Session Details

[11a-PA6-1~23]15.4 III-V-group nitride crystals

Fri. Sep 11, 2026 11:00 AM - 12:30 PM JST
Fri. Sep 11, 2026 2:00 AM - 3:30 AM UTC
PA6 (1st Gymnasium)

[11a-PA6-1]Investigation of Nitrogen Plasma Irradiation Effect on GaN Growth
on ScAlMgO4 Substrate by RF-MBE Technique

〇(P)Earul Islam1, Gentatsuro Hata2, Trang Nakamoto3, Takashi Fujii1,4, Ryuichi Sugie2, Tsutomu Araki2 (1.Ritsumeikan Uni., ROST, 2.Ritsumeikan Uni., Col. of Sci. & Eng., 3.Ritsumeikan Uni., R-GIRO, 4.Fukuda Crystal Lab.)

[11a-PA6-2]Growth of GaN layer by plasma-enhanced LPE method(VI)

〇(M1)Naoto Kato1, Kento Kawai1, Daiki Hirose1, Fusuke Matsumura1, Keisuke Yoshida1, Hiroyuki Shinoda1, Nobuki Mutsukura1 (1.Tokyo Denki Univ.)

[11a-PA6-3]Realization of Pseudomorphic Undoped Low-Resistivity AlN/GaN on AlN by MOVPE Method

〇Akira Yoshikawa1, Ziyi Zhang1, Maki Kushimoto2, Yoshio Honda2, Hiroshi Amano2 (1.ULTEC Inc., 2.Nagoya univ.)

[11a-PA6-4]Growth of InN layer by plasma-enhanced LPE method(I)

〇(M1)Gen Takahashi1, Ryota Yamashiro1, Fusuke Matsumura1, Daiki Hirose1, Keisuke Yoshida1, Hiroyuki Shinoda1, Nobuki Mutsukura1 (1.Tokyo Denki Univ.)

[11a-PA6-5]Polarity and Structural Control of GaN Thin Films Using a Sputtering GaN Target

〇Mirei Tokiwa1, Hidehiko Misaki1, Yoshihiro Ueoka1, Ken Matsumura2, Masami Mesuda1 (1.Tosoh Corp., 2.Tosoh Analysis and Research Center Co., Ltd.)

[11a-PA6-6]Growth of InN layer by plasma-enhanced LPE method (II)

〇(M1)Kento Kawai1, Haruto Kitamura1, Fusuke Matsumura1, Daiki Hirose1, Keisuke Yoshida1, Hiroyuki Shinoda1, Nobuki Mutsukura1 (1.Tokyo Denki Univ.)

[11a-PA6-7]Photoelectrochemical Water Splitting Reaction Processes on InGaN-based Photoanodes

〇Kazuhide Kumakura1, Yudai Yamashita2, Kazuyuki Hirama2, Yoshitaka Taniyasu2, Taketomo Sato1 (1.Hokkaido Univ., 2.NTT BRL)

[11a-PA6-8]Growth of InN layer by plasma-enhanced LPE method (III)

〇(M1)Haruto Kitamura1, Gen Takahashi1, Fusuke Matsumura1, Daiki Hirose1, Keisuke Yoshida1, Hiroyuki Shinoda1, Nobuki Mutsukura1 (1.Tokyo Denki Univ.)

[11a-PA6-9]Investigation of the Photoluminescence Enhancement Mechanism in InGaN/GaN Quantum Wells by Dielectric Thin Film Deposition and UV Laser Irradiation

〇Keigo Hiromoto1, Naoki Ueda1, Tetsuya Matsuyama1, Shunsuke Murai1, Kenji Wada2, Mitsuru Funato3, Yoichi Kawakami3, Koichi Okamoto1 (1.Osaka Metro Univ., 2.OShaRE, 3.Kyoto Univ.)

[11a-PA6-10]Growth of InN layer by plasma-enhanced LPE method (Ⅳ)

〇(M1)Ryota Yamashiro1, Naoto Kato1, Daiki Hirose1, Fusuke Matsumura1, Keisuke Yoshida1, Hiroyuki Shinoda1, Nobuki Mutsukura1 (1.Tokyo Denki Univ.)

