Session Details
[10p-PA2-1~38]6.4 Thin films and New materials
Thu. Sep 10, 2026 2:00 PM - 3:30 PM JST
Thu. Sep 10, 2026 5:00 AM - 6:30 AM UTC
Thu. Sep 10, 2026 5:00 AM - 6:30 AM UTC
PA2 (1st Gymnasium)
[10p-PA2-1]Structural, Electrical, and Optical Properties of SnO2 Films Prepared by Reactive Sputtering Using Sn/SnO2 Mixed Target
〇(M1C)Rikuto Noai1, Junjun Jia2, Keiji Kaneyama1, Nose Shota1, Kaho Yokota1, Nobuto Oka1 (1.Kindai Univ., 2.Waseda Univ.)
[10p-PA2-2]Relationship between growth conditions and contact resistance of SnO2 thin films applied for fuel cell separators.
〇(B)Jion Terashima1, Takahashi Isao2,3, Tanaka Takashi4, Matsuo Kouichi5, Kentaro Kaneko2,3 (1.Col. of Sci. & Eng. Ritsumeikan Univ., 2.ROST, Ritsumeikan Univ., 3.RISA, 4.Eyetec Co., Ltd, 5.Iwasaki electric Co., Ltd)
[10p-PA2-3]Relationship between the electronic states, the electrical states and the atomic structure of HfO2/β-Ga2O3 interface
〇(DC)Abul Tooshil1,2, Takahiro Nagata1, Masaharu Watanabe1,3, Yoshiyuki Yamashita1,2, Masaaki Kobata4, Tatsuo Fukuda4 (1.NIMS, 2.Kyushu Univ, 3.Meiji Univ, 4.JAEA)
[10p-PA2-4]Fabrication and characterization of N-doped GeTe/Sb2Te3 phase-change multilayer thin films
〇(D)Shota Yoshimoto1, Ryohei Izumi1, Kazuki Matsuda1, Shuo Li1, You Yin1 (1.Gunma Univ.)
[10p-PA2-5]Improvement of thermal stability of Ge2Sb2Te5 phase-change material by O doping
〇(D)Shota Yoshimoto1, Xin Dong1, Syuhei Fukuda1, Shuo Li1, You Yin1 (1.Gunma Univ.)
[10p-PA2-6]Growth-temperature-dependent crystal orientation switching in Tellurium deposited on Bi2Te3 buffer layer
〇Yuta Kobayashi1, Shunzhen Wang1, Arata Mitsuzuka1, Takuto Hiraoka1, Masashi Kawaguchi1, Masamitsu Hayashi1 (1.Univ. Tokyo)
[10p-PA2-7]Thin-film growth of CoTex by co-sputtering
〇(M1)Chikara Aoki1, Kohei Fujiwara1 (1.Rikkyo Univ.)
[10p-PA2-8]Large-area membrane fabrication of room-temperature van der Waals ferromagnet Cr3Te4 via PCL-assisted dry transfer and its structural characterization
〇Meguru Matsuo1, Kanta Endo2, Daisuke Yamazaki1, Yuki Itahashi3, Yoshihiro Iwasa3, Masaki Nakano1 (1.SIT, 2.Todai Univ, 3.Riken CEMS)
[10p-PA2-9]Controlled Crystal Growth and Magnetic Properties of Co-Ni-Ga Ternary Alloy Films Prepared by Coprecipitation
〇Koki Sasaki1, Hibiki Kuroda1, Fadhilatu Zikra1, Keisuke Yamada1, Mutsuhiro Shima1 (1.Gifu Univ.)
[10p-PA2-10]Controlled Growth of Chemically Synthesized Magnetic Ni-Mn-Ga Alloy Films
〇(D)Fadhilatu Zikra1, Mutsuhiro Shima1, Koki Sasaki1, Hibiki Kuroda1, Keisuke Yamada1 (1.Gifu Univ)
[10p-PA2-11]Development of Low-Thermal-Conductivity High-Entropy Amorphous Thin Films
〇(P)Michiko Sasaki1, Yibin Xu1, Taku Moronaga1, Akiko Nakamura1, Toru Hara1, Masahiro Goto1 (1.NIMS)
[10p-PA2-12]Thermally-induced Crystallization Processes in Amorphous FeSn thin Films Studied by Electron Beam Radial Distribution Analysis
〇(M1)Atsuhiro Yamamoto1, Manabu Ishimaru1, Ryusuke Nakamura2 (1.Kyutech, 2.Univ. of Shiga Pref.)
