueno1
(1. National Institute of Technology, Oita (Japan), 2. Kitasato (Japan))
