Session Details

[FMCp2]Manufacturing and Process

Thu. Dec 5, 2024 3:40 PM - 5:00 PM JST
Thu. Dec 5, 2024 6:40 AM - 8:00 AM UTC
Poster-2 (Main Hall)

[FMCp2-1]A Metal for Making Different Cu Taper in Etching Fluid

*Hui Wang1, Kang Long1, Zhihui Song1, HuiHua Liao1, Huang I. Chen1, James Hsu1, Wade Chen1 (1. Changsha HKC Optoelectronics Technology Co.,Ltd (China))
Comment()

[FMCp2-2]Electrical Properties of ZTO Thin-Film Transistor Coated with Air Spray Printing for Active Layer Formation

*Young Jik Lee1, Yong-Jae Kim1, Woon-Seop Choi1 (1. Hoseo University (Korea))
Comment()

[FMCp2-3]ITO Film Detection and Improvement for Liquid

*Longjin Zhou1, Sudi Rao1, Chengyi Huang1, James Hsu1, Wade Chen1 (1. Changsha HKC Optoelectronics Technology Co. (China))
Comment()

[FMCp2-4]Analysis of Peeling Test Capability With Different RA Condition in Narrow Border LCD

*Xianfei Zhu1, Zeyao Li1, Xiaowu Sun1, Tian Lan1, Jianyu Cui1, Xirong Han1, Tianhao Zhang1, Minghong Shi1, Wade Chen1 (1. Chongqing HKC Optoelectronics Technology Co. Ltd. (China))
Comment()

[FMCp2-5]Research on Profile of Al/Mo Electrode

*Jinsong Lu1, Dengli Yao1, Song Sun1, Qin Xiong1, Ranlong Wang1, Kaijun Liu1, Jinn Hong1, James Hsu1, Wade Chen1 (1. Chongqing HKC Optoelectronics Technology Co., Ltd. (China))
Comment()

[FMCp2-6]Fabrication of Shape-Controllable Nanostructures Using Laser Interference Lithography

*EunJeong Bae1,2, Geun Su Choi1,2, Tae Jeong Hwang2, Young Hwan Yu2, Byeong-Kwon Ju1, Young Wook Park2 (1. University of Korea (Korea), 2. University of Sunmoon (Korea))
Comment()

[FMCp2-7]A Laser Welding Packaging Technology for LCD

*Xiaogang Hu1,3, Ye wan1,3, Bi Zhu1, Jiahe Cheng1,3, Xugang Luo2, Zhicong Kang1, Zhenghong Chen1 (1. Chongqing HKC Optoelectronics Technology Co.,ltd (China), 2. Chuzhou HKC Optoelectronics Technology Co., Ltd (China), 3. Chongqing Advanced Photoelectric Display Technology Research Institute (China))
Comment()

[FMCp2-8]New Gen.6 Exposure Tools and Technologies for Improving Overlay Accuracy

*Nobuhiko Yabu1, Sunao Endo1, Qu Zhang1, Reo Sasaki1, Takeshi Fujita1, Tomohiro Nishikawa1, Tomoya Yoshizawa1, Yoshinori Osaki1 (1. Canon Inc. (Japan))
Comment()

[FMCp2-9]Study on the Exposure Principles and Design Rules of Nikon Exposure Machine With ITO2 PSM Mask in LTPS LCD

*Wu Jing1, Xuexin Lan1, Chunrong Lin1, Yanmei Li1, Xianyan Yang1 (1. XiaMen Tianma Microelectronics Co., Ltd., (China))
Comment()

[FMCp2-10]Impact of Selective Substitutional Growth on Subthreshold Swing by PEALD Deposition Sequences

*SeongHun Yoon1, Seon Woong Bang1, Jae Kyeong Jeong1 (1. Hanyang University (Korea))
Comment()

[FMCp2-11]Investigation of Curing Conditions for Binder Materials Containing Fluorescent Materials at Low Temperatures

*Naoki Ohtani1, Anon Eto1, Hinako Kakehashi1, Shuhei Matsuoka1 (1. Doshisha University (Japan))
Comment()

[FMCp2-12L]Effect of Combination Annealing with Water and Ethanol Vapors Added to NH3 Gas on Reduction of Residual OH Bonds in Si Oxide Films

*Susumu Horita1 (1. Japan Advanced Institute of Science and Technology (Japan))
Comment()

[FMCp2-13L]Study on the Thermal Simulation of Cooling Susceptor to Reduce Damage to Glass Substrate During Sputtering Process for OLED Display of the 8.5th generation

*Hyun Min Cho1, Yedalm Kim1, Gang Yeol Yoo1, Sangwon Shin2, Yuhwa Choi2 (1. Korea Electronics Technology Institute (Korea), 2. H&iruja Co., Ltd (Korea))
Comment()

[FMCp2-14L]Influence of Wet and Dry Etching on IGZO TFTs Focusing on Sidewall Conductance and Hump Phenomenon

*Minsik Kong1, Soo-Yeon Lee1 (1. Seoul National University (Korea))
Comment()

[FMCp2-15L]Dependence of Recovery Characteristics of a-IGZO TFTs on Annealing Temperature

*Seungjun Choi1, Byung Seong Bae1, Seung Jae Moon2 (1. Hoseo university (Korea), 2. Ulsan National Institute of Science and Technology (Korea))
Comment()