[11a-PA6-11]Performance improvement in GaInN-based photoelectric transducers with a backside DBR

〇Tomoaki Nonaka1, Manatsu Nagai1, Jun Hasegawa1, Keitaro Yamaguchi1, Takashi Egawa1, Makoto Miyoshi1 (1.NI Tech)

[11a-PA6-13]Local surface potential measurement of GaN thin films by Kelvin probe force microscopy

〇Haruhito Echigo1, Gen Fujitsuka1, Toshiki Okamura1, Hirofumi Yamada2, Shin-ichi Yamamoto1, Yuji Miyato1 (1.Ryukoku univ., 2.Cent. of Sci. and Tech. Ryukoku Univ.)

[11a-PA6-14]Crystal Orientation and Microstructure of ScN/r-Sapphire Heterostructures

〇Takeshi Ohgaki1, Isao Sakaguchi1, Naoki Ohashi1 (1.NIMS)

[11a-PA6-15]MOCVD-GaN growth using MBE-GaN template on ScAlMgO4 substrates

〇Gentatsuro Hata1, Sigeharu Kawabata1, Md. Earul Islam1, Takashi Fujii1,2, Trang Nakamoto1, Tuguo Hukuda2, Syoichi Onda3, Ryuichi Sugie1, Tutomu Araki1 (1.Ritsumeikan Univ., 2.Fukuda Crystal Lab., 3.GaNVaL LLC)

[11a-PA6-16]CVD growth of layered boron nitride using BCl3 generated from boron and chlorine gas

〇Ryouta Aoyama1, Kosuke Hiraoka1, Ruki Aoike1, Soma Ota1, Hayato Nakano1, Akira Takemura1, Yuko Kominami1, Kazuhiko Hara1,2,3 (1.GSIST, Shizuoka Univ., 2.CMMP, Shizuoka Univ., 3.RIE, Shizuoka Univ.)

[11a-PA6-17]Evaluation of polymorphism of BN thin films grown by low-pressure CVD (2)

〇Kosuke Hiraoka1, Ryota Aoyama1, Akira Takemura1, Hayato Nakano1, Hiroko Kominami1, Kohei Shima4, Shigefusa Chichibu4, Kazuhiko Hara1,2,3 (1.GSIST, Shizuoka Univ., 2.CMMP, Shizuoka Univ., 3.RIE, Shizuoka Univ., 4.IMRAM, Tohoku Univ.)

[11a-PA6-18]Raman Spectroscopy Analysis of Anisotropic Strain in Semipolar (11-22) AlN

〇Bei Ma1,2, Kensei Oya2, Ryota Akaike2, Yoshihiro Ishitani1, Hideto Miyake2 (1.Chiba Univ., 2.Mie Univ.)

[11a-PA6-19]Effect of Point Defects on Structural Stability and Polarization Switching in ScAlN Alloys

〇Shunsuke Matsumoto1, Toru Akiyama1,2, Kihiro Kawamura1,2 (1.Mie Univ, 2.ICSDF Mie Univ)

[11a-PA6-20]Ab initio evaluation of step formation energies on N-polar AlN(0001) surface

〇Taiki Tahara1, Toru Akiyama1,2, Takahiro Kawamura1,2 (1.Mie Univ., 2.ICSDF Mie Univ.)

[11a-PA6-21]Surface Morphology and Crystallinity of High-Temperature-Annealed ECR-Sputtered AlN Buffer Layers and GaN Thin Films

〇(M2)Futa Chiba1, Hiroshi Suga1, Hironori Torii2 (1.ChibaTech, 2.JSW AFTY)

[11a-PA6-22]In-Brain Temperature Monitoring Using Forward Voltage of µLED Probes

〇Takemi Hanai1, Atsushi Nishikawa2, Alexander Loesing2, HIroto Sekiguchi1 (1.Meijo Univ., 2.ALLOS)

[11a-PA6-23]Theoretical analysis for stability of multivacancies in GaN

〇(M1)Yuki Murakami1, Toru Akiyama1,2, Takahiro Kawamura1,2, Akira Uedono3, Shigefusa Chichibu4, Kenji Shiraishi5, Atsushi Oshiyama5 (1.Mie Univ., 2.ICSDF Mie Univ., 3.Univ. Tsukuba, 4.IMRAM Tohoku Univ., 5.CIES Tohoku Univ.)