Session Details
[9a-A33-1~13]17.3 Applications
Wed. Sep 9, 2026 9:00 AM - 12:30 PM JST
Wed. Sep 9, 2026 12:00 AM - 3:30 AM UTC
Wed. Sep 9, 2026 12:00 AM - 3:30 AM UTC
A33 (Faculty of Info. Sci. & Tech. Bldg.)
[9a-A33-1]Automatic 2D semiconductor heterostructures fabrication assisted by robotic technology
〇Atsushi Kishida1, Wataru Idehara1, Kenji Watanabe2, Takashi Taniguchi2, Shinichiro Matano1, Kazunari Matsuda1 (1.Kyoto Univ., 2.NIMS)
[9a-A33-2]Enhancement of MoS2 local channel mobility to 186 cm2/Vs by contact-metal-induced tensile strain
〇KEISUKE ATSUMI1, TOMONORI NISHIMURA1, KAITO KANAHASHI1, YOSHIKI SAKUMA2, KOSUKE NAGASHIO1 (1.University of Tokyo, 2.National Institute for Materials Science)
[9a-A33-3]MoS2 conductivity enhancement by contact-metal-induced tensile strain toward short-channel-FETs integration
〇KEISUKE ATSUMI1, TOMONORI NISHIMURA1, KAITO KANAHASHI1, NAOYA OKADA2, IRISAWA TOSHIFUMI2, YOSHIKI SAKUMA3, KOSUKE NAGASHIO1 (1.University of Tokyo, 2.AIST, 3.NIMS)
[9a-A33-4]Mirror Twin Boundary Reduction and Degenerate p-Type FET Operation in Nb-Post-Doped Monolayer WSe2 through Se-Atmosphere Activation Annealing
〇Itsuki Tanaka1, Tomonori Nishimura1, Kaito Kanahashi1, Mai Nakashima2, Naoshi Kakeya2, Kohei Aso2, Yoshifumi Oshima2, Ryotaro Sakakibara3, Yasumitsu Miyata3, Koji Kita1, Kouske Nagashio1 (1.UTokyo, 2.JAIST, 3.NIMS)
[9a-A33-5]High-Concentration n-Type Substitutional Doping of MoS2 by Re Post-Doping
〇Masanori Yamaguchi1, Ituki Tanaka2, Kaito Kanahashi1, Tomonori Nishimura1, Mai Nakashima3, Kohei Aso3, Yoshifumi Oshima3, Yoshiki Sakuma4, Kosuke Nagashio1 (1.UTokyo, 2.UTokyo GSFS, 3.JAIST, 4.NIMS)
[9a-A33-6]Feasibility study of ultra-thin gate metal layers using graphene
〇Yuto Noguchi1, Taiki Seto1, Mengnan Ke2, Shohei Kumagai3, Toshihiro Okamoto3, Nobuyuki Aoki1 (1.Chiba Univ., 2.Yokohama National Univ., 3.Science Tokyo)
[9a-A33-7]Threshold Voltage Control and Atomic Layer Deposition on n-Type MoS2 MOSFET via F6-TCNNQ Monolayers for CFET Device Application
〇Taiki Seto1, Yuto Noguchi1, Kensho Matsuda1, Mengnan Ke2, Shohei Kumagai3, Toshihiro Okamoto3, Nobuyuki Aoki1 (1.Chiba Univ., 2.Yokohama National Univ., 3.Science Tokyo Univ.)
[9a-A33-8]Observation of Gate-Modulated Threshold Switching in a Graphene/MoTe2/Graphene Vertical Heterostructure
〇(D)Kentarou Uzawa1,2, Keisuke Kobayashi1,2, Ryoma Hayakawa2, Takuya Iwasaki2, Kenji Watanabe2, Takashi Taniguchi2, Yutaka Wakayama1,2, Satoshi Moriyama1,2 (1.Tokyo Denki Univ., 2.NIMS)
[9a-A33-9]Contact Engineering of TMDC-Channel Transistors Using Silicide Materials
〇Tetsuhiko Tanikawa1,2, Chang Wen-Hsin1, Nishino Ryutaro1, Irisawa Toshifumi1, Okada Naoya1 (1.SFRC, AIST, 2.Nihon Univ.)
[9a-A33-10]Development of Laser-Processed Thin-Film Transistors with 2D Semiconductors
〇Aoto Igarashi1,2, Ryosuke Imura1,2, Kentaro Uzawa1,2, Ryoma Hayakawa1, Takuya Iwasaki1, Kenji Watanabe1, Takashi Taniguchi1, Takeo Minari1, Yasumitsu Miyata1, Takahiko Endo1, Satoshi Moriyama1,2, Yutaka Wakayama1,2 (1.NIMS, 2.TDU)
[9a-A33-11]Gas Atmosphere Dependence of Photomodulated Current in Monolayer MoS2
〇(M2)Kosei Tokuda1, Osamu Maida1, Hiroshi Tabata1 (1.UOsaka)
[9a-A33-12]Strain and Symmetry Engineering in Atomically-Thin Chiral Light-Emitting Devices
〇Tenta Kitamura1, Haruto Yoshida1, Takahiko Endo2, Mina Maruyama3, Yanlin Gao3, Susumu Okada3, Hiroo Suzuki4, Yasuhiko Hayashi4, Yasumitsu Miyata2, Shun Fujii5, Hao Ou1, Jiang Pu1 (1.Science Tokyo, 2.NIMS, 3.Univ. of Tsukuba, 4.Okayama Univ, 5.Keio Univ)
[9a-A33-13]Ion-gel-gated tunnel light-emitting device with van der Waals heterostructures
〇Soto Hiramatsu1, Tenta Kitamura1, Peishan Yu1, Takahiko Endo2, Kenji Watanabe3, Takashi Taniguchi2, Yasumitsu Miyata2, Hao Ou1, Pu Jiang1 (1.Science Tokyo, 2.NIMS-MANA, 3.NIMS-EOM)
