Session Details

[14p-P02-1~20]6.4 Thin films and New materials

Fri. Mar 14, 2025 1:30 PM - 3:30 PM JST
Fri. Mar 14, 2025 4:30 AM - 6:30 AM UTC
P02 (Gymnasium)

[14p-P02-1]Fabrication and characteristics of Cu thin films by mist CVD

〇(M1)Tatsuki Okada1, Ryousuke Ohashi1, Tatsuya Yasuoka, Toshiyuki Kawaharamura1,2, Htet Su WAI1,2 (1.Kochi University of Technology, 2.Research Inst)
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[14p-P02-2]Syntheses of Binary Copper-Based Semiconductor Thin Films by Mist CVD

〇Ibuki Shoda1, Oka Daichi1, Hirose Yasushi1 (1.Tokyo Metropolitan Univ.)
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[14p-P02-3]Evaluation of hybrid improper ferroelectricity of perovskite oxynitride superlattices

〇Kunito Mizukoshi1, Kei Shigematsu2, Daichi Oka1, Yasushi Hirose1 (1.Tokyo Metropolitan Univ., 2.Science Tokyo)
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[14p-P02-4]Effect of Post deposition Annealing on Fe3O4 Thin Film Deposited via Electron Cyclotron Resonance Sputtering

〇(D)Jannatul Ferdousy1, Yingshu Ma1, Md. Faysal Kabir1, Md Tauhidul Islam1, Masashi Akabori1 (1.Japan Advanced Institute of Science and Technology)
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[14p-P02-5]Fabrication and structural analyses of HfxZr1-xO2 gate insulators by Metal organic decomposition method

〇(BC)Ryoga Takemoto1, Hiroshi Takase1, Towa Nakazawa1, Daiji Kitamura1,2, Yoshiki Tate1,2, Yuta Kawano1,2, Kazuto Koike1,2, Nobuya Hiroshiba1,2 (1.OIT, 2.OIT NMRC)
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[14p-P02-6]Changes in precursors of Bi-substituted rare earth iron garnets films prepared by MOD method

〇Keigo Kangori1, Masami Kawahara2, Shun Nakazawa1, Fatima Zahra Chafi1, Masami Nishikawa1, Takayuki Ishibashi1 (1.Nagaoka Univ. of Tech., 2.Kojundo Chem. Lab.)
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[14p-P02-7]Enhanced Photoelectrochemical Performance Using Nanostructured Tungsten Oxide Thin Films Deposited by Pulsed Laser Deposition

〇(D)Qi Xue1, Shogo Kodate1, Shin Kajita1 (1.The Univ. of Tokyo)
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[14p-P02-8]Improvement of Thermal Stability of Sb3Te by N Doping for High Performance of Phase Change Device

〇(M1)Shota Yoshimoto1, Shunsuke Yahagi1, Mutsumi Miuchi1, You Yin1 (1.Gunma Univ.)
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[14p-P02-9]O-doped GeTe/Sb2Te3 Multilayer Phase-Change Material

〇Mutsumi Miuchi1, Kazuki Matsuda1, Shota Yoshimoto1, Eiji Sawai1, You Yin1 (1.Gunma Univ.)
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[14p-P02-10]Evaluation of Crystallinity of MnTe Films as a Function of Deposition Temperature

〇Isamu Arai1,2, Shota Awazuhara1,2, Masashi Kuwahara2, Aiko Narazaki2, Kunio Okimura3, Satoshi Katano1 (1.Toyo Univ., 2.AIST, 3.Tokai Univ.)
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[14p-P02-11]Growth of hexagonal ZnSnN2 layer by UHV sputter epitaxy method (IV)

〇Kaito Horikoshi1, Toshiki Nagasawa1, Keisuke Yoshida1, Hiroyuki Shinoda1, Nobuki Mutsukura1 (1.Tokyo Denki Univ.)
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[14p-P02-12]Degradation mechanism of flexibility in B-doped In2O3-based transparent conductive film

〇(B)Yuya Yasaki1, Kanta Kibishi1, Yoshikazu Shin1 (1.Kogakuin Univ.)
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[14p-P02-13]High temperature annealing property in Cerium-Doped hydrogenated In2O3(ICO:H)

〇Koya Kudo1,2, Chia-Tsong Chen1, Tatsuro Maeda1 (1.AIST., 2.Chiba Univ.)
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[14p-P02-14]Investigation of composition of SrLiH3 epitaxial thin films

〇(B)Yuma Ishibashi1, Erika Fukushi1, Yuki Shimoman1, Takuya Majima2, Takayuki Harada3, Hiroyuki Oguchi1 (1.Shibaura Tech., 2.Kyoto Univ., 3.NIMS)
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[14p-P02-15]Growth of high quality SrH2 films using infrared laser evaporation

〇(B)Kouki Kawahara1, Masaki Nakano1, Takayuki Harada2, Hiroyuki Oguchi1 (1.Shibaura Tech., 2.NIMS)
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[14p-P02-16]Fabrication of fcc-type Ni1-xFex epitaxial thin films by H2 reduction of solid solution oxides

〇(M1)Yusei Yamanaka1, Kazuya Kawamura1, Satoru Kaneko2,1, Akifumi Matsuda1 (1.Science Tokyo, 2.KISTEC)
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[14p-P02-17]Role of Bromine Substituents on Self-Assemblies of Regioregular Oligothiophenes on Graphite

〇Daisuke Takajo1, Kouzou Matusumoto2, Koichi Sudoh3 (1.Osaka Univ., 2.Senshu Univ., 3.SANKEN, Osaka Univ.)
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[14p-P02-18]Fe Concentration Dependence of Electrical, Optical, and Magnetic Properties of Epitaxially Grown Fe-doped ITO Films

〇Takumi Kado1, Saiki Kitagawa1,2,3, Haruka Kurihara1, Toshihiro Nakamura1,2 (1.Kyoto Univ., 2.ILAS, Kyoto Univ., 3.JSPS)
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[14p-P02-19]Evaluation of density and uniformity of complex oxide gas barrier films

〇Naoki Sannodo1, Toru Morifuji1, Makoto Sato1 (1.Toray Industries, Inc.)
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[14p-P02-20]Low temperature deposition of rutile titanium oxide film using high-power impulse magnetron sputtering

〇Takayuki Ohta1, Miyuki Nishimura1 (1.Meijo Univ.)
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