Session Details
[16p-PA7-1~40]17 Nanocarbon and Two-Dimensional Materials (Poster)
Mon. Mar 16, 2026 4:30 PM - 6:00 PM JST
Mon. Mar 16, 2026 7:30 AM - 9:00 AM UTC
Mon. Mar 16, 2026 7:30 AM - 9:00 AM UTC
PA7 (Arena (1F))
[16p-PA7-1]Selective CVD Growth of MoS2 Using an Au-Patterned MoO3 Source Substrate
〇shogo kawaminami1, Atushi Ando2, Shin-ichi Yamamoto1 (1.Ryukoku Univ., 2.AIST)
[16p-PA7-2]Direct CVD growth of MoS2/graphene heterostructure on sapphire.
〇(M1)Yuuki Ohara1, Kae Yokohira1, Takato Oda, Hiroki Hibino1 (1.Kwansei Gakuin Univ.)
[16p-PA7-3]Effect of CVD Growth Space Control via Spacer Introduction on MoS2 Crystal Growth
〇(B)Kuu Nakamura1, Shogo Kawaminami1, Atsushi Ando2, Shin-ichi Yamamoto1 (1.Ryukoku Univ., 2.AIST)
[16p-PA7-4]Growth of WS2 thin films at substrate/Au at interface using W precursors
〇(M1)Kenta Takei1, Keiji Ueno1, Hong En Lim1 (1.Saitama Univ.)
[16p-PA7-5]Temperature Dependence of MoS2 Film Growth in CVD Synthesis Using Paste-Type MoO3
〇Naoto Maeda1, Atushi Ando2, Shogo Kawaminami1, Kuu Nakamura1, Shin-ichi Yamamoto1 (1.Ryukoku Univ., 2.AIST)
[16p-PA7-6]Effect of Self-Assembled Monolayers Formed on MoO3 Thin-Film Sources on the CVD Growth of Monolayer MoS2
〇Kaede Kikuya1, Shi-ichi Yamamoto1, Syougo Kawaminami1, Kuu Nakamura1, Atushi Ando2 (1.Ryukoku Univ., 2.AIST)
[16p-PA7-7]CVD growth of monolayer MoS2 on Au(111) and transfer with UV tape
〇Naoki Watari1, Kaichi Yamamoto1, Satoru Fukamachi1, Pablo Solis-Fernandez1, Shogo Tamura2, Tomonori Ikari2, Hiroki Ago1,3 (1.Kyushu Univ., 2.Nat. Inst. Tech., 3.CSeDE)
[16p-PA7-8]Growth of Transition Metal Dichalcogenide Thin Films on High-κ Insulator Deposited by Mist CVD
Koushirou Kawakami1, 〇(B)Yuki Matsuoka1, Tenryuu Tamura1, Abdul Kuddus2, Keiji Ueno3, Hong En Lim3, Hajime Shirai4, Shinichirou Mouri1 (1.Ritsumeikan Univ., 2.R-GIRO, 3.Saitama Univ., 4.Kanagawa Univ.)
[16p-PA7-9]Quasi-Oriented Growth of Surface-Flat WOx Nanowires Using Na2WO4/WOx Film Precursors and Template Growth of Monolayer WS2
〇Ryosei Ito1, Ikuho Kanesaki1, Yasuhiko Hayashi1, Hiroo Suzuki1 (1.Okayama Univ.)
[16p-PA7-10]CVD Growth of Multilayer h-BN on Ferroelectric Substrate
〇Takuto Inaba1, Shinichiro Mouri1, Kuddus Abdul2 (1.Ritsumeikan Univ., 2.R-GIRO)
[16p-PA7-11]In situ TEM Observation of Ductile-like Fracture in MoS2 nanosheet Under Strain
〇(PC)Wei Xiong1, Yoshifumi Oshima1 (1.JAIST)
[16p-PA7-12]CVD growth of MoTe2 and its electrical properties
〇Yasushi Ishiguro1, Yuichiro Isaka1, Yutaka Wakayama2, Takashi Tachiki1 (1.National Defense Acad., 2.NIMS)
[16p-PA7-13]Controlled Growth of β-phase MoTe2 Nanoribbons via Chemical Vapor Deposition
〇(M2)Itsuki Yamada1, Shintaro Saito1, Zheng Liu2, Yusuke Nakanishi3, Yasumitsu Miyata4, Keiji Ueno1, Hong En Lim1 (1.Saitama Univ., 2.AIST, 3.Univ. Tokyo, 4.NIMS)
[16p-PA7-14]Synthesis of MoS2 from paint raw materials through CS2 treatment
〇Minori Shinohara1, waizumi hiroki1, yokokura seiya1, shimada toshihiro1 (1.Hokkaido Univ.)
