Session Details

[25p-61A-1~13]21.1 Joint Session K "Wide bandgap oxide semiconductor materials and devices"

Mon. Mar 25, 2024 1:00 PM - 4:45 PM JST
Mon. Mar 25, 2024 4:00 AM - 7:45 AM UTC
61A (Building No. 6)
Kosaku Shimizu(Nihon Univ.), Rie Togashi(Sophia Univ.)

[25p-61A-1]Role of Zn Introduction in In2O3 TFTs
−Suppression of Grain Boundary Scattering −

〇(D)Yuzhang Wu1, Yusaku Magari2, Prashant R. Ghediya2, Yuqiao Zhang3, Yasutaka Matsuo2, Hiromichi Ohta2 (1.IST-Hokkaido Univ., 2.RIES-Hokkaido Univ., 3.Jiangsu Univ.)

[25p-61A-2]Investigating the Role of Hydrogen on RF-Sputtered Al-Doped ZnO Thin Films

〇(M2C)MuhammadFaizRHasian Rambey1, Takaya Ogawa1, Hideyuki Okumura1 (1.Kyoto Univ.)

[25p-61A-3]Carrier density control of Sb-doped SnO2 thin films and fabrication of a vertical Schottky barrier diode

〇Yui Takahashi1, Hitoshi Takane1, Hirokazu Izumi2, Takeru Wakamatsu1, Yuki Isobe1, Kentaro Kaneko3, Katsuhisa Tanaka1 (1.Kyoto Univ., 2.Hyogo Prefectural Institute of Technology, 3.Ritsumeikan Univ.)

[25p-61A-4]Determining factors of structural stability and electronic structures of InGaZnO4-derivative crystalline semiconductors

〇Tomoya Suzuki1, Keisuke Ide1, Takayoshi Katase1, Hideo Hosono1, Toshio Kamiya1 (1.MDXES, Tokyo Tech.)

[25p-61A-5]Solid-phase epitaxy of Ga2O3 thin films on α-Al2O3 (0001) substrates by UV laser

〇Ryoya Kai1, Takumi Numata1, Satoru Kaneko2,1, Mamoru Yoshimoto1, Akifumi Matsuda1 (1.Tokyo Tech, 2.KISTEC)

[25p-61A-6]Anisotropic band edges of (ScxGa1−x)2O3 films revealed by polarized reflectance spectroscopy

〇Kazuki koreishi1, Takeyoshi Onuma2, Takuto Soma1, Akira Ohtomo1 (1.Tokyo Tech, 2.Kogakuin Univ.)

[25p-61A-7]Characterization of Temperature Dependence of Barrier Height in Ni/β-Ga2O3 SBDs and Measurement of Valence Band Structure of β-Ga2O3 by XPS

〇AKihira Munakata1, Kohei Sasaki2, Kentaro Ema2, Yoshiaki Nakano1, Masaki Kobayashi1, Takuya Maeda1 (1.Univ. of Tokyo, 2.Novel Crystal Technology, Inc.)

[25p-61A-8]Electrical Properties of Unintentionally Doped Ga2O3 Thin Films Grown by Low-Pressure Hot-Wall MOCVD (1)

〇(B)Jun Morihara1, Jin Inajima1, Zhenwei Wang2, Junya Yoshinaga3,4, Shota Sato1, Kohki Eguchi1, Yoshinao Kumagai3, Masataka Higashiwaki1,2 (1.Osaka Metropolitan Univ., 2.NICT, 3.Tokyo Univ. of Agric. and Tech., 4.TAIYO NIPPON SANSO CORP.)

[25p-61A-9]Electrical Properties of Unintentionally Doped Ga2O3 Thin Films Grown by Low-Pressure Hot-Wall MOCVD (2)

〇(B)Jin Inajima1, Jun Morihara1, Zhenwei Wang2, Junya Yoshinaga3,4, Shota Sato1, Kohki Eguchi1, Yoshinao Kumagai3, Masataka Higashiwaki1,2 (1.Osaka Metropolitan Univ., 2.NICT, 3.Tokyo Univ. of Agric. and Tech., 4.TAIYO NIPPON SANSO CORP.)

[25p-61A-10]Effects of Oxygen Reactive Ion Etching and Nitrogen Radical Irradiation on Temperature-Dependent Electrical Properties of Ga2O3 (010) Schottky Barrier Diodes

〇(M1)Shota Sato1, Akimasa Mineyama1, Zhenwei Wang2, Masataka Higashiwaki1,2 (1.Osaka Metropolitan Univ., 2.NICT)

[25p-61A-11]Emission Microscopy Observation of Polycrystalline Defect Array in (001) HVPE-Grown Epi Thick Film β-Ga2O3 Schottky Barrier Diodes

〇(M1)Yuto Otsubo1, Kohei Sasaki2, Jun Arima3, Minoru Fujita3, Katsumi Kawasaki3, Akito Kuramata2, Makoto Kasu1 (1.Saga Univ., 2.Novel Crystal Technology, Inc., 3.TDK Corporation)

[25p-61A-12]MESFET based on Ge-doped α-Ga2O3 thin films

〇Takeru Wakamatsu1, Yuki Isobe1, Hitoshi Takane1, Kentaro Kaneko2, Katsuhisa Tanaka1 (1.Kyoto Univ., 2.Ritsumeikan Univ.)

[25p-61A-13]Fabrication of mesa-shaped Ga2O3/Air DBR structures for Wavelength conversion device

〇Shuya Sato1, Tomoaki Momma1, Takeki Aikawa1, Akihiko Kikuchi1,2,3 (1.Sophia Univ., 2.Sophia Photonics Research Center, 3.Sophia Semiconductor Research Inst.)