[10p-PA2-13]Compositional Control of YCaFe2OxFy Single-Crystal Thin Films via Topochemical Fluorination
〇(M2)Reina Tsuiji1, Akiko Kamigaito1, Yasushi Hirose2, Tsukasa Katayama3, Akira Chikamatsu1 (1.Ochanomizu Univ., 2.Tokyo Metropolitan Univ., 3.Tokyo Univ. Science)
[10p-PA2-14]Fabrication and Evaluation of Electrical and Optical Properties of BiOI Thin Films
〇(M2)Tatsuki Isayama1, Keiga Fukui1, Hiroshi yanagi1 (1.Univ. Yamanashi)
[10p-PA2-15]Ambient Fabrication of Cs2AgBiBr6 Double Perovskite Films: Effects of Mixed-Solvent System and Additive Engineering on Film Quality and Optical Properties
〇(D)MAHA ABUSHAWISH1, Hitoshi Mizuno1, Kimihisa Matsumoto1 (1.Toyama Prefec. Univ.)
[10p-PA2-16]Nitrogen Pressure Dependence of CsPbBr3 Films Deposition
〇Takashi Karube1, Ryunosuke Kumagai1, Ryota Takahashi1 (1.Nihon Univ.)
[10p-PA2-17]High-throughput I-V Chatacterization of NiO/ZnO Heterosutructures by PLD
〇Ren Koguchi1, Takahashi Ryota1 (1.Nihon Univ.)
[10p-PA2-18]Fabrication of Bi4Ti3O112 Thin Films by the Metal-Organic Decomposition Method for Functional Heterojunction Applications
〇Harutaka Sato1, Yasuyuki Yamada1 (1.NIT Oyama college)
[10p-PA2-19]Effect of precursor solution concentration on the surface morphology and optical properties of chemically synthesized VO2 thin films
〇Taiyo Hirono1, Shun Aida1, Md. Suruz Mian1, Kunio Okimura1, Tomohiko Nakajima2, Iwao Yamaguchi2 (1.Tokai Univ., 2.AIST)
[10p-PA2-20]Growth of crystalline VO2 films on TiO2 - buffered glass substrates and their optical switching performance for IR light.
〇(M2)RYOHEI WAKAYAMA1, Taiyo Hirono1, Kunio Okimura1, Md. Suruz Miya1, Tomohiko Nakajima2, Iwao Yamaguchi2 (1.Tokai Univ, 2.AIST)
[10p-PA2-21]Influence of H2 Addition on the Physical Properties of Lightly Transition-Metal-Doped Epitaxial ITO Films Deposited by RF Magnetron Sputtering
〇Ayano Soga1, Toshihiro Nakamura1,2 (1.Kyoto Univ., 2.ILAS, Kyoto Univ.)
[10p-PA2-22]Control of the Orientation of SrLiH3 Thin Films on TiHx Buffer Layers for Hydride-Ion Device Development
〇Tomoki Okuyama1, Hiroyuki Oguchi1, Kurumi Nagasaka3, Erika Fukushi1, Fumiya Mori1, Takayuki Harada2 (1.Shibaura Tech., 2.NIMS, 3.Shibaura Inst.)
[10p-PA2-23]Development of Inorganic/Organic Composite Protective Layers for Hydride Film Characterization
〇Nonoko Nonoko Takahashi1, Erika Fukushi1, Fumiya Mori1, Kenta Saito1, Kazuaki Kisu1, Oguchi Hiroyuki1 (1.Shibaura Tech.)
[10p-PA2-24]Fundamental Study on the Hydrogen-Sensing Properties and Concentration Detection Mechanisms of Metal Thin Films Using Electrical Resistance Measurements
〇(M1C)Shun Ando1, Ryo Harada2, Helmut Takahiro Uchida1,2 (1.Tokai Univ., 2.Technol.Tokai Univ.)
[10p-PA2-25]Growth of hexagonal ZnSnN2 layer by UHV sputter epitaxy method (V)
〇(M1)Shuji Yamaguchi1, Kaito Horikoshi1, Daito Imai1, Yukihiro Miyazawa1, Keisuke Yoshida1, Hiroyuki Shinoda1, Nobuki Mutsukura1 (1.Tokyo Denki Univ.)