[16p-PA7-15]Exploration of Bi2Se3 Fabrication Methods with Structural and Electronic Characterization
〇(B)Toshiki Mori1, Hiroki Waizumi1, Seiya Yokokura1, Toshihiro Shimada1 (1.Hokkaido Univ.)
[16p-PA7-16]Sb-doped 2D SnO nanosheets fabricated via liquid Sn-Sb alloy printing
〇Shunjiro Fujii1, Kazuo Ishihra1, Naoki Fukumuro1, Atsushi Kogo2 (1.Univ. hyogo, 2.AIST)
[16p-PA7-17]Formation of MoSe2/Janus SMoSe via plasma treatment and selenization
〇Mayu Yamaguchi1, Keiji Ueno1, Hong En Lim1 (1.Saitama Univ.)
[16p-PA7-18]Epitaxial Growth and Janusization of Gallium Selenide Monolayers
〇Yusuke Motoki1, Hong En Lim1, Keiji Ueno1 (1.Saitama Univ.)
[16p-PA7-19]Impact of Metal Thin-Film Formation on Raman Spectra of Monolayer MoS2
〇Tetsuhiko Tanikawa1,2, Chang Wen-Hsin1, Nishino Ryutaro1, Kawanago Takamasa1, Irisawa Toshifumi1, Okada Naoya1 (1.SFRC, AIST, 2.Nihon Univ.)
[16p-PA7-20]Optical evaluation of band offset and observation of interlayer excitons in MoSe2/MoS2 hetero-bilayer
〇(M1)Yuki Izumi1, Satoru Adachi1, Reina Kaji1, S.-C. Lin2, H.-W. Ting2, W.-H. Chang2 (1.Hokkaido univ, 2.NYCU)
[16p-PA7-21]Multimodal spectral imaging analysis of MoS2 sheets under Ar-plasma mediated F treatment
〇(B)Yuta Suwa1,2, Naoka Nagamura1,2, Masahito Kotsugi1, Ryou Nouchi3 (1.Tokyo Univ. of Sci., 2.NIMS, 3.Osaka Metropolitan Univ.)
[16p-PA7-22]Molybdenum Disulfide (MoS2): Superconductivity and Gate-Controlled K+ Intercalation
〇(DC)Alec Paul Romagosa1,2, Ricky Dwi Septiano2, Hideki Matsuoka2,3, Yutaka Majima1, Yoshihiro Iwasa2,3 (1.Science Tokyo, 2.RIKEN, 3.Tokyo Univ.)
[16p-PA7-23]Potential of layered IV-V compound GeAs as p-type two-dimensional channel material
〇Noriyuki Urakami1, Ayuta Hasumi1, Yosuke Kimoto1, Yoshio Hashimoto1 (1.Shinshu Univ.)
[16p-PA7-24]Carrier Dynamics of Photon Enhanced Thermionic Emission from MoS2 Surface Layers on p-Si
〇(M1)Rikiya Matsushima1, Akihisa Ogino1 (1.Shizuoka Univ.)
[16p-PA7-25]Development of anode electrodes using exfoliated MXene for Li-ion secondary battery
〇YUNO TANAKA1, KENJI SASAKI1, NORIHIRO SHIMOI1, HIROTAKA OOI2, NOBUYUKI YOSHINO2 (1.Tohoku Inst. Tech., 2.Japan Mat. Tech. Corp.)
[16p-PA7-26]Voltage-Induced Phase Transition of Strained VO2 Single Crystals Based on Hysteresis
〇Taisuke Kasahara1, Mitsuru Inada1, Mahito Yamamoto1 (1.Kansai Univ.)
[16p-PA7-27]Characterization of TaOx Thin Films Formed by Solution-Processed TaS2
〇Sora Kawai1, Ayane Nomi2, Kota Arai2, Mitsuru Inada2, Shingo Sato2, Tomokazu Takahashi2, Seiji Aoyagi2, Keiji Ueno3, Mahito Yamamoto2 (1.Kansai Univ., 2.Grad. Sch. Kansai Univ., 3.Saitama Univ.)
