Session Details
[9p-N206-1~15]6.3 Oxide electronics
Tue. Sep 9, 2025 1:30 PM - 5:45 PM JST
Tue. Sep 9, 2025 4:30 AM - 8:45 AM UTC
Tue. Sep 9, 2025 4:30 AM - 8:45 AM UTC
N206 (Lecture Hall North)
[9p-N206-1]Metal-insulator transition properties of Ti2O3 films grown on van der Waals material hexagonal boron nitride
〇(M1)Keitaro Kanno1, Takuto Soma1, Satoru Fukamachi2, Hiroki Ago2, Akira Ohtomo1, Kohei Yoshimatsu1 (1.Science Tokyo, 2.Kyushu Univ.)
[9p-N206-2]Observation of Metal-Insulator Transition for λ-phase Ti3O5 Films using Hard X-ray Photoemission Spectroscopy
〇Kouhei Yoshimatsu1, Akira Yasui2 (1.Inst. Sci. Tokyo, 2.JASRI)
[9p-N206-3]High-temperature characterization of Sc-doped amorphous GaOx memristors
〇Yuki Komizo1, ZHUO DIAO1, Tetsuya Tohei1, Akira Sakai1 (1.Osaka Univ.)
[9p-N206-4]Modeling and analysis of resistance switching dynamics in amorphous GaOx memristors based on semiconductor physics
〇(M2)Rion Ogura1, Diao Zhuo1, Tetsuya Tohei1, Akira Sakai1 (1.University of Osaka)
[9p-N206-5]Interface State Modulation by Annealing for Property Control of Pt/Nb:SrTiO3 Junctions
〇(M2)Taiga Seto1, Yumeng Zheng1, Kentaro Kinoshita1 (1.Tokyo Univ. of sci)
[9p-N206-6]Realisation of Field-Effect Transistor with a Freestanding SrTiO3 Channel
〇(M2)Kosuke Tanaka1,2, Hisashi Inoue2, Ai Kitoh2, Masafumi Tamura1, Isao H Inoue1,2 (1.Tokyo Univ. of Science, 2.AIST)
[9p-N206-7]Investigation of the Voltage Dependence of Depletion Capacitance in (La1-xSrx)VO3/p-Si Junction
〇Kaito Fujitani1, Koji Iwasaki1, Shuhei Hashimoto1, Ryosuke Takagi1, Yasushi Hotta1 (1.Univ. of Hyogo)
[9p-N206-8]Fabrication and Current–Voltage Characterization of (La1-xSrx)VO3/n-Si Junctions
〇(M1)Koji Iwasaki1, Ryosuke Takagi1, Shuhei Hashimoto1, Kaito Hujitani1, Yasushi Hotta1 (1.Hyogo Univ.)
[9p-N206-9]The study of VO2 phase diagram under the effective of hydrogen gas pressure
〇Satoshi Hamasuna1, Takeaki Yajima1 (1.Kyushu Univ.)
[9p-N206-10]Crystalline phase control of mist-CVD-derived VO2 thin films by cooling rate
〇Daiki Takayama1, Hironori Fujisawa1, Seiji Nakashima1, Ai I. Osaka1 (1.Univ. of Hyogo)
[9p-N206-11]Current Oscillations using the Nonlinear Conducting Properties in Single-crystal VO2
〇Ryota Kadowaki1, Masato Imaizumi2, Akitoshi Nakano2, Ichiro Terasaki2, Yuto Nakamura1, Hideo Kishida1 (1.Dept. of Appl. Phys., Nagoya Univ., 2.Dept. of Phys., Nagoya. Univ.)
[9p-N206-12]Non-polar switching of carbon-doped zirconia (ZrOx) thin films formed by mist CVD for CeRAM
〇Masamichi Azuma1,2, Tsubasa Miyamoto1, Hiroyuki Nishinaka1 (1.Kyoto Inst. of Tech., 2.Symetrix Corp.)
[9p-N206-13]Comparison of local resistance changes in nickel-oxide and gallium-tin-oxide thin films
〇(B)Shota Machi1, Sota Mikami1, Masamichi Azuma3, Hirofumi Yamada2, Mutsumi Kimura1, Hidenori Kawanishi1, Hiroyuki Nishinaka3, Yuji Miyado1 (1.Ryukoku Univ, 2.Ctr of Ryukoku Univ, 3.Grad. School of Sci. and Tech. Kyoto Inst. of Tech)
[9p-N206-14]Thermal Conductivity and Applicability for Thermal Switches of Single-crystalline NiO epitaxial films
〇Ahrong Jeong1, Daito Takeda2, Mitsuki Yoshimura3, Hiromichi Ohta1 (1.RIES-Hokkaido Univ., 2.School of Eng.-Hokkaido Univ., 3.IST-Hokkaido Univ.)
[9p-N206-15]Sputtering growth of PdCoO2 thin films for advanced interconnects
〇Takayuki Harada1, Takuro Nagai1, Yasushi Masahiro2, Yasunori Kama2 (1.NIMS, 2.Tanaka Precious Metal Technologies)