Session Details
[20p-C402-1~17]6.2 Carbon-based thin films
Wed. Sep 20, 2023 1:30 PM - 6:00 PM JST
Wed. Sep 20, 2023 4:30 AM - 9:00 AM UTC
Wed. Sep 20, 2023 4:30 AM - 9:00 AM UTC
C402 (Int'l Ctr.)
Takako Nakamura(AIST), Haruhiko Ito(長岡技大)
[20p-C402-1]Fluorine-free Hydrocarbon-based Water-repellent Coating Technology using Photochemical Surface Modification
〇Takako Nakamura1 (1.AIST)
[20p-C402-2]Direct Synthesis of Hydrogen-Substituted Graphdiyne on SiO2 and Conductive Glass Substrates
〇(PC)Jeganathan Chellamuthu1, Masanori Hara1, Kenta Kokado1, Masamichi Yoshimura1 (1.Toyota Techno. Ins.)
[20p-C402-3]Evaluation of the chemical bonding states inside the amorphous carbon films by means of X-ray photoemission spectroscopy
〇Yuji Muraoka1, Sho Enomoto2, Yue Qiang3, Hiroyuki Okazaki4, Takanori Wakita1, Takayoshi Yokoya1 (1.Okayama Univ. RIIS, 2.Okayama Univ., 3.Okayama Univ. Grad. Sch., 4.QST)
[20p-C402-4]Investigation of number of fitting bands in the Raman spectra of DLC films using the HF-HiPIMS method
〇(D)Hiroyuki Fukue1, Tatsuyuki Nakatani1, Tadayuki Okano2, Masahide Kuroiwa2, Shinsuke Kunitsugu3, Susumu Takabayashi4, Hiroki Oota5, Ken Yonezawa5,1 (1.Okayama Univ. of Sci., 2.Tokyo Electronics Co., Ltd., 3.Ind. Technol. Cent. Okayama Pref., 4.National Inst. Technol., Ariake College, 5.Kenix Corporation)
[20p-C402-5]Orientation change of sp2 bonded carbon in amorphous carbon films by laser irradiation
Naoki Umada1, Yuko Aono1, Masahito Niibe2,3, Kazuhiro Kanda3, Yuki HIrata1, Naoto Ohtake1, 〇Hiroki Akasaka1 (1.Tokyo Inst. of Tech., 2.Univ. of Tokyo, 3.Univ. of Hyogo)
[20p-C402-6]Volume changes of DLC films by monochromatized soft X-ray irradiation
〇(M2)Tomohiro Mishima1, Kyoji Morita1, Koji Nakanishi1, Hiroki Akasaka2, Tsuneo Suzuki3, Kazuhiro Kanda1 (1.LASTI, Univ. Hyogo, 2.Tokyo Inst. Tech., 3.Nagaoka Univ. Tech.)
[20p-C402-7]Change in the free volume of highly hydrogenated DLC films with increasing temperature
〇(M1)Daisuke Niwa1, Tomohiro Mishima1, Koji Nakanishi1, Naoki Fukumuro2, Atsushi Kinomura3, Kazuhiro Kanda1 (1.LASTI,Univ.Hyogo, 2.Eng.Univ.Hyogo, 3.KURNS, Kyoto Univ.)
[20p-C402-8]Relationship between Young’s modulus and carbon bonding state of EBD carbon tips
〇Subaru Okunishi1, Keisuke Miyazawa1,2, Hirotoshi Furusho2, Keigo Teramae1, Takeshi Fukuma1,2 (1.Kanazawa Univ., 2.WPI-NanoLSI, Kanazawa Univ.)
[20p-C402-9]Investigation of cell adhesion on hydrogenated amorphous carbon films
〇Ryoga Kitabora1, Takayuki Shimizu1, Kosei Miyagi1, Teruo Suzuki2, Yutaka Tamura2, Satoru Ogiso2, Satoshi Sugimura2, Kei Matuura2, Kenji Hirakuri1, Yasuharu Ohgoe1 (1.Denki Univ., 2.Kasuga Denki)
[20p-C402-10]Fabrication of a-CNx:H films with high nitrogen content from the microwave plasma CVD of the C2H2/N2 gas mixture - What is the chemical bonding states to attain [N]/([N]+[C])>0.5 ?
〇Haruhiko Ito1, Satoh Yuga1, Suzuki Tsuneo1, Saitoh Hidetoshi1 (1.Nagaoka Univ. Tech.)
[20p-C402-11]Fabrication of layered carbon nitride thin films with nitrogen-rich stoichiometry
〇Haruto Sasaki1, Noriyuki Urakami1,2, Yoshio Hashimoto1,2 (1.Shinshu Univ., 2.Shinshu Univ. RISM)
[20p-C402-12]Fabrication of layered carbon nitride films under an oxygen-containing gas atmosphere and its effect on electronic property
〇Kota Higuchi1, Masaki Tachibana1, Noriyuki Urakami1,2, Yoshio Hashimoto1,2 (1.Shinshu Univ., 2.Shinshu Univ. RISM)
[20p-C402-13]Fabrication of the ring-gate structure field-effect-transistors using carbon nitride films
〇Masaki Tachibana1, Kota Higuchi1, Noriyuki Urakami1,2, Yoshio Hashimoto1,2 (1.Shinshu Univ., 2.Shinshu Univ. RISM)
[20p-C402-14]Chemical Vapor Deposition of Phosphorus-Incorporated Layered Carbon Nitride Film
〇Natsuko Kurimoto1, Noriyuki Urakami1,2, Yoshio Hashimoto1,2 (1.Shinshu Univ., 2.Shinshu Univ. RISM)
[20p-C402-15]DLC film deposition by low frequency plasma for Oxygen reduction reaction
〇(M2)Mitsuaki Matsuzaki1, Sho Kojima1, Tomohiro Ogasawara1, Teruo Suzuki2, Yutaka Tamura2, Satoru Ogiso2, Satoshi Sugimura2, Kei Matsuura2, Yoshiharu Mukouyama1, Kenji Hirakuri1, Yasuharu Ohgoe1 (1.Tokyo Denki Univ., 2.Kasuga Denki)
[20p-C402-16]Electrical insulating properties of amorphous carbon films classified based on optical constants
〇(M1)EITO ICHIJO1, HIRATSUKA MASANORI2, HIRAKURI KENJI1 (1.Denki Univ., 2.Nanotec)
[20p-C402-17]High-Speed Deposition of Hydrogen-Free DLC Films by Vacuum Arc Deposition System with a Coiled Anode
〇Seiya Watanabe1, Kito Jumpei1, Takahiro Bando1, Toru Harigai1, Hirofumi Takikawa1, Hiroaki Sugita2, Takahiro Hattori2, Hiroki Gima2 (1.Toyohashi Univ. Technol., 2.OSG Co., Ltd.)