[16p-PA7-28]Performance enhancement and operation stabilization of field-effect transistors with indium selenide channel layers
〇Haruto Watanabe1, Lim Hong En1, Keiji Ueno1 (1.Saitama Univ.)
[16p-PA7-29]Impact of Molecular Adsorption on the Electrical Properties of Monolayer MoTe2 Channel Field-Effect Transistors
〇Takuto Ono1, Kenji Watanabe2, Takashi Taniguchi2, Yusuke Hoshi1 (1.Tokyo City Univ., 2.NIMS)
[16p-PA7-30]Study of magnetoconductivity in dopant molecule-2D material hybrids
〇Mao Xu1, Hikaru Okuma1, Kazunori Ueno1, Daisuke Kiriya1 (1.Univ. of Tokyo)
[16p-PA7-31]Nonvolatile Memory Devices Based on Ionic Liquid Gating in Two-Dimensional Semiconductor Materials for Neuromorphic Applications
〇(M1C)Shuto Kazama1, Akira Aikawa1, Shouta Sato1, Ren Ogawa1, Aoi Matumoto1, Yoriko Suda1, Ryoma Hayakawa1,2, Yutaka Wakayama2, Shu Nakaharai1 (1.Tokyo Univ Tech., 2.NIMS)
[16p-PA7-32]Channel Width Dependent Characteristics of Two-Dimensional Semiconductors Induced by Surface Charge Transfer Doping
〇(DC)Takashi Kobayashi1, Daisuke Kiriya1 (1.Univ. of Tokyo)
[16p-PA7-33]Development of Sensor Devices with Molecular Selectivity Using MoS2
〇Ayano Takahashi1, Wataru Ise1, Seiya Yokokura1, Hiroki Waisumi1, Toshihiro Shimada1 (1.Hokkaido Univ.)
[16p-PA7-34]Chemo-Electronic MoS2 Acetone Sensor at Room Temperature via Surface modulation by A Charge Transfer Complex
〇(D)CHEN LI1, Guanting Li1, Ramaraj Sakar Ganesh1, Mao Xu1, Hitoshi Tabata1, Daisuke Kiriya1 (1.Univ. Tokyo)
[16p-PA7-35]Deposition of AlHfO on ITO Substrates and Investigation of Gate Dielectric Films Application for MoS2 Devices
Tenryu Tamura1, 〇(B)Yuta Yokochi1, Shinichiro Mouri1, Abdul Kuddus2 (1.Ritsumeikan Univ., 2.R-GIRO)
[16p-PA7-36]Evaluation of Schottky Contact Characteristics of Sb2Te3 Contacts on MoS2
〇(M1C)Kei Ishikawa1, Wen Hsin Chang2, Rei Sato1, Satoshi Yoshizue1, Yoriko Suda1, Shogo Hatayama2, Yuta Saito3, Tatsuro Maeda2, Shu Nakaharai1 (1.Tokyo Univ. Tech., 2.AIST, 3.Tohoku Univ.)
[16p-PA7-37]Formation of 2D Contacts for WSe2 P-FET Toward Suppressing Ambipolar Operation
〇Toshinari Sugiyama1, Satoru Morito2, Ayaka Wakabayashi2, Tomonori Nishimura1, Kaito Kanahashi1, Takashi Taniguchi3, Kenji Watanabe3, Keiji Ueno2, Kosuke Nagashio1 (1.UTokyo, 2.Saitama Univ., 3.NIMS)
[16p-PA7-38]AFM-Patterned Graphene Slit Gates for One-Dimensional Exciton Confinement in 2D Semiconductors
〇(P)Lata Chouhan1, Yuta Urano1, Kenji Watanabe2, Takashi Taniguchi1, Ryo Kitaura1 (1.MANA, NIMS, 2.RCEOM, NIMS)
[16p-PA7-39]Water-Induced Operational Instability at Electrode Contacts in MoS2 FETs
〇(M1)Taiga Sakai1, Ryo Nouchi1 (1.Osaka Metro. Univ.)
[16p-PA7-40]Development of an automated stacking system for artificial 2D material heterostructures
〇Atsushi Kishida1, Wataru Idehara1, Kenji Watanabe2, Takashi Taniguchi2, Shinichiro Matano1, Kazunari Matsuda1 (1.Kyoto Univ., 2.NIMS.)