[10p-PA2-26]Low-Temperature Sputter Epitaxy of InN-Rich (ZnO)x(InN)1-x Films: Suppression of Surface Roughening Using 3D buffers
〇(M2)Satoshi Kumamoto1, Shotaro Hata1, Takuya Takahashi1, Kunihiro Kamataki1, Takamasa Okumura1, Haruki Kiyama1, Kazunori Koga1, Masaharu Shiratani1, Naho Itagaki1 (1.Kyushu Univ.)
[10p-PA2-27]Optical Properties of SiN and SiON Deposited by ECR Plasma-Assisted Sputtering
〇Taisei Wakamiya1, Haruki Takizawa1, Yoshihiro Shimazaki1, Hironori Torii1, Hiroshi Murotani2, Toramaru Masamitsu3, Jin Yoshito3 (1.JSW Ltd., 2.Tokai Univ., 3.JSW AFTY Co.)
[10p-PA2-28]SiO barrier films optical properties change over time
〇Koichi Muro1, Takashi Inomata2 (1.Teikyo Univ., 2.Kisan Kinzoku Chemicals co., ltd.)
[10p-PA2-29]Development of a Single-Molecule-Electret Thin-Film Deposition Method for Next-generation Memory Devices.
〇Ryota Shoji1, Yuki Nakano1, Chisato Kato1, Masaru Fujibayashi2, Sadahumi Nishihara3,4 (1.Materialgate Inc., 2.NIT, Ube College, 3.Graduate School of Advanced Science and Engineering, Hiroshima Univ., 4.CResCent, Hiroshima Univ.)
[10p-PA2-30]Photoluminescence Enhancement of Alq3 Thin Films Using Porous Aluminum Films
〇(M1)Haruhito Suzuki1, Souta Kudo1, MIdori Kawamura1, Takayuki Kiba1 (1.Kitami Inst. of Tech.)
[10p-PA2-31]Effects of Sputtering Gas Species and Substrate Heating on the Properties of Ta Thin Films
〇(M1)Haruno Hasegawa1, Yuya Fujitani1, Midori Kawamura1, Takayuki Kiba1 (1.Kitami Inst. Tech.)
[10p-PA2-32]Optical Properties of RF Magnetron Sputtered Ti/Ag Multilayer Films
〇(M1)Hideyuki Kondo1, Midori Kawamura1, Takayuki Kiba1 (1.Kitami Inst.)
[10p-PA2-33]Fabrication and Optical Characterization of Al Nanolayer-deposited Ag Films Prepared by Vacuum Evaporation
〇(M1)So Onishi1, Midori Kawamura1, Takayuki Kiba1 (1.Kitami Inst. Tech.)
[10p-PA2-34]Relationship between Growth Conditions and Crystallinity of Pt Thin Films by Mist CVD
〇Shiori Ishikawa1, Isao Takahashi2, Haruka Sawamizu2, Koki Morimoto1 (1.Qualtec Co., Ltd., 2.Ritsumeikan Univ.)
[10p-PA2-35]Crystal structure analysis of single crystal Ir(001) thin films using Photoelectron Momentum Microscope
〇(M1)Hayato Yabe1, Eri Hashimoto1, Fumihiko Matsui2, Shinji Koh1 (1.Aoyama Gakuin Univ., 2.UVSOR, Institute for Molecular Science.)
[10p-PA2-36]Evaluation of Oxide Film Thickness Using O1s Intensity Attenuation in Angle-Resolved HAXPES
〇Makiho Eguchi1, Ayuki Yoshizumi1, Riki Satoh1, Ichika Takeshima1, Naoyoshi Kubota1 (1.NSTEC Co.)
[10p-PA2-37]Enhancing Metal Thin Film Thickness Evaluation via Mechanical Characterization
〇(M2)Seiju Koike1, Kohei Ohnishi1 (1.Kindai University)
[10p-PA2-38]Fundamental Study of a Self-Roll- Up Process for Microcoil Fabrication
〇Yuki Tabuchi1, Oka Chiemi1, Sakurai Junpei1, Hata Seiichi1 (1.Nagoya Univ.)
